公开(公告)号：US08011315B2

公开(公告)日：2011-09-06

申请号：US10588507

申请日：2005-02-10

申请人： Takafumi Matsumoto ,  Shun Mikami ,  Kouichi Hanzawa ,  Mineharu Moriya ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Masashi Kubo ,  Susumu Ikeda

发明人： Takafumi Matsumoto ,  Shun Mikami ,  Kouichi Hanzawa ,  Mineharu Moriya ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Masashi Kubo ,  Susumu Ikeda

IPC分类号： B05C11/02

CPC分类号： H01L21/68707 ,  C23C14/0078 ,  C23C14/505 ,  C23C14/568 ,  C23C16/4584 ,  C23C16/54 ,  H01L21/67201 ,  H01L21/67207 ,  H01L21/68721 ,  H01L21/68764 ,  H01L21/68771

摘要： A thin film forming apparatus such that a substrate can be easily fixed/removed to/from the outer circumferential surface of a drum type substrate holder through a simple arrangement.The drum type substrate holder (5) is supported in a horizontal posture rotatably about a horizontal rotational shaft in a film deposition chamber A jig (13) holding a substrate (12) fixedly is transferred by an arm horizontally onto the outer circumferential surface of the drum type substrate holder (5), and an end part (13b) of the substrate fixing jig (13) can be secured by a securing device (14) provided at the corner part (5a) of the outer circumferential surface of the drum type substrate holder (5).

摘要翻译： 一种薄膜形成装置，使得可以通过简单的布置容易地将基板固定/移出到滚筒式基板保持器的外周表面。 滚筒式基板保持件（5）在成膜室中以水平旋转轴为中心旋转的水平姿态被支撑。固定有基板（12）的夹具（13）固定地通过手臂水平地移动到 鼓型衬底保持器（5）和衬底固定夹具（13）的端部（13b）可以通过设置在滚筒类型的外周面的角部（5a）处的固定装置（14）来固定 衬底保持器（5）。

公开(公告)号：US20080141943A1

公开(公告)日：2008-06-19

申请号：US10588507

申请日：2005-02-10

申请人： Takafumi Matsumoto ,  Shun Mikami ,  Kouichi Hanzawa ,  Mineharu Moriya ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Masashi Kubo ,  Susumu Ikeda

发明人： Takafumi Matsumoto ,  Shun Mikami ,  Kouichi Hanzawa ,  Mineharu Moriya ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Masashi Kubo ,  Susumu Ikeda

IPC分类号： C23C16/453

CPC分类号： H01L21/68707 ,  C23C14/0078 ,  C23C14/505 ,  C23C14/568 ,  C23C16/4584 ,  C23C16/54 ,  H01L21/67201 ,  H01L21/67207 ,  H01L21/68721 ,  H01L21/68764 ,  H01L21/68771

摘要： [Problems]A thin film forming apparatus such that a substrate can be easily fixed/removed to/from the outer circumferential surface of a drum type substrate holder through a simple arrangement.[Means for Solving Problems]The drum type substrate holder (5) is supported in a horizontal posture rotatably about a horizontal rotational shaft in a film deposition chamber A jig (13) holding a substrate (12) fixedly is transferred by an arm horizontally onto the outer circumferential surface of the drum type substrate holder (5), and an end part (13b) of the substrate fixing jig (13) can be secured by a securing device (14) provided at the corner part (5a) of the outer circumferential surface of the drum type substrate holder(5).

摘要翻译： [问题]通过简单的布置，能够容易地将基板与鼓型基板保持件的外周面进行固定/移除的薄膜形成装置。 [解决问题的手段]滚筒式基板保持件（5）在成膜室中以水平旋转轴为中心旋转的水平姿势被支撑。固定有基板（12）的夹具（13）固定地将手臂水平地移动到 滚筒式基板支架（5）的外圆周表面和基板固定夹具（13）的端部（13b）可以通过设置在角部（5a）的角部（5a）处的固定装置（14）来固定 鼓型基板支架（5）的外周面。

公开(公告)号：US20120082778A1

公开(公告)日：2012-04-05

申请号：US13275696

申请日：2011-10-18

申请人： Tetsuya SHIMADA ,  Masanori Hida ,  Hideyuki Odagi ,  Shun Mikami ,  Makoto Aodai ,  Toshiharu Kurauchi

发明人： Tetsuya SHIMADA ,  Masanori Hida ,  Hideyuki Odagi ,  Shun Mikami ,  Makoto Aodai ,  Toshiharu Kurauchi

IPC分类号： C23C16/44 ,  C23C16/455

CPC分类号： C23C14/14 ,  C23C14/246 ,  C23C14/28 ,  C23C14/56

摘要： The present invention aims to provide a technology, which uses an apparatus having a simple configuration to efficiently form a film with uniform film thickness and film quality when continuously forming a film by vacuum deposition of highly reactive lithium. A vacuum deposition system of the present invention has a vacuum deposition chamber wherein an evaporation material is deposited on a substrate by deposition, a substrate supplying/replacing system, connected to the vacuum deposition chamber, for performing supplying and replacing the substrate to and from the vacuum deposition chamber, and a material supplying/replacing system, connected to the vacuum deposition chamber, for performing the supplying and the replacing of the evaporation material to and from the vacuum deposition chamber.

摘要翻译： 本发明旨在提供一种技术，其使用具有简单构造的装置，以通过真空沉积高反应性锂连续形成膜来有效地形成具有均匀膜厚度和膜质量的膜。 本发明的真空沉积系统具有真空沉积室，其中蒸发材料通过沉积沉积在基板上，基板供应/替换系统连接到真空沉积室，用于向基板提供和更换基板 真空沉积室和连接到真空沉积室的材料供应/替换系统，用于执行向真空沉积室供应和替换蒸发材料。

公开(公告)号：US20120196175A1

公开(公告)日：2012-08-02

申请号：US13367576

申请日：2012-02-07

申请人： Masanori HIDA ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Makoto Aodai ,  Toshiharu Kurauchi

发明人： Masanori HIDA ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Makoto Aodai ,  Toshiharu Kurauchi

IPC分类号： H01M4/48 ,  H01M4/04

CPC分类号： H01M10/0585 ,  H01M4/0428 ,  H01M4/134 ,  H01M4/1395 ,  H01M4/628 ,  H01M10/0472 ,  H01M10/052

摘要： A process for producing a chargeable-and-dischargeable thin film lithium secondary battery, which includes a substrate, a positive electrode film arranged on the substrate and formed in a structure of which lithium is insertable and releasable, an electrolyte film which is arranged on the positive electrode film and being in contact with the positive electrode film and contains lithium ions and in which lithium ions are movable, and a negative electrode film made of metallic lithium and arranged on the electrolyte film and being in contact with the electrolyte film, wherein after the negative electrode film is formed, a lithium carbonate film is formed on a surface of the negative electrode film by bringing a surface of the negative electrode film into contact with a surface-treating gas containing a rare gas and carbon dioxide. The process does not change the properties of a metallic lithium film as a negative electrode.

摘要翻译： 一种可充放电薄膜锂二次电池的制造方法，其特征在于，具备：基板，配置在所述基板上的正极膜，其形成为可插拔锂的结构的电解质膜， 正极膜与正极膜接触并含有锂离子并且其中锂离子可移动;以及负极膜，由金属锂制成并且布置在电解质膜上并与电解质膜接触，其中， 形成负极膜，通过使负极膜的表面与含有稀有气体和二氧化碳的表面处理气体接触，在负极膜的表面上形成碳酸锂膜。 该方法不会改变作为负极的金属锂膜的性能。

公开(公告)号：US07967961B2

公开(公告)日：2011-06-28

申请号：US11661084

申请日：2005-08-29

申请人： Minoru Dogi ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Masahiro Matsumoto

发明人： Minoru Dogi ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Masahiro Matsumoto

IPC分类号： C23C14/34

CPC分类号： H01J37/34 ,  C23C14/3464 ,  C23C14/505 ,  C23C14/541 ,  H01J37/32752

摘要： There is provided a film forming apparatus which is capable of forming a film on both surfaces of a substrate by sputtering continuously with high efficiency by restraining a rise in temperature of the substrate to a predetermined value or higher.In a film forming chamber 2 the pressure of which is controlled, while a rotating drum 7 is rotated by the driving of a drive motor 8, a film is formed on the top surface of a substrate 12 on a substrate tray 13 held on a substrate holder 10 by cathodes 17a and 17b for outer surface to which a d.c. voltage or an a.c. voltage or a high-frequency voltage is applied, and also a film is formed on the back surface of the substrate 12 on the substrate tray 13 held on the substrate holder 10 by cathodes 14a and 14b for inner surface to which a d.c. voltage or an a.c. voltage or a high-frequency voltage is applied, by which a high-quality film is formed on both surfaces of the substrate 12 by sputtering continuously with high efficiency by restraining a rise in temperature of the substrate to a predetermined value or higher.

摘要翻译： 提供一种成膜装置，其能够通过将衬底的温度上升抑制到预定值以上而以高效率连续溅射在衬底的两个表面上形成膜。 在通过驱动电动机8的驱动使旋转鼓7旋转的同时控制压力的成膜室2中，在保持在基板上的基板托盘13上的基板12的顶面上形成有膜 通过用于外部表面的阴极17a和17b的保持器10 电压或电流 施加电压或高频电压，并且通过用于内部表面的阴极14a和14b在保持在衬底保持器10上的衬底托盘13上的衬底12的背面上形成膜。 电压或电流 施加电压或高频电压，通过将基板的温度上升抑制到规定值以上，通过高效率地连续溅射，在基板12的两面形成高质量的膜。

公开(公告)号：US20080164147A1

公开(公告)日：2008-07-10

申请号：US11661084

申请日：2005-08-29

申请人： Minoru Dogi ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Masahiro Matsumoto

发明人： Minoru Dogi ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Masahiro Matsumoto

IPC分类号： C23C14/34

CPC分类号： H01J37/34 ,  C23C14/3464 ,  C23C14/505 ,  C23C14/541 ,  H01J37/32752

摘要： There is provided a film forming apparatus which is capable of forming a film on both surfaces of a substrate by sputtering continuously with high efficiency by restraining a rise in temperature of the substrate to a predetermined value or higher.In a film forming chamber 2 the pressure of which is controlled, while a rotating drum 7 is rotated by the driving of a drive motor 8, a film is formed on the top surface of a substrate 12 on a substrate tray 13 held on a substrate holder 10 by cathodes 17a and 17b for outer surface to which a d.c. voltage or an a.c. voltage or a high-frequency voltage is applied, and also a film is formed on the back surface of the substrate 12 on the substrate tray 13 held on the substrate holder 10 by cathodes 14a and 14b for inner surface to which a d.c. voltage or an a.c. voltage or a high-frequency voltage is applied, by which a high-quality film is formed on both surfaces of the substrate 12 by sputtering continuously with high efficiency by restraining a rise in temperature of the substrate to a predetermined value or higher.

摘要翻译： 提供一种成膜装置，其能够通过将衬底的温度上升抑制到预定值以上而以高效率连续溅射在衬底的两个表面上形成膜。 在通过驱动电动机8的驱动使旋转鼓7旋转的同时控制压力的成膜室2中，在保持在基板上的基板托盘13上的基板12的顶面上形成有膜 通过用于外部表面的阴极17a和17b固定在支架10上 电压或电流 施加电压或高频电压，并且还通过用于内部表面的阴极14a和14b在保持在衬底保持器10上的衬底托盘13上的衬底12的背面上形成膜。 电压或电流 施加电压或高频电压，通过将基板的温度上升抑制到规定值以上，通过高效率地连续溅射，在基板12的两面形成高质量的膜。