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公开(公告)号：US5979306A
公开(公告)日：1999-11-09
申请号：US47402
申请日：1998-03-25
IPC分类号： B01J3/00 , B01J3/03 , B01J3/04 , H01L21/314 , H01L21/324 , H01L21/768 , B30B15/34
CPC分类号： B01J3/008 , B01J3/03 , B01J3/04 , H01L21/314
摘要： A heating pressure processing apparatus in which gas sealing property and safety can be ensured, and economic property can be improved in heating pressure processing of workpieces such as Si wafers sheet by sheet. A processing vessel 1 formed of vessel components 2, 3 is divided into at least two parts or more in the axial direction thereof and has a seal ring 9 provided in the divided parts of the vessel components 2, parts 3 in such a manner as to be replaceable. The vessel components 2, 3 have shaped parts forming a processing space 5 for a workpiece 4 when the divided parts are sealed through the seal ring 9, the vessel components 2, 3 also having cooling means 10 for the seal ring 9. A ram is provided 18 for pressing the vessel components 2, 3 in the axial direction of the vessel in order to ensure the sealing in the divided parts; and a gas introducing device 20 is provided for introducing a pressurized gas to the processing space 5 in order to process the workpiece.
摘要翻译： 能够确保气体密封性和安全性的加热压力处理装置，并且可以逐张地提高诸如Si晶片的工件的加热压力加工的经济性。 由容器部件2,3形成的处理容器1在其轴向上被分成至少两部分以上，并且具有设置在容器部件2，部件3的分割部分中的密封环9， 可更换 容器部件2,3具有成形部件，当分隔部件通过密封环9密封时，形成工件4的处理空间5，容器部件2,3也具有用于密封环9的冷却装置10。 设置用于在容器的轴向方向上按压容器部件2,3，以确保分割部分的密封; 并且设置有用于将加压气体引入处理空间5以便处理工件的气体引入装置20。
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公开(公告)号：US6077053A
公开(公告)日：2000-06-20
申请号：US58185
申请日：1998-04-10
CPC分类号： F04B39/064 , F04B39/0005
摘要： It is intended to provide a piston type gas compressor capable of replacing a seal ring of a piston with a new one while preventing incorporation of metallic particles into a processing gas. A gas suction port 9 and a gas discharge port 10 are formed in a flange 2 of a cylinder 3 in communication with a gas compressing space H. With a plug 7 removed from an internally threaded hole 6A, a free piston 5, together with a seal ring 4, can be inserted into and removed from the cylinder 3 through the internally threaded hole 6A.
摘要翻译： 旨在提供一种活塞式气体压缩机，其能够用新的活塞代替活塞的密封环，同时防止金属颗粒结合到处理气体中。 在与气体压缩空间H连通的气缸3的凸缘2中形成气体吸入口9和气体排出口10.在从内螺纹孔6A除去塞子7的情况下，自由活塞5与 密封环4可以通过内螺纹孔6A插入和移出圆筒3。
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公开(公告)号：US06221743B1
公开(公告)日：2001-04-24
申请号：US09111377
申请日：1998-07-07
申请人： Takao Fujikawa , Yutaka Narukawa , Itaru Masuoka , Kohei Suzuki
发明人： Takao Fujikawa , Yutaka Narukawa , Itaru Masuoka , Kohei Suzuki
IPC分类号： H01L21425
CPC分类号： H01L21/26533 , H01L21/76243
摘要： The present invention provides a method for processing a substrate in which crystal defects occurring according to ion implantation can be prevented from being integrated to form defects such as dislocation or large vacancies in the manufacture of a SIMOX substrate by implanting oxygen atom to a Si base by ion implantation and reacting it with Si to form a buried oxide film. The annealing after ion implantation is performed under a gas atmosphere pressurized to, for example, about 100 MPa. In the pressurized state, a structure having a smaller volume is thermodynamically more stable, and a behavior as increases crystal distortion is arrested in the annealing. Thus, crystal defects can be laid in uniformly dispersed state, vacancies can be also extinguished, and a Si base of good quality suitable for manufacture of ULSI in which defects such as dislocation are reduced can be provided.
摘要翻译： 本发明提供了一种处理衬底的方法，其中可以防止根据离子注入发生的晶体缺陷被集成在SIMOX衬底的制造中，通过将氧原子注入到Si衬底中而形成诸如位错或大空位的缺陷 离子注入并与Si反应形成掩埋氧化膜。 离子注入后的退火在加压至例如约100MPa的气体气氛下进行。 在加压状态下，具有较小体积的结构在热力学上更稳定，并且在退火中阻止增加晶体变形的行为。 因此，可以以均匀分散的状态铺设晶体缺陷，空位也可以熄灭，并且可以提供适合制造其中诸如位错的缺陷减少的ULSI的良好质量的Si基底。
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公开(公告)号：US08647092B2
公开(公告)日：2014-02-11
申请号：US13566281
申请日：2012-08-03
CPC分类号： B30B11/002 , B22F3/003
摘要： A hot isotropic pressure device including: a casing disposed inside a high-pressure container; a heating unit provided inside the casing and forms a hot zone around the treatment material, in which an isotropic pressure treatment is performed on the treatment material using a pressure medium gas. A cooling unit is provided to cool the hot zone by guiding the pressure medium gas, cooled while guided from the upper side toward the lower side at the outside of the casing, into the hot zone. The cooling unit includes a gas introducing unit which guides the pressure medium gas cooled at the outside of the casing from the lower portion of the high-pressure container to the upper portion of the hot zone without any intersection with the pressure medium gas inside the hot zone and introduces the pressure medium gas into the hot zone.
摘要翻译： 一种热等向压力装置，包括：设置在高压容器内的壳体; 加热单元，其设置在所述壳体内部，并且在所述处理材料周围形成热区域，其中使用压力介质气体对所述处理材料进行各向同性压力处理。 提供冷却单元，以通过引导压力介质气体来冷却热区，所述压力介质气体在外壳的外侧从上侧朝向下侧被引导到热区。 冷却单元包括气体引入单元，其将从壳体外部冷却的压力介质气体从高压容器的下部引导到热区的上部，而不与热介质内的压力介质气体相交 将压力介质气体引入热区。
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公开(公告)号：US20130071508A1
公开(公告)日：2013-03-21
申请号：US13566281
申请日：2012-08-03
IPC分类号： B29C43/10
CPC分类号： B30B11/002 , B22F3/003
摘要： A hot isotropic pressure device including: a casing disposed inside a high-pressure container; a heating unit provided inside the casing and forms a hot zone around the treatment material, in which an isotropic pressure treatment is performed on the treatment material using a pressure medium gas. A cooling unit is provided to cool the hot zone by guiding the pressure medium gas, cooled while guided from the upper side toward the lower side at the outside of the casing, into the hot zone. The cooling unit includes a gas introducing unit which guides the pressure medium gas cooled at the outside of the casing from the lower portion of the high-pressure container to the upper portion of the hot zone without any intersection with the pressure medium gas inside the hot zone and introduces the pressure medium gas into the hot zone.
摘要翻译： 一种热等向压力装置，包括：设置在高压容器内的壳体; 加热单元，其设置在所述壳体内部，并且在所述处理材料周围形成热区域，其中使用压力介质气体对所述处理材料进行各向同性压力处理。 提供冷却单元，以通过引导压力介质气体来冷却热区，所述压力介质气体在外壳的外侧从上侧朝向下侧被引导到热区。 冷却单元包括气体引入单元，其将从壳体外部冷却的压力介质气体从高压容器的下部引导到热区的上部，而不与热介质内的压力介质气体相交 将压力介质气体引入热区。
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