公开(公告)号：US20110200663A1

公开(公告)日：2011-08-18

申请号：US12656699

申请日：2010-02-12

申请人： Takumi Hara ,  Kei Tamura ,  Keigo Inosaka ,  Yuji Saeki

发明人： Takumi Hara ,  Kei Tamura ,  Keigo Inosaka ,  Yuji Saeki

IPC分类号： A61K9/70 ,  A61K31/445

CPC分类号： A61K9/7053 ,  A61K31/445 ,  A61K31/4458

摘要： Provided is a methylphenidate patch preparation superior in the stability of a drug (methylphenidate and/or a salt thereof) in the patch preparation, skin permeability of a drug during use of the patch preparation, and methylphenidate availability. A patch preparation having a support and an adhesive layer formed on at least one surface of the support, wherein the adhesive layer contains methylphenidate and/or a salt thereof, polyisobutylene and a liquid plasticizer. The liquid plasticizer preferably has an HLB value of 1.0-3.3.

摘要翻译： 本发明提供了贴剂制剂中药物（哌甲酯和/或其盐）的稳定性优异的哌甲酯贴片制剂，贴剂制剂使用期间药物的皮肤渗透性和哌甲酯可用性。 一种贴片制剂，其具有形成在所述载体的至少一个表面上的载体和粘合剂层，其中所述粘合剂层含有哌甲酯和/或其盐，聚异丁烯和液体增塑剂。 液体增塑剂的HLB值优选为1.0-3.3。

公开(公告)号：US20090264806A1

公开(公告)日：2009-10-22

申请号：US12423900

申请日：2009-04-15

申请人： Kei Tamura ,  Keigo Inosaka ,  Yuji Saeki

发明人： Kei Tamura ,  Keigo Inosaka ,  Yuji Saeki

IPC分类号： A61F13/02 ,  A61K9/70

CPC分类号： A61K31/565 ,  A61K9/7053 ,  A61K9/7092

摘要： The present invention provides a transdermal drug administration device capable of freely controlling release of the drug. The transdermal drug administration device of the present invention contains a backing layer and a matrix layer provided on at least one surface of the backing layer, wherein the matrix layer contains a region located on a proximal side from the backing layer and a region located on a distal side from the backing layer, and the water-absorbing polymers therein have different weight concentrations, which enables high control of a drug released from the device.

摘要翻译： 本发明提供能够自由地控制药物释放的透皮给药装置。 本发明的透皮给药装置包含背衬层和设置在背衬层的至少一个表面上的基质层，其中基质层包含位于背衬层近侧的区域和位于背衬层上的区域 远离背衬层的侧面，并且其中的吸水聚合物具有不同的重量浓度，这使得能够高度控制从该装置释放的药物。

公开(公告)号：US20090142388A1

公开(公告)日：2009-06-04

申请号：US12289003

申请日：2008-10-17

申请人： Keigo Inosaka ,  Kei Tamura ,  Osamu Yoshino

发明人： Keigo Inosaka ,  Kei Tamura ,  Osamu Yoshino

IPC分类号： A61K9/70

CPC分类号： A61K9/7053 ,  A61K47/10 ,  A61K47/32

摘要： The present invention aims at provision of a patch preparation having a small area and permitting adhesion for a long time.The present invention provides a patch preparation having an adhesive layer on at least one surface of a support, wherein the adhesive layer contains an adhesive, a poorly soluble drug, a first organic liquid component, a second organic liquid component, a third organic liquid component and crosslinked polyvinylpyrrolidone, the solubility of the poorly soluble drug in the first organic liquid component is not less than the solubility of the poorly soluble drug in the second organic liquid component, and the solubility of the poorly soluble drug in the second organic liquid component is not less than the solubility of the poorly soluble drug in the third organic liquid component.

摘要翻译： 本发明的目的在于提供具有小面积并且允许长时间粘合的贴片制剂。 本发明提供了一种在支撑体的至少一个表面上具有粘合剂层的贴片制剂，其中所述粘合剂层包含粘合剂，难溶性药物，第一有机液体组分，第二有机液体组分，第三有机液体组分 和交联聚乙烯吡咯烷酮时，难溶性药物在第一有机液体成分中的溶解度不低于难溶性药物在第二有机液体成分中的溶解度，并且难溶性药物在第二有机液体成分中的溶解度为 不低于难溶性药物在第三有机液体成分中的溶解度。

公开(公告)号：US20110281425A1

公开(公告)日：2011-11-17

申请号：US13093186

申请日：2011-04-25

申请人： Kei Tamura ,  Koji Miyoshi

发明人： Kei Tamura ,  Koji Miyoshi

IPC分类号： H01L21/3205 ,  H01L21/311

CPC分类号： H01L21/31144 ,  B81B2203/0384 ,  B81C1/00103 ,  H01L21/31111 ,  H01L21/31155

摘要： A method of manufacturing a semiconductor device includes forming a photoresist pattern on an insulating film formed on a semiconductor substrate by applying a photoresist on the insulating film; processing the insulating film by removing an unnecessary portion of the insulating film by wet etching; and implanting ions into the insulating film before and/or after forming the photoresist pattern. In implanting the ions, the depth of a damaged region formed in the insulating film by implanting the ions is changed in accordance with the presence or absence of the photoresist pattern.

摘要翻译： 制造半导体器件的方法包括通过在绝缘膜上施加光致抗蚀剂，在形成在半导体衬底上的绝缘膜上形成光致抗蚀剂图案; 通过湿蚀刻除去绝缘膜的不需要部分来处理绝缘膜; 以及在形成光致抗蚀剂图案之前和/或之后将离子注入绝缘膜中。 在注入离子时，通过注入离子形成在绝缘膜中的损伤区域的深度根据光刻胶图形的存在或不存在而改变。

公开(公告)号：US07820197B2

公开(公告)日：2010-10-26

申请号：US10502951

申请日：2003-02-13

申请人： Yasuhiro Tsuji ,  Kei Tamura ,  Yuuhiro Yamazaki ,  Yoshihiro Sawai

发明人： Yasuhiro Tsuji ,  Kei Tamura ,  Yuuhiro Yamazaki ,  Yoshihiro Sawai

IPC分类号： A61F13/00 ,  A61K31/66

CPC分类号： A61K9/7053 ,  A61K9/0014 ,  A61K9/7076 ,  A61K31/663 ,  A61K47/06 ,  A61K47/22 ,  A61K47/26

摘要： A bisphosphonic acid derivative-containing percutaneous preparation of an excellent percutaneous permeability, comprising a bisphosphonic acid derivative such as incadronic acid, minodronic acid, etc., or pharmaceutically acceptable salts thereof, a solubilizing agent for the derivative or pharmaceutically acceptable salts thereof, and an amphiphilic solubilizing auxiliary agent, which may optionally contain a suspension-type base such as a polyvalent alcohol, a higher fatty acid ester, a liquid hydrocarbon or a vegetable oil, etc. This preparation has an excellent percutaneous permeability, reduces burdens on the patient, does not deteriorate the patient's compliance even in the administration over a prolonged period of time and can achieve the therapeutic effects in a short period of time.

摘要翻译： 含有双膦酸衍生物如米多昔康酸等的双膦酸衍生物或其药学上可接受的盐，其衍生物或药学上可接受的盐的增溶剂，和 两性增溶助剂，其可以任选地含有悬浮型碱如多元醇，高级脂肪酸酯，液体烃或植物油等。该制剂具有优异的经皮渗透性，减轻患者的负担， 即使在长时间的施用中也不会降低患者的依从性，并且可以在短时间内达到治疗效果。

公开(公告)号：US20100055159A1

公开(公告)日：2010-03-04

申请号：US12612179

申请日：2009-11-04

申请人： Yasuhiro TSUJI ,  Kei Tamura ,  Yuuhiro Yamazaki ,  Yoshihiro Sawai

发明人： Yasuhiro TSUJI ,  Kei Tamura ,  Yuuhiro Yamazaki ,  Yoshihiro Sawai

IPC分类号： A61L15/16 ,  A61K31/66

CPC分类号： A61K9/7053 ,  A61K9/0014 ,  A61K9/7076 ,  A61K31/663 ,  A61K47/06 ,  A61K47/22 ,  A61K47/26

摘要： A bisphosphonic acid derivative-containing percutaneous preparation of an excellent percutaneous permeability, comprising a bisphosphonic acid derivative such as incadronic acid, minodronic acid, etc., or pharmaceutically acceptable salts thereof, a solubilizing agent for the derivative or pharmaceutically acceptable salts thereof, and an amphiphilic solubilizing auxiliary agent, which may optionally contain a suspension-type base such as a polyvalent alcohol, a higher fatty acid ester, a liquid hydrocarbon or a vegetable oil, etc. This preparation has an excellent percutaneous permeability, reduces burdens on the patient, does not deteriorate the patient's compliance even in the administration over a prolonged period of time and can achieve the therapeutic effects in a short period of time.

摘要翻译： 含有双膦酸衍生物如米多昔康酸等的双膦酸衍生物或其药学上可接受的盐，其衍生物或药学上可接受的盐的增溶剂，和 两性增溶助剂，其可以任选地含有悬浮型碱如多元醇，高级脂肪酸酯，液体烃或植物油等。该制剂具有优异的经皮渗透性，减轻患者的负担， 即使在长时间的施用中也不会降低患者的依从性，并且可以在短时间内达到治疗效果。

公开(公告)号：US08293660B2

公开(公告)日：2012-10-23

申请号：US13093186

申请日：2011-04-25

申请人： Kei Tamura ,  Koji Miyoshi

发明人： Kei Tamura ,  Koji Miyoshi

IPC分类号： H01L21/31

CPC分类号： H01L21/31144 ,  B81B2203/0384 ,  B81C1/00103 ,  H01L21/31111 ,  H01L21/31155

摘要： A method of manufacturing a semiconductor device includes forming a photoresist pattern on an insulating film formed on a semiconductor substrate by applying a photoresist on the insulating film; processing the insulating film by removing an unnecessary portion of the insulating film by wet etching; and implanting ions into the insulating film before and/or after forming the photoresist pattern. In implanting the ions, the depth of a damaged region formed in the insulating film by implanting the ions is changed in accordance with the presence or absence of the photoresist pattern.

摘要翻译： 制造半导体器件的方法包括通过在绝缘膜上施加光致抗蚀剂，在形成在半导体衬底上的绝缘膜上形成光致抗蚀剂图案; 通过湿蚀刻除去绝缘膜的不需要部分来处理绝缘膜; 以及在形成光致抗蚀剂图案之前和/或之后将离子注入绝缘膜中。 在注入离子时，通过注入离子形成在绝缘膜中的损伤区域的深度根据光刻胶图形的存在或不存在而改变。

公开(公告)号：US20050106186A1

公开(公告)日：2005-05-19

申请号：US10502951

申请日：2003-02-13

申请人： Yasuhiro Tsuji ,  Kei Tamura ,  Yuuhiro Yamazaki ,  Yoshihiro Sawai

发明人： Yasuhiro Tsuji ,  Kei Tamura ,  Yuuhiro Yamazaki ,  Yoshihiro Sawai

IPC分类号： A61K9/70 ,  A61K31/663 ,  A61K47/04 ,  A61K47/06 ,  A61K47/22 ,  A61K47/26 ,  A61P3/14 ,  A61P19/08 ,  A61P19/10 ,  A61P43/00 ,  A61K31/675 ,  A61K9/00 ,  A61K31/66

CPC分类号： A61K9/7053 ,  A61K9/0014 ,  A61K9/7076 ,  A61K31/663 ,  A61K47/06 ,  A61K47/22 ,  A61K47/26

摘要： A bisphosphonic acid derivative-containing percutaneous preparation of an excellent percutaneous permeability, comprising a bisphosphonic acid derivative such as incadronic acid, minodronic acid, etc., or pharmaceutically acceptable salts thereof, a solubilizing agent for the derivative or pharmaceutically acceptable salts thereof, and an amphiphilic solubilizing auxiliary agent, which may optionally contain a suspension-type base such as a polyvalent alcohol, a higher fatty acid ester, a liquid hydrocarbon or a vegetable oil, etc. This preparation has an excellent percutaneous permeability, reduces burdens on the patient, does not deteriorate the patient's compliance even in the administration over a prolonged period of time and can achieve the therapeutic effects in a short period of time.

摘要翻译： 含有双膦酸衍生物如米多昔康酸等的双膦酸衍生物或其药学上可接受的盐，其衍生物或药学上可接受的盐的增溶剂，和 两性增溶助剂，其可以任选地含有悬浮型碱如多元醇，高级脂肪酸酯，液体烃或植物油等。该制剂具有优异的经皮渗透性，减轻患者的负担， 即使在长时间的施用中也不会降低患者的依从性，并且可以在短时间内达到治疗效果。

公开(公告)号：US08685912B2

公开(公告)日：2014-04-01

申请号：US13580557

申请日：2011-02-23

申请人： Shigeru Maeyama ,  Kei Tamura ,  Akira Shinohara ,  Keita Someya

发明人： Shigeru Maeyama ,  Kei Tamura ,  Akira Shinohara ,  Keita Someya

IPC分类号： C11D1/04 ,  C11D1/72 ,  C11D1/722 ,  C11D3/30

CPC分类号： C11D3/30 ,  C11D1/04 ,  C11D1/40 ,  C11D1/42 ,  C11D1/44 ,  C11D1/72 ,  C11D1/722 ,  C11D1/825 ,  C11D3/0026 ,  C11D3/0073 ,  C11D3/2079 ,  C11D3/3723 ,  C11D3/3773 ,  C11D10/04 ,  C23G1/14

摘要： A detergent composition for metal according to the present invention contains a specific non-ionic surfactant, a specific nitrogen-containing organic compound, a specific carboxylic acid or salt thereof, and a specific alkanol amine, and has a pH of at least 9 that is measured at 25° C. when the detergent composition is diluted to 1% by mass of an aqueous solution. According to the present invention, the detergent composition for metal having excellent corrosion inhibition properties, excellent effluent treatment properties, excellent foaming suppressing properties and excellent liquid stability in addition to high detergent properties for metal, can be provided.

摘要翻译： 根据本发明的金属用洗涤剂组合物含有特定的非离子表面活性剂，特定的含氮有机化合物，特定的羧酸或其盐和特定的链烷醇胺，其pH至少为9，即 当洗涤剂组合物稀释至1质量％的水溶液时在25℃下测量。 根据本发明，可以提供除了金属的高洗涤剂性能以外，具有优异的防腐性，优异的流出物处理性，优异的发泡抑制性和优异的液体稳定性的金属用洗涤剂组合物。

公开(公告)号：US20120316097A1

公开(公告)日：2012-12-13

申请号：US13580557

申请日：2011-02-23

申请人： Shigeru Maeyama ,  Kei Tamura ,  Akira Shinohara ,  Keita Someya

发明人： Shigeru Maeyama ,  Kei Tamura ,  Akira Shinohara ,  Keita Someya

IPC分类号： C11D3/60

CPC分类号： C11D3/30 ,  C11D1/04 ,  C11D1/40 ,  C11D1/42 ,  C11D1/44 ,  C11D1/72 ,  C11D1/722 ,  C11D1/825 ,  C11D3/0026 ,  C11D3/0073 ,  C11D3/2079 ,  C11D3/3723 ,  C11D3/3773 ,  C11D10/04 ,  C23G1/14

摘要： A detergent composition for metal according to the present invention contains a specific non-ionic surfactant, a specific nitrogen-containing organic compound, a specific carboxylic acid or salt thereof, and a specific alkanol amine, and has a pH of at least 9 that is measured at 25° C. when the detergent composition is diluted to 1% by mass of an aqueous solution. According to the present invention, the detergent composition for metal having excellent corrosion inhibition properties, excellent effluent treatment properties, excellent foaming suppressing properties and excellent liquid stability in addition to high detergent properties for metal, can be provided.

摘要翻译： 根据本发明的金属用洗涤剂组合物含有特定的非离子表面活性剂，特定的含氮有机化合物，特定的羧酸或其盐和特定的链烷醇胺，其pH至少为9，即 当洗涤剂组合物稀释至1质量％的水溶液时在25℃下测量。 根据本发明，可以提供除了金属的高洗涤剂性能以外，具有优异的防腐性，优异的流出物处理性，优异的发泡抑制性和优异的液体稳定性的金属用洗涤剂组合物。