公开(公告)号：US20050029451A1

公开(公告)日：2005-02-10

申请号：US10853678

申请日：2004-05-26

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

IPC分类号： H01J37/28 ,  G21K7/00 ,  G01N23/00

CPC分类号： H01J37/28 ,  H01J2237/2817

摘要： A substrate inspection apparatus includes: an electron beam irradiation device which emits an electron beam and causes the electron beam to irradiate a substrate to be inspected as a primary beam; an electron beam detector which detects at least one of a secondary electron, a reflected electron and a backscattered electron that are generated from the substrate that has been irradiated by the electron beam, and which outputs a signal that forms a one-dimensional or two-dimensional image of a surface of the substrate; a mapping projection optical system which causes imaging of at least one of the secondary electron, the reflected electron and the backscattered electron on the electron beam detector as a secondary beam; and an electromagnetic wave irradiation device which generates an electromagnetic wave and causes the electromagnetic wave to irradiate a location on the surface of the substrate at which the secondary beam is generated.

摘要翻译： 基板检查装置包括：电子束照射装置，其发射电子束并使电子束照射待检查的基板作为主光束; 电子束检测器，其检测从已经被电子束照射的衬底产生的二次电子，反射电子和反向散射电子中的至少一个，并输出形成一维或二维的信号， 基板的表面的三维图像; 映射投影光学系统，其将二次电子，反射电子和背散射电子中的至少一个成像在电子束检测器上作为次级光束; 以及电磁波照射装置，其产生电磁波，并使电磁波照射到产生二次光束的基板的表面上的位置。

公开(公告)号：US5371371A

公开(公告)日：1994-12-06

申请号：US112802

申请日：1993-08-27

申请人： Yuichiro Yamazaki ,  Motosuke Miyoshi ,  Takamitsu Nagai

发明人： Yuichiro Yamazaki ,  Motosuke Miyoshi ,  Takamitsu Nagai

IPC分类号： H01J37/073 ,  H01J37/10 ,  H01J37/145 ,  H01J37/15

CPC分类号： H01J37/073 ,  H01J2237/06316

摘要： A magnetic immersion field emission electron gun has a vacuum vessel having a central axis in a predetermined direction, a cathode arranged along the central axis of the vacuum vessel for generating an electron beam, an anode for forming an electron beam path by accelerating a generated electron beam in the central axis direction, an electrostatic lens arranged between the cathode and anode for generating an electric field which focuses an accelerated electron beam toward the central axis, a magnetic field generating element arranged around the electron beam path for generating a magnetic field for focusing the electron beam in order to preventing a diameter of the electron beam from expansion by an aberration of the electrostatic lens, and a moving mechanism for moving the magnetic field generating element at a position where a peak point of a strength of the magnetic field generated by the magnetic field generating element coincides with a portion where the aberration of the electrostatic lens becomes most conspicuous. The electron gun having such a configuration can provide an effect of reducing a spherical and chromatic aberration by efficiently providing a lens characteristic to the electrostatic lens even though the entire length of electrostatic lens is long.

摘要翻译： 磁浸式场致发射电子枪具有沿预定方向具有中心轴的真空容器，沿着真空容器的中心轴布置的用于产生电子束的阴极，用于通过加速产生的电子形成电子束路径的阳极 在中心轴方向上形成光束，静电透镜，其布置在阴极和阳极之间，用于产生将加速电子束朝向中心轴聚焦的电场;围绕电子束路径设置的磁场产生元件，用于产生用于聚焦的磁场 电子束，以防止电子束的直径由于静电透镜的像差而膨胀;以及移动机构，用于使磁场产生元件移动到由磁场产生元件产生的磁场的强度的峰值点 磁场产生元件与电极的像差部分重合 tatic镜头变得最显眼。 具有这种结构的电子枪即使静电透镜的整个长度都很长，也可以通过有效地向静电透镜提供透镜特性来提供减小球面和色差的效果。

公开(公告)号：US07847250B2

公开(公告)日：2010-12-07

申请号：US12289846

申请日：2008-11-05

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

IPC分类号： H01J37/244 ,  H01J37/26

CPC分类号： H01J37/28 ,  H01J2237/2817

摘要： A substrate inspection apparatus includes: an electron beam irradiation device which emits an electron beam and causes the electron beam to irradiate a substrate to be inspected as a primary beam; an electron beam detector which detects at least one of a secondary electron, a reflected electron and a backscattered electron that are generated from the substrate that has been irradiated by the electron beam, and which outputs a signal that forms a one-dimensional or two-dimensional image of a surface of the substrate; a mapping projection optical system which causes imaging of at least one of the secondary electron, the reflected electron and the backscattered electron on the electron beam detector as a secondary beam; and an electromagnetic wave irradiation device which generates an electromagnetic wave and causes the electromagnetic wave to irradiate a location on the surface of the substrate at which the secondary beam is generated.

摘要翻译： 基板检查装置包括：电子束照射装置，其发射电子束并使电子束照射待检查的基板作为主光束; 电子束检测器，其检测从已经被电子束照射的衬底产生的二次电子，反射电子和反向散射电子中的至少一个，并输出形成一维或二维的信号， 基板的表面的三维图像; 映射投影光学系统，其将二次电子，反射电子和背散射电子中的至少一个成像在电子束检测器上作为次级光束; 以及电磁波照射装置，其产生电磁波，并使电磁波照射到产生二次光束的基板的表面上的位置。

公开(公告)号：US5535508A

公开(公告)日：1996-07-16

申请号：US457836

申请日：1995-06-01

申请人： Takamitsu Nagai ,  Yuichiro Yamazaki ,  Motosuke Miyoshi

发明人： Takamitsu Nagai ,  Yuichiro Yamazaki ,  Motosuke Miyoshi

IPC分类号： H01J3/18 ,  H01J9/14 ,  H01J37/12 ,  H01R43/00

CPC分类号： H01J37/12 ,  H01J2237/1207 ,  Y10T29/49117

摘要： An electrostatic lens produces a smooth potential distribution along the center axis and is reduced in lens size and in total shape.A metal layer 13 is deposited at a certain position on an inner surface of insulating cylinder 11, and a high-resistance layer 12 is deposited on a portion except for the metal layer 13 on the inner surface of cylinder 11. A negative potential is applied from an external power source 19 to the metal layer 13, and the high-resistance layer 12 is earthed.

摘要翻译： 静电透镜沿着中心轴产生平滑的电势分布，并减小透镜尺寸和总体形状。 金属层13沉积在绝缘圆筒11的内表面的特定位置，高电阻层12沉积在气缸11的内表面上除了金属层13之外的部分上。施加负电位 从外部电源19到金属层13，高电阻层12接地。

公开(公告)号：US5444256A

公开(公告)日：1995-08-22

申请号：US168160

申请日：1993-12-17

申请人： Takamitsu Nagai ,  Yuichiro Yamazaki ,  Motosuke Miyoshi

发明人： Takamitsu Nagai ,  Yuichiro Yamazaki ,  Motosuke Miyoshi

IPC分类号： H01J3/18 ,  H01J9/14 ,  H01J37/12

CPC分类号： H01J37/12 ,  H01J2237/1207 ,  Y10T29/49117

摘要： An electrostatic lens produces a smooth potential distribution along the center axis and is reduced in lens size and in total shape. A metal layer 13 is deposited at a certain position on an inner surface of insulating cylinder 11, and a high-resistance layer 12 is deposited on a portion except for the metal layer 13 on the inner surface of cylinder 11. A negative potential is applied from an external power source 19 to the metal layer 13, and the high-resistance layer 12 is earthed.

摘要翻译： 静电透镜沿着中心轴产生平滑的电势分布，并减小透镜尺寸和总体形状。 金属层13沉积在绝缘圆筒11的内表面的特定位置，高电阻层12沉积在气缸11的内表面上除了金属层13之外的部分上。施加负电位 从外部电源19到金属层13，高电阻层12接地。

公开(公告)号：US20090072139A1

公开(公告)日：2009-03-19

申请号：US12289846

申请日：2008-11-05

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

IPC分类号： G01N23/00

CPC分类号： H01J37/28 ,  H01J2237/2817

摘要： A substrate inspection apparatus includes: an electron beam irradiation device which emits an electron beam and causes the electron beam to irradiate a substrate to be inspected as a primary beam; an electron beam detector which detects at least one of a secondary electron, a reflected electron and a backscattered electron that are generated from the substrate that has been irradiated by the electron beam, and which outputs a signal that forms a one-dimensional or two-dimensional image of a surface of the substrate; a mapping projection optical system which causes imaging of at least one of the secondary electron, the reflected electron and the backscattered electron on the electron beam detector as a secondary beam; and an electromagnetic wave irradiation device which generates an electromagnetic wave and causes the electromagnetic wave to irradiate a location on the surface of the substrate at which the secondary beam is generated.

摘要翻译： 基板检查装置包括：电子束照射装置，其发射电子束并使电子束照射待检查的基板作为主光束; 电子束检测器，其检测从已经被电子束照射的衬底产生的二次电子，反射电子和反向散射电子中的至少一个，并输出形成一维或二维的信号， 基板的表面的三维图像; 映射投影光学系统，其将二次电子，反射电子和背散射电子中的至少一个成像在电子束检测器上作为次级光束; 以及电磁波照射装置，其产生电磁波，并使电磁波照射到产生二次光束的基板的表面上的位置。

公开(公告)号：US06259094B1

公开(公告)日：2001-07-10

申请号：US09191116

申请日：1998-11-13

申请人： Takamitsu Nagai ,  Yuichiro Yamazaki ,  Motosuke Miyoshi

发明人： Takamitsu Nagai ,  Yuichiro Yamazaki ,  Motosuke Miyoshi

IPC分类号： H01J37147

CPC分类号： H01J37/28 ,  H01J37/244 ,  H01J2237/2817

摘要： An apparatus having an electron beam irradiation unit (11) for emitting an electron beam having a rectangular cross section from a linear cathode (12), and irradiating the inspection region (1a) of a sample (16) with the electron beam, a secondary optical system projection optical unit (17) for forming an image (defined by secondary and reflected electrons produced from the inspection region (1a) irradiated with the electron beam) onto an electron beam detection unit in a predetermined scale of enlargement, and an electron beam detection unit (22) for generating and outputting a detection signal in accordance with the formed image. The electron beam irradiation unit (11) forms the electron beam to have substantially the same area as the inspection region (1a) of the sample surface (16), and irradiates the inspection region (1a) with a single irradiation of the formed electron beam. In this way, the problems of conventional scanning electron microscopes, (i.e., low scanning velocity and image display speed, and the problems of direct mapping electron microscopes, i.e., difficulty in changing the beam shape in accordance with the inspection region while maintaining the current density), can be solved.

摘要翻译： 一种具有电子束照射单元（11）的装置，用于发射具有来自线性阴极（12）的矩形横截面的电子束，并且用电子束照射样品（16）的检查区域（1a），次级 光学系统投影光学单元（17），用于形成图像（由从电子束照射的检查区域（1a）产生的二次反射电子和反射电子）以规定的放大比例放大到电子束检测单元，以及电子束 检测单元（22），用于根据形成的图像产生和输出检测信号。 电子束照射单元（11）形成电子束，以与样品表面（16）的检查区域（1a）具有大致相同的面积，并且通过对形成的电子束的单次照射来照射检查区域（1a） 。 这样，常规扫描电子显微镜的问题（即扫描速度低，图像显示速度慢，直接映射电子显微镜的问题，即在保持电流的同时根据检查区域难以改变光束的形状 密度），可以解决。

公开(公告)号：US07462829B2

公开(公告)日：2008-12-09

申请号：US11723566

申请日：2007-03-21

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

IPC分类号： H01J37/244

CPC分类号： H01J37/28 ,  H01J2237/2817

摘要： A substrate inspection apparatus includes: an electron beam irradiation device which emits an electron beam and causes the electron beam to irradiate a substrate to be inspected as a primary beam; an electron beam detector which detects at least one of a secondary electron, a reflected electron and a backscattered electron that are generated from the substrate that has been irradiated by the electron beam, and which outputs a signal that forms a one-dimensional or two-dimensional image of a surface of the substrate; a mapping projection optical system which causes imaging of at least one of the secondary electron, the reflected electron and the backscattered electron on the electron beam detector as a secondary beam; and an electromagnetic wave irradiation device which generates an electromagnetic wave and causes the electromagnetic wave to irradiate a location on the surface of the substrate at which the secondary beam is generated.

摘要翻译： 基板检查装置包括：电子束照射装置，其发射电子束并使电子束照射待检查的基板作为主光束; 电子束检测器，其检测从已经被电子束照射的衬底产生的二次电子，反射电子和反向散射电子中的至少一个，并输出形成一维或二维的信号， 基板的表面的三维图像; 映射投影光学系统，其将二次电子，反射电子和背散射电子中的至少一个成像在电子束检测器上作为次级光束; 以及电磁波照射装置，其产生电磁波，并使电磁波照射到产生二次光束的基板的表面上的位置。

公开(公告)号：US20070187600A1

公开(公告)日：2007-08-16

申请号：US11723566

申请日：2007-03-21

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

IPC分类号： G21K7/00

CPC分类号： H01J37/28 ,  H01J2237/2817

摘要： A substrate inspection apparatus includes: an electron beam irradiation device which emits an electron beam and causes the electron beam to irradiate a substrate to be inspected as a primary beam; an electron beam detector which detects at least one of a secondary electron, a reflected electron and a backscattered electron that are generated from the substrate that has been irradiated by the electron beam, and which outputs a signal that forms a one-dimensional or two-dimensional image of a surface of the substrate; a mapping projection optical system which causes imaging of at least one of the secondary electron, the reflected electron and the backscattered electron on the electron beam detector as a secondary beam; and an electromagnetic wave irradiation device which generates an electromagnetic wave and causes the electromagnetic wave to irradiate a location on the surface of the substrate at which the secondary beam is generated.

公开(公告)号：US07211796B2

公开(公告)日：2007-05-01

申请号：US10853678

申请日：2004-05-26

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

IPC分类号： H01J37/244

CPC分类号： H01J37/28 ,  H01J2237/2817

摘要： A substrate inspection apparatus includes: an electron beam irradiation device which emits an electron beam and causes the electron beam to irradiate a substrate to be inspected as a primary beam; an electron beam detector which detects at least one of a secondary electron, a reflected electron and a backscattered electron that are generated from the substrate that has been irradiated by the electron beam, and which outputs a signal that forms a one-dimensional or two-dimensional image of a surface of the substrate; a mapping projection optical system which causes imaging of at least one of the secondary electron, the reflected electron and the backscattered electron on the electron beam detector as a secondary beam; and an electromagnetic wave irradiation device which generates an electromagnetic wave and causes the electromagnetic wave to irradiate a location on the surface of the substrate at which the secondary beam is generated.

摘要翻译： 基板检查装置包括：电子束照射装置，其发射电子束并使电子束照射待检查的基板作为主光束; 电子束检测器，其检测从已经被电子束照射的衬底产生的二次电子，反射电子和反向散射电子中的至少一个，并输出形成一维或二维的信号， 基板的表面的三维图像; 映射投影光学系统，其将二次电子，反射电子和背散射电子中的至少一个成像在电子束检测器上作为次级光束; 以及电磁波照射装置，其产生电磁波，并使电磁波照射到产生二次光束的基板的表面上的位置。