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    Marching memory, a bidirectional marching memory, a complex marching memory and a computer system, without the memory bottleneck
    5.
    发明授权
    Marching memory, a bidirectional marching memory, a complex marching memory and a computer system, without the memory bottleneck 有权

    公开(公告)号：US11164612B2

    公开(公告)日：2021-11-02

    申请号：US16744849

    申请日：2020-01-16

    申请人： Tadao Nakamura ,  Michael J. Flynn

    发明人： Tadao Nakamura ,  Michael J. Flynn

    IPC分类号： G11C7/22 ,  G11C19/28 ,  G11C19/18

    摘要： A marching memory is disclosed having an array of memory units. Each memory unit has a sequence of bit level cells. Each bit-level cell has a transfer-transistor having a first main-electrode connected to a clock signal supply line through a first delay element, and a control-electrode connected to an output terminal of a first neighboring bit-level cell positioned at an input side of the array of the memory units, through a second delay element. Each bit-level cell also has a reset-transistor having a first main-electrode connected to a second main-electrode of the transfer-transistor, a control-electrode connected to the clock signal supply line, and a second main-electrode connected to the ground potential. Each bit-level cell also has a capacitor connected in parallel with the reset-transistor.

    Exposure apparatus and method of manufacturing device
    6.
    发明授权
    Exposure apparatus and method of manufacturing device 有权
    曝光装置及其制造方法

    公开(公告)号：US08625069B2

    公开(公告)日：2014-01-07

    申请号：US12141216

    申请日：2008-06-18

    申请人： Nobuhiko Yabu ,  Tadao Nakamura

    发明人： Nobuhiko Yabu ,  Tadao Nakamura

    IPC分类号： G03B27/68 ,  G03B27/52

    CPC分类号： G03B27/42 ,  G03F7/70258 ,  G03F7/70358

    摘要： An exposure apparatus the present invention comprises: an illumination optical system configured to illuminate an illumination area on an original with light from a light source; a projection optical system configured to project a pattern of the original onto a substrate; a first stage configured to hold the original; a second stage configured to hold the substrate; and a controller configured to control driving of at least one of the first stage, the second stage, and an optical element which forms the projection optical system so as to reduce variations in imaging characteristics of the projection optical system, based on a dependence of a transmittance of the pattern on a position in the illumination area.

    摘要翻译： 本发明的曝光装置包括：照明光学系统，被配置为用来自光源的光照射原稿上的照明区域; 投影光学系统，被配置为将原稿的图案投影到基板上; 第一阶段配置为保持原件; 第二级，被配置为保持所述衬底; 以及控制器，其被配置为基于所述投影光学系统的依赖性来控制形成所述投影光学系统的所述第一级，所述第二级和光学元件中的至少一个的驱动，以便减少所述投影光学系统的成像特性的变化 图案在照明区域中的位置的透射率。

    EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
    7.
    发明申请
    EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE 有权
    曝光装置及其制造方法

    公开(公告)号：US20080316447A1

    公开(公告)日：2008-12-25

    申请号：US12141216

    申请日：2008-06-18

    申请人： Nobuhiko Yabu ,  Tadao Nakamura

    发明人： Nobuhiko Yabu ,  Tadao Nakamura

    IPC分类号： G03B27/42

    CPC分类号： G03B27/42 ,  G03F7/70258 ,  G03F7/70358

    摘要： An exposure apparatus the present invention comprises: an illumination optical system configured to illuminate an illumination area on an original with light from a light source; a projection optical system configured to project a pattern of the original onto a substrate; a first stage configured to hold the original; a second stage configured to hold the substrate; and a controller configured to control driving of at least one of the first stage, the second stage, and an optical element which forms the projection optical system so as to reduce variations in imaging characteristics of the projection optical system, based on a dependence of a transmittance of the pattern on a position in the illumination area.

    摘要翻译： 本发明的曝光装置包括：照明光学系统，被配置为用来自光源的光照射原稿上的照明区域; 投影光学系统，被配置为将原稿的图案投影到基板上; 第一阶段配置为保持原件; 第二级，被配置为保持所述衬底; 以及控制器，其被配置为基于所述投影光学系统的依赖性来控制形成所述投影光学系统的所述第一级，所述第二级和光学元件中的至少一个的驱动，以便减少所述投影光学系统的成像特性的变化 图案在照明区域中的位置的透射率。

    Microcomputer and evaluation device, evaluation method thereof
    8.
    发明申请
    Microcomputer and evaluation device, evaluation method thereof 有权
    微电脑及评估装置及其评估方法

    公开(公告)号：US20050060615A1

    公开(公告)日：2005-03-17

    申请号：US10741743

    申请日：2003-12-18

    申请人： Susumu Yamada ,  Tadao Nakamura ,  Susumu Kubota

    发明人： Susumu Yamada ,  Tadao Nakamura ,  Susumu Kubota

    IPC分类号： G06F11/28 ,  G06F11/00 ,  G06F11/22 ,  G06F11/267 ,  G06F12/02 ,  G06F15/78

    CPC分类号： G06F11/2236

    摘要： A microcomputer which outputs address data to an external device for evaluating the address data comprising an address counter specifying an address of a program memory, an address data output section for outputting the address data in the address counter to the external device by use of a clock having a higher frequency provided from the external device than a clock for operating the microcomputer while applying a unit based on a bit number smaller than a bit number of the address data in the address counter.

    摘要翻译： 将地址数据输出到用于评估包括指定程序存储器的地址的地址计数器的地址数据的外部设备的地址数据的微型计算机，用于通过使用时钟将地址计数器中的地址数据输出到外部设备的地址数据输出部分 具有比外部装置提供的频率更高的频率，而不是在地址计数器中基于小于地址数据的位数的位数来应用单元的操作微计算机的时钟。

    ELECTRONIC INK DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
    10.
    发明申请
    ELECTRONIC INK DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF 审中-公开
    电子墨水显示装置及其制造方法

    公开(公告)号：US20100302620A1

    公开(公告)日：2010-12-02

    申请号：US11568038

    申请日：2005-04-20

    申请人： Yasuyuki Makubo ,  Yuichiro Ohmae ,  Tomohiro Tsuji ,  Tadao Nakamura ,  Yoshikazu Hirota

    发明人： Yasuyuki Makubo ,  Yuichiro Ohmae ,  Tomohiro Tsuji ,  Tadao Nakamura ,  Yoshikazu Hirota

    IPC分类号： G02F1/167 ,  B32B37/02 ,  B32B38/00

    CPC分类号： G02F1/167

    摘要： It is an object of the present invention to provide an electronic ink display device provided with a panel structure with excellent mechanical strength and humidity resistance. An electronic ink layer 13 is provided on a TFT substrate 10 through a lamination adhesive layer 12. The electronic ink layer 13 consists of micro capsules with electronic ink sealed therein contained in binders. A PET layer 16 including an ITO layer 15 is provided on the electronic ink layer 13. A TPA layer 11 is formed at one end of the electronic ink layer 13. A protect sheet 20 is provided on the PET layer 16 of FPL through a clear adhesive layer 17. The protect sheet 20 is provided with a humidity resistant barrier film 18 on one principal surface thereof through a clear adhesive layer 19.

    摘要翻译： 本发明的目的是提供一种具有优异的机械强度和耐湿性的面板结构的电子墨水显示装置。 电子墨水层13通过层合粘合剂层12设置在TFT基板10上。电子墨水层13由密封在其中的电子墨水的微胶囊组成。 在电子油墨层13上设置有包含ITO层15的PET层16.在电子油墨层13的一端形成有TPA层11.保护片20通过清晰度设置在FPL的PET层16上 保护片20通过透明粘合剂层19在其一个主表面上设置有耐湿屏障膜18。