公开(公告)号：US06418946B1

公开(公告)日：2002-07-16

申请号：US09756615

申请日：2001-01-05

申请人： Vincent L. Marinaro ,  Eric Kent ,  Ted Wakamiya

发明人： Vincent L. Marinaro ,  Eric Kent ,  Ted Wakamiya

IPC分类号： B08B302

CPC分类号： B05B15/55 ,  B05B14/00 ,  B05B15/555 ,  G03F7/162

摘要： An apparatus for cleaning dried photoresist from a photoresist dispensing nozzle. The tip of the photoresist dispensing nozzle is inserted through an opening in a nozzle base. A catch pan is positioned beneath the nozzle base. A solvent dispensing needle is inserted through an opening in the catch pan to face the photoresist dispensing nozzle tip and sprays solvent onto the photoresist dispensing nozzle tip. The catch pan collects the solvent and dissolved photoresist particles. The catch pan includes a drain for draining the solvent and the dissolved photoresist particles.

摘要翻译： 一种用于从光刻胶分配喷嘴清洁干燥的光致抗蚀剂的设备。 光刻胶分配喷嘴的尖端通过喷嘴基座中的开口插入。 捕集盘位于喷嘴底部下方。 溶剂分配针通过捕获盘中的开口插入以面对光刻胶分配喷嘴尖端并将溶剂喷射到光致抗蚀剂分配喷嘴尖端上。 捕集阱收集溶剂和溶解的光致抗蚀剂颗粒。 捕集盘包括用于排出溶剂和溶解的光致抗蚀剂颗粒的排水口。

公开(公告)号：US06170494B2

公开(公告)日：2001-01-09

申请号：US09510411

申请日：2000-02-22

申请人： Vincent L. Marinaro ,  Eric Kent ,  Ted Wakamiya

发明人： Vincent L. Marinaro ,  Eric Kent ,  Ted Wakamiya

IPC分类号： B08B302

CPC分类号： B05B15/55 ,  B05B14/00 ,  B05B15/555 ,  G03F7/162

摘要： A storage apparatus for photoresist dispensing nozzles has solvent inlets positioned directly opposite the nozzles when the nozzles are in their home positions. Photoresist cleaning solvent is introduced through these inlets at periodic intervals and directly applied on the nozzles to keep them clean.

摘要翻译： 用于光刻胶分配喷嘴的存储装置在喷嘴处于其原始位置时具有与喷嘴直接相对的溶剂入口。 光刻胶清洗溶剂通过这些入口以周期性间隔引入，并直接施加在喷嘴上以保持清洁。

公开(公告)号：US06318913B2

公开(公告)日：2001-11-20

申请号：US09829912

申请日：2001-04-11

申请人： Ted Wakamiya ,  Eric Kent ,  Vincent L. Marinaro

发明人： Ted Wakamiya ,  Eric Kent ,  Vincent L. Marinaro

IPC分类号： G03D500

CPC分类号： H01L21/67109 ,  B05C5/001 ,  B05C11/08 ,  G03F7/3021

摘要： Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

摘要翻译： 本发明的实施例包括一种新的装置和技术，以实现利用预先存在的集成单个储存器的化学光刻胶显影剂的改进的温度控制。 通过提供改进的温度控制单元和程序来实现这一改进。 温度控制单元优选地包括多个热交换器管道，每个热交换器管道由进口歧管提供，然后经由出口歧管排出。 温度控制单元优选在改进的喷嘴单元内完全延伸。 通过利用改进的温度控制单元，可以发出显影剂的第一和第二体积分配，使得两者可以在相对较短的时间内被分配在温度受控状态的光致抗蚀剂层表面上。

公开(公告)号：US06250822B1

公开(公告)日：2001-06-26

申请号：US09498196

申请日：2000-02-04

申请人： Ted Wakamiya ,  Eric Kent ,  Vincent L. Marinaro

发明人： Ted Wakamiya ,  Eric Kent ,  Vincent L. Marinaro

IPC分类号： G03D500

CPC分类号： H01L21/67109 ,  B05C5/001 ,  B05C11/08 ,  G03F7/3021

摘要： Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

公开(公告)号：US06481277B1

公开(公告)日：2002-11-19

申请号：US09767619

申请日：2001-01-23

申请人： Ted Wakamiya ,  Gerry Peffer ,  Vincent L. Marinaro

发明人： Ted Wakamiya ,  Gerry Peffer ,  Vincent L. Marinaro

IPC分类号： G01F2330

CPC分类号： G01F23/02 ,  G01F23/64 ,  G01F23/76

摘要： An apparatus for indicating a fluid level in a reservoir includes a conduit for communication with a reservoir and including a sight glass. A buoyant primary float is provided within the conduit, and a stop is provided within the conduit for engaging the primary float to prevent travel of the primary float beyond an upper portion of the conduit. A buoyant secondary float in the conduit is moveable together with the primary float when the primary float is not engaged by the stop, and is moveable separately from the primary float when the primary float is engaged by the stop and a fluid level in the conduit exceeds the level of the stop such that a portion of the secondary float may travel separately within the upper portion of the conduit. The secondary float preferable includes an elongate portion that passes through an aperture in the primary float, and a buoyant upper portion that is located above the primary float and is larger than the aperture in the primary float. The secondary float also preferably includes a lower portion that is located below the primary float and is larger than the aperture in the primary float. The length of the elongate member between the upper and lower portions may be provided to correspond to a distance between a lower surface of the primary float when engaged by the stop, and a predetermined fluid level in the conduit such as the maximum fill level of the reservoir. The elongate member may also include markings calibrated to indicated a remaining fluid capacity of the reservoir relative to a predetermined capacity. A temperature control unit that includes a sight glass with the aforementioned primary and secondary floats is also disclosed.

摘要翻译： 用于指示储存器中的液位的装置包括用于与储存器连通并包括观察窗的导管。 在导管内提供浮力的主浮子，并且在导管内提供止动件用于接合主浮子，以防止主浮子超过导管的上部。 当主浮子不被止动件接合时，导管中的浮力二次浮子与主浮子一起可移动，并且当主浮子与止动件接合并且导管中的液位超过时可与主浮子分开运动 停止水平使得二次浮子的一部分可以在导管的上部分开地行进。 次级浮子优选包括穿过主浮子中的孔的细长部分和位于主浮子上方并且大于主浮子中的孔的浮力上部。 次级浮子还优选地包括位于主浮子下方并且大于主浮子中的孔的下部。 上部和下部之间的细长构件的长度可以设置成对应于主浮子的下表面与止动件接合时的距离以及导管中的预定液位，例如最大填充量 水库 细长构件还可以包括经校准以标示储存器相对于预定容量的剩余流体容量的标记。 还公开了一种温度控制单元，其包括具有上述一次和二次浮子的观察镜。

公开(公告)号：US06336960B1

公开(公告)日：2002-01-08

申请号：US09507845

申请日：2000-02-22

申请人： Vince L. Marinaro ,  Ted Wakamiya ,  Eric Kent

发明人： Vince L. Marinaro ,  Ted Wakamiya ,  Eric Kent

IPC分类号： B01D1900

CPC分类号： B01D36/001 ,  B01D2201/208

摘要： An air bubble purging system for filters include a venturi valve in the drain line of the filter. The venturi valve is connected to a high pressure source line so that when a high rate of flow is produced in the high pressure source line, a venturi effect is created in the venturi valve to open the venturi valve and produce a vacuum in the drain line so that air bubbles are attracted into the drain line and purged.

摘要翻译： 用于过滤器的气泡吹扫系统包括在过滤器的排水管线中的文丘里阀。 文丘里阀连接到高压源管线，使得当在高压源管线中产生高流量时，在文丘里阀中产生文氏管效应以打开文丘里阀并在排水管线中产生真空 使得气泡被吸入排水管并被清洗。

公开(公告)号：US06648201B1

公开(公告)日：2003-11-18

申请号：US10050514

申请日：2002-01-16

申请人： Vincent Marinaro ,  Ted Wakamiya ,  Gerry Peffer

发明人： Vincent Marinaro ,  Ted Wakamiya ,  Gerry Peffer

IPC分类号： B67D560

CPC分类号： B67D7/0261 ,  B65D31/16 ,  B65D2231/002 ,  B67D2001/0828

摘要： The present invention provides for a geometrically shaped pouch and container system for use in the storage, handling and dispensing of liquid chemicals. This system will result in far greater liquid chemical utilization efficiencies.

摘要翻译： 本发明提供用于液体化学品的储存，处理和分配中的几何形状的袋和容器系统。 该系统将导致更高的液体化学品利用效率。

公开(公告)号：US06368985B1

公开(公告)日：2002-04-09

申请号：US09580078

申请日：2000-05-30

申请人： Ted Wakamiya ,  Vince L. Marinaro ,  Eric R. Kent

发明人： Ted Wakamiya ,  Vince L. Marinaro ,  Eric R. Kent

IPC分类号： H01L2131

CPC分类号： H01L21/67225 ,  G03F7/70525 ,  G03F7/70991

摘要： An apparatus for processing semiconductor wafers includes a single imaging stepper for exposing wafers processed on a first track and a second track. A method for processing semiconductor wafers includes selecting one of a first coater and a second coater for coating a first wafer with a photoresist. The coated wafer is exposed in a single stepper to form an exposed wafer. An operator selects one of a first developer and second developer to develop the exposed wafer.

摘要翻译： 一种用于处理半导体晶片的设备包括用于曝光在第一轨道和第二轨道上处理的晶片的单个成像步进器。 一种用于处理半导体晶片的方法包括选择第一涂布机和第二涂布机中的一个，以用光致抗蚀剂涂覆第一晶片。 涂覆的晶片在单个步进器中暴露以形成暴露的晶片。 操作者选择第一显影剂和第二显影剂中的一个以显影曝光的晶片。

公开(公告)号：US06360959B1

公开(公告)日：2002-03-26

申请号：US09592920

申请日：2000-06-13

申请人： Eric R. Kent ,  Vince L. Marinaro ,  Ted Wakamiya

发明人： Eric R. Kent ,  Vince L. Marinaro ,  Ted Wakamiya

IPC分类号： B05B1700

CPC分类号： B05B1/14 ,  B05B9/002

摘要： A dual tip nozzle replaces a single tip nozzle in a resist applicator station to double the number of photoresists that are available. The resist applicator station is of the type having a nozzle holder block, at least one single tip nozzle attached to the nozzle holder bock, and a first resist line extending through the nozzle holder block and into engagement with the nozzle. The dual tip nozzle includes two cavities having respective orifices. Each cavity receives a separate resist line for dispensing separate photoresists.

摘要翻译： 双尖头喷嘴替代抗蚀剂涂布工位中的单个尖端喷嘴，使可用的光致抗蚀剂数量增加一倍。 抗蚀剂涂布工位是具有喷嘴保持器块的类型，附接到喷嘴保持器块的至少一个单个尖端喷嘴，以及延伸穿过喷嘴保持器块并与喷嘴接合的第一抗蚀剂线。 双头喷嘴包括具有相应孔口的两个空腔。 每个腔容纳单独的抗蚀剂线，用于分配单独的光致抗蚀剂。