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1.发明授权公开(公告)号：US08021534B2
公开(公告)日：2011-09-20
申请号：US12657150
申请日：2010-01-14
申请人： Takashi Niwa , Susumu Ichihara , Koichiro Jujo , Hiroyuki Hoshina
发明人： Takashi Niwa , Susumu Ichihara , Koichiro Jujo , Hiroyuki Hoshina
摘要： To provide an electroforming mold for manufacturing a multi-step structure minute component and a method for manufacturing the same, for which height control is possible and manufacturing process does not become complicated. On the upper face of a film of an electroconductive layer 2 formed on the upper face of a substrate 1, a resist 3 is formed in which a first soluble portion 3b and a first insoluble portion 3a are formed. Next, a light-absorbing body 10 is formed on the upper face of the resist, exposure and development are carried out, in addition a film of an electroconductive layer 2 is formed on the upper face thereof, and a light-absorbing body 10 and an electroconductive layer 5 on the upper face of the light-absorbing body 10 are removed by liftoff. Further, a resist is formed on the upper face thereof, in which a second soluble portion 6b and a second insoluble portion 6a are formed. Next, the first resist and the second resist are developed to remove the first soluble portion 3b and the second soluble portion 6b, thereby giving an electroforming mold 101 having an electroconductive layer on the basal part of respective steps.
摘要翻译： 为了提供一种用于制造多步结构微小部件的电铸模具及其制造方法，其高度控制是可能的，并且制造工艺不会变得复杂。 在形成在基板1的上表面上的导电层2的膜的上表面上，形成有形成第一可溶部分3b和第一不溶部分3a的抗蚀剂3。 接下来，在抗蚀剂的上表面上形成光吸收体10，进行曝光和显影，此外，在其上表面上形成有导电层2的膜，以及光吸收体10和 在吸光体10的上表面上的导电层5通过剥离除去。 此外，在其上表面上形成有抗蚀剂，其中形成有第二可溶部分6b和第二不溶部分6a。 接下来，将第一抗蚀剂和第二抗蚀剂显影以除去第一可溶部分3b和第二可溶部分6b，从而在各步骤的基部上形成具有导电层的电铸模具101。
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2.发明申请公开(公告)号：US20100116670A1
公开(公告)日：2010-05-13
申请号：US12657150
申请日：2010-01-14
申请人： Takashi Niwa , Susumu Ichihara , Koichiro Jujo , Hiroyuki Hoshina
发明人： Takashi Niwa , Susumu Ichihara , Koichiro Jujo , Hiroyuki Hoshina
摘要： To provide an electroforming mold for manufacturing a multi-step structure minute component and a method for manufacturing the same, for which height control is possible and manufacturing process does not become complicated. On the upper face of a film of an electroconductive layer 2 formed on the upper face of a substrate 1, a resist 3 is formed in which a first soluble portion 3b and a first insoluble portion 3a are formed. Next, a light-absorbing body 10 is formed on the upper face of the resist, exposure and development are carried out, in addition a film of an electroconductive layer 2 is formed on the upper face thereof, and a light-absorbing body 10 and an electroconductive layer 5 on the upper face of the light-absorbing body 10 are removed by liftoff. Further, a resist is formed on the upper face thereof, in which a second soluble portion 6b and a second insoluble portion 6a are formed. Next, the first resist and the second resist are developed to remove the first soluble portion 3b and the second soluble portion 6b, thereby giving an electroforming mold 101 having an electroconductive layer on the basal part of respective steps.
摘要翻译： 为了提供一种用于制造多步结构微小部件的电铸模具及其制造方法，其高度控制是可能的，并且制造工艺不会变得复杂。 在形成在基板1的上表面上的导电层2的膜的上表面上，形成有形成第一可溶部分3b和第一不溶部分3a的抗蚀剂3。 接下来，在抗蚀剂的上表面上形成光吸收体10，进行曝光和显影，此外，在其上表面上形成有导电层2的膜，以及光吸收体10和 在吸光体10的上表面上的导电层5通过剥离除去。 此外，在其上表面上形成有抗蚀剂，其中形成有第二可溶部分6b和第二不溶部分6a。 接下来，将第一抗蚀剂和第二抗蚀剂显影以除去第一可溶部分3b和第二可溶部分6b，从而在各步骤的基部上形成具有导电层的电铸模具101。
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3.发明授权公开(公告)号：US07887995B2
公开(公告)日：2011-02-15
申请号：US11326149
申请日：2006-01-05
申请人： Takashi Niwa , Susumu Ichihara , Koichiro Jujo , Hiroyuki Hoshina
发明人： Takashi Niwa , Susumu Ichihara , Koichiro Jujo , Hiroyuki Hoshina
IPC分类号： G03F7/00
摘要： An electroforming mold has a first negative type photosensitive material formed on an electroconductive substrate, and a first through-hole extends through the firs photosensitive material to expose the electroconductive substrate. An electroconductive layer formed on an upper face of the first photosensitive material surrounds the first through-hole. A second negative type photosensitive material formed on an upper face of the electroconductive layer has a second through-hole that overlies and exposes both the first through-hole and a peripheral part of the electroconductive layer that surrounds the first through-hole. Because the electroconductive substrate and the electroconductive layer are separated from one another, the first and second through-holes precipitate an electroformed object independently during use of the electroforming mold resulting in a uniform electroformed object.
摘要翻译： 电铸模具具有形成在导电基体上的第一负型感光材料，第一通孔延伸穿过第一感光材料以露出导电基片。 形成在第一感光材料的上表面上的导电层包围第一通孔。 形成在导电层的上表面上的第二负型感光材料具有覆盖并暴露包围第一通孔的导电层的第一通孔和周边部分的第二通孔。 因为导电基片和导电层彼此分开，所以第一和第二通孔在电铸模使用期间独立地沉淀电铸物体，从而形成均匀的电铸物体。
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4.发明申请公开(公告)号：US20060160027A1
公开(公告)日：2006-07-20
申请号：US11326149
申请日：2006-01-05
申请人： Takashi Niwa , Susumu Ichihara , Koichiro Jujo , Hiroyuki Hoshina
发明人： Takashi Niwa , Susumu Ichihara , Koichiro Jujo , Hiroyuki Hoshina
IPC分类号： G03F7/00
摘要： To provide an electroforming mold for manufacturing a multi-step structure minute component and a method for manufacturing the same, for which height control is possible and manufacturing process does not become complicated. On the upper face of a film of an electroconductive layer 2 formed on the upper face of a substrate 1, a resist 3 is formed in which a first soluble portion 3b and a first insoluble portion 3a are formed. Next, a light-absorbing body 10 is formed on the upper face of the resist, exposure and development are carried out, in addition a film of an electroconductive layer 2 is formed on the upper face thereof, and a light-absorbing body 10 and an electroconductive layer 5 on the upper face of the light-absorbing body 10 are removed by liftoff. Further, a resist is formed on the upper face thereof, in which a second soluble portion 6b and a second insoluble portion 6a are formed. Next, the first resist and the second resist are developed to remove the first soluble portion 3b and the second soluble portion 6b, thereby giving an electroforming mold 101 having an electroconductive layer on the basal part of respective steps.
摘要翻译： 为了提供一种用于制造多步结构微小部件的电铸模具及其制造方法，其高度控制是可能的，并且制造工艺不会变得复杂。 在形成在基板1的上表面上的导电层2的膜的上表面上形成抗蚀剂3，其中形成有第一可溶部分3b和第一不溶部分3a。 接下来，在抗蚀剂的上表面上形成光吸收体10，进行曝光和显影，此外，在其上表面上形成有导电层2的膜，以及光吸收体10和 在吸光体10的上表面上的导电层5通过剥离除去。 此外，在其上表面上形成有抗蚀剂，其中形成有第二可溶部分6b和第二不溶部分6a。 接下来，将第一抗蚀剂和第二抗蚀剂显影以除去第一可溶部分3b和第二可溶部分6b，从而在各步骤的基底部分上形成具有导电层的电铸模具101。
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5.发明申请公开(公告)号：US20100288643A1
公开(公告)日：2010-11-18
申请号：US12376629
申请日：2007-07-10
申请人： Takashi Niwa , Matsuo Kishi , Koichiro Jujo , Hiroyuki Hoshina
发明人： Takashi Niwa , Matsuo Kishi , Koichiro Jujo , Hiroyuki Hoshina
CPC分类号： G03F7/0035 , C25D1/10 , C25D5/022
摘要： In a method of manufacturing an electroforming mold, a first photoresist layer is formed on an upper surface of a bottom conductive film of a substrate, and the first photoresist layer is divided into a first soluble portion and a first insoluble portion. A conductive material is thermally deposited on an upper surface of the first photoresist layer within a predetermined temperature range, to thereby form an intermediate conductive film. An intermediate conductive film is patterned. A second photoresist layer is formed on an exposed upper surface of the first photoresist layer after the intermediate conductive film is removed, and on an upper surface of the intermediate conductive film remaining after patterning. The second photoresist layer is divided into a second soluble portion and a second insoluble portion. Next, the first and second photoresist layers are developed, and the first and second soluble portions are removed.
摘要翻译： 在制造电铸模的方法中，在基板的底部导电膜的上表面上形成第一光致抗蚀剂层，并且将第一光致抗蚀剂层分成第一可溶部分和第一不溶部分。 导电材料在预定温度范围内热沉积在第一光致抗蚀剂层的上表面上，从而形成中间导电膜。 对中间导电膜进行图案化。 在除去中间导电膜之后，在图案化之后残留的中间导电膜的上表面上，在第一光致抗蚀剂层的暴露的上表面上形成第二光致抗蚀剂层。 第二光致抗蚀剂层被分成第二可溶部分和第二不溶部分。 接下来，使第一和第二光致抗蚀剂层被显影，并且去除第一和第二可溶部分。
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6.发明授权公开(公告)号：US08518632B2
公开(公告)日：2013-08-27
申请号：US12376629
申请日：2007-07-10
申请人： Takashi Niwa , Matsuo Kishi , Koichiro Jujo , Hiroyuki Hoshina
发明人： Takashi Niwa , Matsuo Kishi , Koichiro Jujo , Hiroyuki Hoshina
IPC分类号： G03F7/00
CPC分类号： G03F7/0035 , C25D1/10 , C25D5/022
摘要： In a method of manufacturing an electroforming mold, a first photoresist layer is formed on an upper surface of a bottom conductive film of a substrate, and the first photoresist layer is divided into a first soluble portion and a first insoluble portion. A conductive material is thermally deposited on an upper surface of the first photoresist layer within a predetermined temperature range, to thereby form an intermediate conductive film. An intermediate conductive film is patterned. A second photoresist layer is formed on an exposed upper surface of the first photoresist layer after the intermediate conductive film is removed, and on an upper surface of the intermediate conductive film remaining after patterning. The second photoresist layer is divided into a second soluble portion and a second insoluble portion. Next, the first and second photoresist layers are developed, and the first and second soluble portions are removed.
摘要翻译： 在电铸模具的制造方法中，在基板的底部导电膜的上表面上形成第一光致抗蚀剂层，将第一光致抗蚀剂层分割为第一可溶部分和第一不溶部分。 导电材料在预定温度范围内热沉积在第一光致抗蚀剂层的上表面上，从而形成中间导电膜。 对中间导电膜进行图案化。 在除去中间导电膜之后，在图案化之后残留的中间导电膜的上表面上，在第一光致抗蚀剂层的暴露的上表面上形成第二光致抗蚀剂层。 第二光致抗蚀剂层被分成第二可溶部分和第二不溶部分。 接下来，使第一和第二光致抗蚀剂层被显影，并且去除第一和第二可溶部分。
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7.发明授权Method for forming optical aperture, near-field optical head, method for fabricating near-field optical head, and information recording/reading apparatus 有权用于形成光学孔径的方法，近场光学头，用于制造近场光学头的方法以及信息记录/读取装置公开(公告)号：US07366060B2
公开(公告)日：2008-04-29
申请号：US11360279
申请日：2006-02-23
申请人： Takashi Niwa , Kenji Kato , Yasuyuki Mitsuoka , Manabu Oumi , Nobuyuki Kasama , Susumu Ichihara , Hidetaka Maeda , Yoko Shinohara
发明人： Takashi Niwa , Kenji Kato , Yasuyuki Mitsuoka , Manabu Oumi , Nobuyuki Kasama , Susumu Ichihara , Hidetaka Maeda , Yoko Shinohara
IPC分类号： G11B7/00
CPC分类号： G11B7/0937 , G01Q80/00 , G11B7/122 , G11B7/124 , G11B7/1387 , G11B7/22 , G11B11/1058
摘要： A near-field optical head has a main surface confronting a recording medium during use of the near-field optical head. A sharpened tip is disposed on the main surface and has an optical aperture at a front end thereof. An opaque film covers the sharpened tip and has a plastically deformed portion in the vicinity of the optical aperture. The front end of the sharpened tip projects from the plastically deformed portion of the opaque film. At least one stopper is disposed in the vicinity of the sharpened tip and has a height substantially equal to a height of the sharpened tip. At least one air-bearing surface is disposed on the main surface.
摘要翻译： 近场光学头在使用近场光学头期间具有面对记录介质的主表面。 锋利的尖端设置在主表面上并且在其前端具有光学孔。 不透明的膜覆盖尖锐的尖端并且在光学孔径附近具有塑性变形部分。 锋利尖端的前端从不透明膜的塑性变形部分突出。 至少一个止动件设置在尖锐尖端附近，并且具有与尖锐尖端的高度基本相等的高度。 至少一个空气轴承表面设置在主表面上。
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公开(公告)号：US20070177287A1
公开(公告)日：2007-08-02
申请号：US11729754
申请日：2007-03-28
申请人： Kazunari Oka , Takashi Niwa , Norio Chiba , Susumu Ichihara
发明人： Kazunari Oka , Takashi Niwa , Norio Chiba , Susumu Ichihara
CPC分类号： B81C1/00619 , B81B2201/042
摘要： A method of manufacturing a mirror having high verticality and less surface roughness, comprising forming a mask material to the surface of a silicon substrate, applying anisotropic dry etching and anisotropic wet etching, thereby anisotropically dry etching the surface substantially parallel with the crystal face in perpendicular to the surface of the substrate and then forming a reflection surface by the anisotropic wet etching step.
摘要翻译： 一种制造具有高垂直度和较小表面粗糙度的反射镜的方法，包括在硅衬底的表面上形成掩模材料，施加各向异性干法蚀刻和各向异性湿蚀刻，从而各向异性地将垂直于晶体面平行的表面垂直刻蚀 到基板的表面，然后通过各向异性湿蚀刻步骤形成反射表面。
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9.发明申请Optical microcantilever, manufacturing method thereof, and optical microcantilever holder 失效光学微悬臂梁，其制造方法和光学微悬臂梁支架公开(公告)号：US20070062266A1
公开(公告)日：2007-03-22
申请号：US11602373
申请日：2006-11-20
申请人： Takashi Niwa , Kenji Kato , Susumu Ichihara , Norio Chiba , Yasuyuki Mitsuoka , Manabu Oumi , Nobuyuki Kasama
发明人： Takashi Niwa , Kenji Kato , Susumu Ichihara , Norio Chiba , Yasuyuki Mitsuoka , Manabu Oumi , Nobuyuki Kasama
IPC分类号： G01B5/28
摘要： An optical microcantilever capable of reducing loss when propagating light. An optical microcantilever 10 comprises a support 1, an optical waveguide 2, a light-blocking film 3, a reflecting film 4, a pointed tip 5, a microscopic aperture 6 formed at the end of the tip 5, and a mirror 7 for reflecting propagating light H propagated from a light input/output end 8 of the optical waveguide 2 towards the microscopic aperture 6.
摘要翻译： 光学微悬臂梁能够在传播光时减少损耗。 光学微悬臂梁10包括支撑件1，光波导2，遮光膜3，反射膜4，尖端5，形成在尖端5的端部的微小孔6和反射镜 从光波导2的光输入/输出端8向微观孔6传播的传播光H。
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10.发明授权Method for forming optical aperture, near-field optical head, method for fabricating near-field optical head, and information recording/reading apparatus 有权用于形成光学孔径的方法，近场光学头，用于制造近场光学头的方法以及信息记录/读取装置公开(公告)号：US07032427B2
公开(公告)日：2006-04-25
申请号：US09872800
申请日：2001-06-02
申请人： Takashi Niwa , Kenji Kato , Yasuyuki Mitsuoka , Manabu Oumi , Nobuyuki Kasama , Susumu Ichihara , Hidetaka Maeda , Yoko Shinohara
发明人： Takashi Niwa , Kenji Kato , Yasuyuki Mitsuoka , Manabu Oumi , Nobuyuki Kasama , Susumu Ichihara , Hidetaka Maeda , Yoko Shinohara
CPC分类号： G11B7/0937 , G01Q80/00 , G11B7/122 , G11B7/124 , G11B7/1387 , G11B7/22 , G11B11/1058
摘要： In a method of producing an optical aperture, there is provided an object having a substrate, at least one conical- or pyramidal-shaped tip disposed on the substrate, at least one stopper disposed on the substrate in the vicinity of the tip and having a height substantially equal to a height of the tip, and an opaque film disposed at least on the tip. A pressing body is disposed relative to the object so that a surface of the pressing body is disposed over the tip and at least a portion of the stopper. The pressing body is then displaced to bring the surface of the pressing body into contact with the object so that a force component is directed to a front end of the tip to form an optical aperture at the front end of the tip.
摘要翻译： 在制造光学孔径的方法中，提供了一种具有基底的物体，至少一个设置在基底上的圆锥形或锥形末端，至少一个塞子，其设置在尖端附近的基底上，并具有 高度基本上等于尖端的高度，以及至少设置在尖端上的不透明膜。 按压体相对于物体设置，使得按压体的表面设置在尖端和止挡件的至少一部分上。 然后按压体移动以使按压体的表面与物体接触，使得力分量被引导到尖端的前端，以在尖端的前端形成光学孔。
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