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公开(公告)号:US11807830B2
公开(公告)日:2023-11-07
申请号:US17819754
申请日:2022-08-15
申请人: Ecolab USA Inc.
发明人: Ashish Dhawan , Carter Martin Silvernail , Sukhwan Soontravanich , Keith Allen Monk , Michael L. Braden , Paige Mary Owens , Kerrie Elizabeth Walters , Ali Marie Bichler , Izabela A. Owsik , David Myers
IPC分类号: B01D65/02 , C07C211/45 , C07C43/315 , C11D17/00 , C11D3/37 , C11D1/72 , C11D11/00
CPC分类号: C11D1/721 , B01D65/02 , C07C43/315 , C07C211/45 , C11D3/3773 , C11D11/0011 , C11D17/0021
摘要: Surfactants capable of releasing and/or dissolving polymers to form water-soluble or water-dispersible polymer solutions are disclosed. In addition, polymer compositions containing a water-in-oil emulsion comprising the surfactant are provided and can be used, for example, in methods of dissolving a polymer. Also disclosed are detergent compositions and methods of cleaning articles and/or membranes using the surfactants herein. These surfactants and polymer compositions can be used in various industries including for water clarification, papermaking, sewage and industrial water treatment, drilling mud stabilizers, and enhanced oil recovery.
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公开(公告)号:US11732219B2
公开(公告)日:2023-08-22
申请号:US17605129
申请日:2020-05-28
CPC分类号: C11D3/3776 , C11D3/3753 , C11D3/3765 , C11D3/3773 , C11D11/0017 , C11D17/0008
摘要: A liquid laundry additive is provided, comprising a cleaning booster polymer having structural units of a monoethylenically unsaturated carboxylic acid monomer; structural units of an ethylenically unsaturated monomer of formula (I)
optionally, structural units of an ethylenically unsaturated monomer of formula (III)
and optionally, structural units of an ethylenically unsaturated monomer of formula (IV)-
公开(公告)号:US11732217B2
公开(公告)日:2023-08-22
申请号:US17381211
申请日:2021-07-21
申请人: KCTECH CO., LTD.
发明人: Kun Hee Park , Yong Ho Jeong , Kyong Jin Jung , Young Ho Yun
IPC分类号: C11D7/32 , C11D3/24 , C11D3/00 , C11D1/40 , H01L21/304 , C11D11/00 , H01L21/306 , H01L21/321 , C11D3/37
CPC分类号: C11D3/245 , C11D1/40 , C11D3/0047 , C11D3/3773 , C11D11/0047 , H01L21/304 , H01L21/306 , H01L21/3212
摘要: A cleaning solution composition and a cleaning method using the cleaning solution composition are provided. The cleaning solution composition includes a chelating agent including a first organic acid and a second organic acid, and an etching agent including a fluoride compound.
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公开(公告)号:US20230220310A1
公开(公告)日:2023-07-13
申请号:US18177359
申请日:2023-03-02
申请人: THE CLOROX COMPANY
发明人: David R. Scheuing , Thomas F. Fahlen , Jared Heymann , Mike Kinsinger , William Ouellette , William L. Smith
IPC分类号: C11D3/48 , C11D3/37 , C09D133/00 , C09D147/00 , A01N25/10 , A01N59/00 , C11D3/39 , C11D3/395 , C09D7/20 , C09D5/16 , B01J45/00 , C09D139/00 , C09D7/43 , C09D133/02 , C11D3/00 , C11D3/22 , A01N33/12 , B65D81/32
CPC分类号: C11D3/48 , C11D3/378 , C09D133/00 , C09D147/00 , A01N25/10 , A01N59/00 , C11D3/3942 , C11D3/3953 , C09D7/20 , C09D5/1662 , C11D3/3757 , C11D3/3773 , C11D3/3947 , C11D3/3776 , B01J45/00 , C09D139/00 , C09D7/43 , C11D3/3765 , C11D3/3769 , C09D133/02 , C11D3/0036 , C11D3/3956 , C11D3/227 , A01N33/12 , B65D81/3283
摘要: The invention relates to compositions and methods of treatment employing compositions comprising polyelectrolyte complexes. The compositions include a water-soluble first polyelectrolyte bearing a net cationic charge or capable of developing a net cationic charge and a water-soluble second polyelectrolyte bearing a net anionic charge or capable of developing a net anionic charge. The total polyelectrolyte concentration of the first solution is at least 110 millimolar. The composition is free of coacervates, precipitates, latex particles, synthetic block copolymers, silicone copolymers, cross-linked poly(acrylic) and cross-linked water-soluble polyelectrolyte. The composition may be a concentrate, to be diluted prior to use to treat a surface.
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公开(公告)号:US11649310B2
公开(公告)日:2023-05-16
申请号:US16463825
申请日:2017-11-21
发明人: Hannah Benson , Carsten Cohrs , Mike Sahl
IPC分类号: B08B3/04 , C11D3/37 , C08F220/28 , C08F220/34 , C08F220/54 , C08F220/56 , C08F226/04 , B08B3/08 , C08F236/14 , C11D3/00 , C11D11/00
CPC分类号: C08F220/54 , B08B3/08 , C08F220/56 , C08F236/14 , C11D3/0036 , C11D3/378 , C11D3/3773 , C11D11/0023 , C08F226/10 , C08F220/54 , C08F220/60 , C08F220/288 , C08F220/54 , C08F226/02 , C08F220/288 , C08F226/02 , C08F220/54 , C08F216/1433
摘要: What are described are copolymers containing cationic structural units and macromonomeric structural units. The copolymers are, for example, advantageously suitable for use in detergent compositions and lead to advantageous shine results, for example, after application on hard surfaces.
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公开(公告)号:US20180343868A1
公开(公告)日:2018-12-06
申请号:US16055976
申请日:2018-08-06
申请人: FXS Ventures, LLC
发明人: Francis X. Smith
IPC分类号: A01N47/44 , A61K47/26 , C11D3/37 , A61K47/18 , A01N25/00 , A01N33/12 , A61L12/14 , C11D3/22 , C11D3/36 , A01N25/02 , C11D3/48 , C11D3/34 , C11D3/33 , C11D3/32 , C11D3/00 , C11D3/28 , C11D3/30 , C11D3/20 , C11D3/16 , A61K47/22
CPC分类号: A01N47/44 , A01N25/00 , A01N25/02 , A01N33/12 , A61K47/18 , A61K47/22 , A61K47/26 , A61L12/142 , A61L12/145 , A61L12/147 , C11D3/0078 , C11D3/168 , C11D3/2065 , C11D3/222 , C11D3/28 , C11D3/30 , C11D3/32 , C11D3/323 , C11D3/33 , C11D3/3481 , C11D3/361 , C11D3/362 , C11D3/37 , C11D3/3703 , C11D3/3707 , C11D3/3773 , C11D3/48
摘要: The present invention relates to improved ophthalmic solutions that employ select B vitamins; pyridoxine and its salts; and thiamine and its salts in order to more effectively preserve solutions and to reduce the degree to which cationic preservatives will deposit on contact lenses. Ophthalmic solutions are here understood to include contact lens treatment solutions, such as cleaners, soaking solutions, conditioning solutions and lens storage solutions, as well as wetting solutions and in-eye solutions for treatment of eye conditions.
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公开(公告)号:US20180201880A1
公开(公告)日:2018-07-19
申请号:US15743487
申请日:2015-07-10
发明人: Luis Javier Rivera Cruz , Jorge Antonio MALDONADO ORTEGA , Edna AMBUNDO , Victor Omar SERRANO AGUILAR
CPC分类号: C11D3/3723 , C11D1/29 , C11D1/72 , C11D1/90 , C11D1/94 , C11D3/201 , C11D3/2068 , C11D3/222 , C11D3/226 , C11D3/3773 , C11D11/0035
摘要: Disclosed herein are aqueous cleaning compositions comprising at least one surfactant, at least one modified acrylic polyamide present in the aqueous cleaning composition in an amount ranging from about 0.05% to about 2% by weight of the composition, and dipropylene glycol butyl ether. The cleaning compositions disclosed herein will provide low residue and increased shine and will provide long-lasting, persistent anti-fog properties to a substrate after cleaning. Also disclosed herein are methods of cleaning a substrate comprising applying the aqueous cleaning composition to the substrate and wiping, and the use of at least one surfactant, at least one modified acrylic polyamide, and dipropylene glycol butyl ether in an aqueous cleaning composition to provide shine, low residue, and persistent anti-fog properties to a substrate.
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公开(公告)号:US09976111B2
公开(公告)日:2018-05-22
申请号:US15138835
申请日:2016-04-26
发明人: Wen Dar Liu , Yi-Chia Lee , William Jack Casteel, Jr. , Tianniu Chen , Rajiv Krishan Agarwal , Madhukar Bhaskara Rao
IPC分类号: C11D7/26 , C11D11/00 , C11D3/39 , C11D3/43 , C11D3/30 , C11D3/20 , C11D3/33 , C11D3/28 , C11D3/00 , C11D3/37 , H01L21/311 , H01L21/033 , H01L21/768 , H01L21/02
CPC分类号: C11D11/0047 , C11D3/0073 , C11D3/2086 , C11D3/28 , C11D3/30 , C11D3/33 , C11D3/3773 , C11D3/3947 , C11D3/43 , H01L21/02068 , H01L21/0332 , H01L21/31111 , H01L21/31144 , H01L21/32134 , H01L21/76865
摘要: Composition, method and system for PVD TiN hard mask removal from 28/20 nm pattern wafers have been disclosed. The composition uses peroxide as oxidizing agent for PVD TiN hard mask removal under slightly basic conditions. The composition comprises bulky or long chain organic amines or polyalkylamine to improve removal/etching selectivity of PVD TiN vs CVD TiN. The composition further comprises long chain organic acids or amines to maintain Co compatibility.
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公开(公告)号:US09926515B2
公开(公告)日:2018-03-27
申请号:US15397642
申请日:2017-01-03
发明人: Fan-Dan Jan , Bo-Ching Lin , Min-Chun Chung
CPC分类号: C11D3/0078 , A61L12/14 , A61L12/141 , C11D3/06 , C11D3/2065 , C11D3/2082 , C11D3/2086 , C11D3/222 , C11D3/33 , C11D3/3773
摘要: The invention is related to a contact lens care solution comprising a buffer solution, a chelating agent, a surfactant and a wetting agent, wherein the wetting agent comprises 100 parts by weight of glycerol, 0.5 to 40 parts by weight of vinylacetamide-containing polymer and 5 to 40 parts by weight of alginic acid.
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公开(公告)号:US20180072966A1
公开(公告)日:2018-03-15
申请号:US15815817
申请日:2017-11-17
发明人: Mark Robert SIVIK , Rajan Keshav PANANDIKER , Travis Kyle HODGDON , Lidiany GONZALEZ , Ouidad BENLAHMAR , Reinhold Joseph LEYRER , Volodymyr BOYKO , Jules Hanna MIKHAEL
CPC分类号: C11D3/001 , C11D1/62 , C11D3/0015 , C11D3/30 , C11D3/37 , C11D3/373 , C11D3/3773
摘要: The present invention relates to fabric treatment compositions containing multi-phase systems, polymers for use in multi-phase systems as well as products comprising such systems and methods of making and using same. Such treatment compositions may be used for example as laundry additives, and/or through the rinse to provide benefits including enhanced softening, color benefits, and wrinkle reduction.
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