Method of verifying a layout pattern
    1.
    发明授权
    Method of verifying a layout pattern 有权
    验证布局模式的方法

    公开(公告)号:US07913196B2

    公开(公告)日:2011-03-22

    申请号:US11752310

    申请日:2007-05-23

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5081

    摘要: A method of verifying a layout pattern comprises separately steps of obtaining a simulated pattern at a lower portion of a film by using a layout pattern as a mask to transfer the layout pattern to the film, and obtaining a simulated pattern at an upper portion of the film by using the layout pattern as a mask to transfer the layout pattern to the film. The layout pattern is verified according to the upper and lower simulated patterns.

    摘要翻译: 验证布局图案的方法包括单独的步骤,通过使用布局图案作为掩模,在胶片的下部获得模拟图案,以将布局图案转印到胶片上,以及在胶片的上部获得模拟图案 通过使用布局图案作为掩模将电影布局布局转移到电影中。 根据上下模拟图案验证布局图案。

    Method of verifying a layout pattern
    2.
    发明申请
    Method of verifying a layout pattern 有权
    验证布局模式的方法

    公开(公告)号:US20080295062A1

    公开(公告)日:2008-11-27

    申请号:US11752310

    申请日:2007-05-23

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5081

    摘要: A method of verifying a layout pattern comprises separately steps of obtaining a simulated pattern at a lower portion of a film by using a layout pattern as a mask to transfer the layout pattern to the film, and obtaining a simulated pattern at an upper portion of the film by using the layout pattern as a mask to transfer the layout pattern to the film. The layout pattern is verified according to the upper and lower simulated patterns.

    摘要翻译: 验证布局图案的方法包括单独的步骤,通过使用布局图案作为掩模,在胶片的下部获得模拟图案,以将布局图案转印到胶片上,以及在胶片的上部获得模拟图案 通过使用布局图案作为掩模将电影布局布局转移到电影中。 根据上下模拟图案验证布局图案。

    Method for correcting photomask pattern
    3.
    发明授权
    Method for correcting photomask pattern 有权
    光掩模图案校正方法

    公开(公告)号:US07669153B2

    公开(公告)日:2010-02-23

    申请号:US11742372

    申请日:2007-04-30

    IPC分类号: G06F17/50

    CPC分类号: G03F1/36

    摘要: A method for correcting a photomask pattern is provided. The correcting method performs a verification of a focus-exposure matrix (FEM) and an overlay variation on a layout area having contact holes or vias in a layout pattern so as to generate a hint information. The layout pattern of the photomask is corrected according to the hint information to prevent the contact holes or vias from being exposed in arrangement to corresponding metal layer, poly layer, or diffusion layer.

    摘要翻译: 提供了一种用于校正光掩模图案的方法。 校正方法在布局图案中对具有接触孔或通孔的布局区域执行聚焦曝光矩阵(FEM)和覆盖变化的验证,以产生提示信息。 根据提示信息校正光掩模的布局图案,以防止接触孔或通孔暴露于相应的金属层,多晶硅层或扩散层。

    METHOD TO DETERMINE PROCESS WINDOW
    4.
    发明申请
    METHOD TO DETERMINE PROCESS WINDOW 有权
    确定过程窗口的方法

    公开(公告)号:US20100131914A1

    公开(公告)日:2010-05-27

    申请号:US12324858

    申请日:2008-11-27

    IPC分类号: G06F17/50

    CPC分类号: G03F1/36

    摘要: A method to determine a process window is disclosed. First, a pattern data is provided. Second, a bias set is determined. Then, a resizing procedure is performed on the pattern data in accordance with the bias set to obtain a usable final resized pattern to be a target pattern of changed area. The final resized pattern is consistent with a minimum spacing rule, a contact to poly rule and a contact to metal rule. Accordingly, the target pattern is output.

    摘要翻译: 公开了一种确定处理窗口的方法。 首先,提供图案数据。 其次,确定偏差集。 然后,根据偏置设置对图案数据执行调整大小程序,以获得可用的最终调整尺寸图案作为改变区域的目标图案。 最终调整大小的模式与最小间距规则,与多边规则的联系以及与金属规则的联系是一致的。 因此,输出目标图案。

    METHOD FOR CORRECTING PHOTOMASK PATTERN
    5.
    发明申请
    METHOD FOR CORRECTING PHOTOMASK PATTERN 有权
    校正光子图案的方法

    公开(公告)号:US20080270969A1

    公开(公告)日:2008-10-30

    申请号:US11742372

    申请日:2007-04-30

    IPC分类号: G06F17/50

    CPC分类号: G03F1/36

    摘要: A method for correcting a photomask pattern is provided. The correcting method performs a verification of a focus-exposure matrix (FEM) and an overlay variation on a layout area having contact holes or vias in a layout pattern so as to generate a hint information. The layout pattern of the photomask is corrected according to the hint information to prevent the contact holes or vias from being exposed in arrangement to corresponding metal layer, poly layer, or diffusion layer.

    摘要翻译: 提供了一种用于校正光掩模图案的方法。 校正方法在布局图案中对具有接触孔或通孔的布局区域执行聚焦曝光矩阵(FEM)和覆盖变化的验证,以产生提示信息。 根据提示信息校正光掩模的布局图案,以防止接触孔或通孔暴露于相应的金属层,多晶硅层或扩散层。

    Method to determine process window
    6.
    发明授权
    Method to determine process window 有权
    确定过程窗口的方法

    公开(公告)号:US08225237B2

    公开(公告)日:2012-07-17

    申请号:US12324858

    申请日:2008-11-27

    IPC分类号: G06F17/50

    CPC分类号: G03F1/36

    摘要: A method to determine a process window is disclosed. First, a pattern data is provided. Second, a bias set is determined. Then, a resizing procedure is performed on the pattern data in accordance with the bias set to obtain a usable final resized pattern to be a target pattern of changed area. The final resized pattern is consistent with a minimum spacing rule, a contact to poly rule and a contact to metal rule. Accordingly, the target pattern is output.

    摘要翻译: 公开了一种确定处理窗口的方法。 首先,提供图案数据。 其次,确定偏差集。 然后,根据偏置设置对图案数据执行调整大小程序,以获得可用的最终调整尺寸图案作为改变区域的目标图案。 最终调整大小的模式与最小间距规则,与多边规则的联系以及与金属规则的联系是一致的。 因此,输出目标图案。

    METHOD FOR AMENDING LAYOUT PATTERNS
    7.
    发明申请
    METHOD FOR AMENDING LAYOUT PATTERNS 有权
    修改布局图案的方法

    公开(公告)号:US20090300576A1

    公开(公告)日:2009-12-03

    申请号:US12127801

    申请日:2008-05-27

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5081 G03F1/36

    摘要: A method for amending layout patterns is disclosed. First, a layout pattern after an optical proximity correction is provided, which is called an amended pattern. Later, a positive sizing procedure and a negative sizing procedure are respectively performed on the amended pattern to respectively obtain a positive sizing pattern and a negative sizing pattern. Then, the positive sizing pattern and the negative sizing pattern are respectively verified to know whether they are useable. Afterwards, the useable positive sizing pattern and the negative sizing pattern are output for the manufacture of a reticle when they are verified to be useable.

    摘要翻译: 公开了一种修改布局模式的方法。 首先,提供了光学邻近校正之后的布局图案,其被称为修改图案。 然后,分别对修正图案进行正尺寸化程序和负尺寸处理,以分别获得正尺寸图案和负尺寸图案。 然后,分别验证正尺寸图案和负尺码图案以知道它们是否可用。 然后,当验证可以使用时,输出可用的正尺寸图案和负尺寸图案用于制造掩模版。

    Method for amending layout patterns
    8.
    发明授权
    Method for amending layout patterns 有权
    修改布局模式的方法

    公开(公告)号:US07886254B2

    公开(公告)日:2011-02-08

    申请号:US12127801

    申请日:2008-05-27

    IPC分类号: G06F17/50

    CPC分类号: G06F17/5081 G03F1/36

    摘要: A method for amending layout patterns is disclosed. First, a layout pattern after an optical proximity correction is provided, which is called an amended pattern. Later, a positive sizing procedure and a negative sizing procedure are respectively performed on the amended pattern to respectively obtain a positive sizing pattern and a negative sizing pattern. Then, the positive sizing pattern and the negative sizing pattern are respectively verified to know whether they are useable. Afterwards, the useable positive sizing pattern and the negative sizing pattern are output for the manufacture of a reticle when they are verified to be useable.

    摘要翻译: 公开了一种修改布局模式的方法。 首先,提供了光学邻近校正之后的布局图案,其被称为修改图案。 然后,分别对修正图案进行正尺寸化程序和负尺寸处理,以分别获得正尺寸图案和负尺寸图案。 然后,分别验证正尺寸图案和负尺码图案以知道它们是否可用。 然后,当验证可以使用时,输出可用的正尺寸图案和负尺寸图案用于制造掩模版。

    System for finding a missing mobile phone
    9.
    发明申请
    System for finding a missing mobile phone 有权
    找到缺少手机的系统

    公开(公告)号:US20070159299A1

    公开(公告)日:2007-07-12

    申请号:US11328245

    申请日:2006-01-10

    申请人: Pei-Ru Tsai

    发明人: Pei-Ru Tsai

    IPC分类号: H04Q5/22

    CPC分类号: H04M1/7253

    摘要: The present invention is to provide a system for enabling a user to know whereabouts of his or her missing mobile phone, which comprises a mobile phone and a remote controller. The mobile phone comprises a control module including a wireless transceiver unit for receiving a wireless search signal transmitted from the remote controller and adapted to convert the received wireless search signal into an instruction for controlling an output unit of the mobile phone consisting of a light emitting unit, a drive unit, an audio unit, and/or a display unit to generate corresponding light, vibration, sound, and/or display characters for alerting the user. The remote controller comprises a button which, when pressed by the user, causes the remote controller to generate the wireless search signal and transmit the same to the mobile phone for executing the corresponding instruction.

    摘要翻译: 本发明提供一种用于使用户能够知道他或她缺少的移动电话的下落的系统,其包括移动电话和遥控器。 该移动电话包括一个控制模块,该控制模块包括一个无线收发器单元,用于接收从遥控器发送的无线搜索信号,并适用于将接收到的无线搜索信号转换为用于控制由发光单元组成的移动电话的输出单元的指令 ,驱动单元,音频单元和/或显示单元,以产生用于警告用户的对应的光,振动,声音和/或显示字符。 遥控器包括按钮,当用户按下该按钮时,遥控器产生无线搜索信号并将其发送到移动电话以执行相应的指令。

    System for finding a missing mobile phone
    10.
    发明授权
    System for finding a missing mobile phone 有权
    找到缺少手机的系统

    公开(公告)号:US07496359B2

    公开(公告)日:2009-02-24

    申请号:US11328245

    申请日:2006-01-10

    申请人: Pei-Ru Tsai

    发明人: Pei-Ru Tsai

    IPC分类号: H04M3/00

    CPC分类号: H04M1/7253

    摘要: The present invention is to provide a system for enabling a user to know whereabouts of his or her missing mobile phone, which comprises a mobile phone and a remote controller. The mobile phone comprises a control module including a wireless transceiver unit for receiving a wireless search signal transmitted from the remote controller and adapted to convert the received wireless search signal into an instruction for controlling an output unit of the mobile phone consisting of a light emitting unit, a drive unit, an audio unit, and/or a display unit to generate corresponding light, vibration, sound, and/or display characters for alerting the user. The remote controller comprises a button which, when pressed by the user, causes the remote controller to generate the wireless search signal and transmit the same to the mobile phone for executing the corresponding instruction.

    摘要翻译: 本发明提供一种用于使用户能够知道他或她缺少的移动电话的下落的系统,其包括移动电话和遥控器。 该移动电话包括一个控制模块,该控制模块包括一个无线收发器单元,用于接收从遥控器发送的无线搜索信号,并适用于将接收的无线搜索信号转换为用于控制由发光单元组成的移动电话的输出单元的指令 ,驱动单元,音频单元和/或显示单元,以产生用于警告用户的对应的光,振动,声音和/或显示字符。 遥控器包括按钮,当用户按下该按钮时,遥控器产生无线搜索信号并将其发送到移动电话以执行相应的指令。