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公开(公告)号：US5576629A
公开(公告)日：1996-11-19
申请号：US328069
申请日：1994-10-24
申请人： Terry R. Turner , James D. Spain , John R. Swyers
发明人： Terry R. Turner , James D. Spain , John R. Swyers
CPC分类号： H01J37/32963 , B24B37/013 , C23C16/52 , H01J37/32082 , H01J37/32091 , H01J37/32174 , H01J37/32183 , H01J37/32935 , H01J37/3299 , H01L22/26 , H01J2237/334
摘要： A plasma monitoring and control method and system monitor and control plasma in an electronic device fabrication reactor by sensing the voltage of the radio frequency power that is directed into the plasma producing gas at the input to the plasma producing environment of the electronic device fabrication reactor. The method and system further senses the current and phase angle of the radio frequency power directed to the plasma producing gas at the input to the plasma producing environment. Full load impedance is measured and used in determining characteristics of the plasma environment, including not only discharge and sheath impedances, but also chuck and wafer impedances, primary ground path impedance, and a secondary ground path impedance associated with the plasma environment. This permits end point detection of both deposition and etch processes, as well as advanced process control for electronic device fabrication. The invention also provides automatic gain control features for applying necessary signal gain control functions during the end point and advanced process control operations.
摘要翻译： 等离子体监视和控制方法以及系统通过在电子设备制造反应器的等离子体生成环境的输入处感测被引导到等离子体产生气体中的射频功率的电压来监视和控制电子设备制造反应器中的等离子体。 所述方法和系统进一步感测在等离子体产生环境的输入处的等离子体产生气体的射频功率的电流和相位角。 测量全负载阻抗并用于确定等离子体环境的特性，不仅包括放电和护套阻抗，还包括卡盘和晶片阻抗，初级接地路径阻抗和与等离子体环境相关的次级接地路径阻抗。 这允许沉积和蚀刻工艺的终点检测以及电子器件制造的先进工艺控制。 本发明还提供了用于在终点和高级过程控制操作期间应用必要的信号增益控制功能的自动增益控制特征。
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公开(公告)号：US5787875A
公开(公告)日：1998-08-04
申请号：US786152
申请日：1997-01-21
IPC分类号： A01G13/06
CPC分类号： A01G13/06
摘要： A propane burner system for orchards includes a housing, a venturi system, and a propane fuel system. The housing preferably includes a bottom enclosure interconnected with a stack and may be a converted standard fuel burning orchard heater. The venturi system is positioned within the bottom enclosure so that it extends into the stack. The bottom enclosure has at least one vent/fuel opening and the stack preferably includes an igniter opening. The venturi system includes a support system, a flue that is preferably triangular in crosssection, an exhausting chamber, and a deflector plate.
摘要翻译： 用于果园的丙烷燃烧器系统包括壳体，文丘里系统和丙烷燃料系统。 壳体优选地包括与堆叠互连的底部外壳，并且可以是转换的标准燃料燃烧的果园加热器。 文丘里系统位于底部外壳内，使其延伸到堆叠中。 底部外壳具有至少一个通气/燃料开口，并且堆叠优选地包括点火器开口。 文丘里系统包括支撑系统，优选在横截面为三角形的烟道，排气室和偏转板。
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公开(公告)号：US08560106B2
公开(公告)日：2013-10-15
申请号：US13306646
申请日：2011-11-29
IPC分类号： G05B23/00
CPC分类号： G05B23/0283 , Y02P90/86
摘要： A server receives equipment data from third party support equipment during operation of the third party support equipment in a manufacturing environment. The server receives the equipment data via a first port on the third party support equipment. The third party support equipment communicates with a process tool via a second port on third party support equipment. The server determines a future state of the third party support equipment based on the equipment data and notifies a user of the future state of the third party support equipment.
摘要翻译： 在制造环境中的第三方支持设备的操作期间，服务器从第三方支持设备接收设备数据。 服务器通过第三方支持设备上的第一个端口接收设备数据。 第三方支持设备通过第三方支持设备上的第二个端口与进程工具进行通信。 服务器根据设备数据确定第三方支持设备的未来状态，并向用户通知第三方支持设备的未来状态。
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公开(公告)号：US20120191225A1
公开(公告)日：2012-07-26
申请号：US13306646
申请日：2011-11-29
IPC分类号： G05B13/02
CPC分类号： G05B23/0283 , Y02P90/86
摘要： A server receives equipment data from third party support equipment during operation of the third party support equipment in a manufacturing environment. The server receives the equipment data via a first port on the third party support equipment. The third party support equipment communicates with a process tool via a second port on third party support equipment. The server determines a future state of the third party support equipment based on the equipment data and notifies a user of the future state of the third party support equipment.
摘要翻译： 在制造环境中的第三方支持设备的操作期间，服务器从第三方支持设备接收设备数据。 服务器通过第三方支持设备上的第一个端口接收设备数据。 第三方支持设备通过第三方支持设备上的第二个端口与进程工具进行通信。 服务器根据设备数据确定第三方支持设备的未来状态，并向用户通知第三方支持设备的未来状态。
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