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公开(公告)号：US20070036985A1
公开(公告)日：2007-02-15
申请号：US11541144
申请日：2006-09-28
申请人： Kazutaka Kamitani , Kazuyuki Inoguchi , Teruyuki Sasaki , Nobuki Iwai , Hisashi Ogawa , Takashi Muromachi
发明人： Kazutaka Kamitani , Kazuyuki Inoguchi , Teruyuki Sasaki , Nobuki Iwai , Hisashi Ogawa , Takashi Muromachi
CPC分类号： C03C17/009 , C03C17/007 , C03C17/366 , C03C2217/211 , C03C2217/213 , C03C2217/231 , C03C2217/244 , C03C2217/29 , C03C2217/44 , C03C2217/476 , C03C2217/948 , C03C2218/113 , C09D4/00 , C08G77/00
摘要： An infrared ray-cutting glass according to which the capability of an IR-cutting component can be sufficiently maintained while securing sufficient hardness. The IR-cutting glass 100 is comprised of a glass substrate 20, and an IR-cutting film 10 containing ITO fine particles 12 as an infrared ray-cutting component. The IR-cutting film 10 is formed, using an infrared ray-cutting component not containing a fluorine component, on a surface of the glass substrate 20 by a sol-gel method carried out at a low temperature of less than 350° C. The IR-cutting glass 100 having the IR-cutting glass 10 has a haze of not more than 7% after a wear resistance test carried out on the surface on which the IR-cutting film 10 is formed.
摘要翻译： 一种红外线光线切割用玻璃，其能够在确保足够的硬度的同时充分保持IR切断部件的能力。 IR切割玻璃100由玻璃基板20和含有作为红外线光线切断部件的ITO微粒12的IR切断膜10构成。 通过在小于350℃的低温下进行的溶胶 - 凝胶法，在玻璃基板20的表面上形成使用不含氟成分的红外线切断用红外线切断膜10。 在形成有IR切割膜10的表面进行耐磨性试验后，具有IR切割玻璃10的IR切割玻璃100具有不大于7％的雾度。
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2.发明授权Article with organic-inorganic composite film and process for producing the same 失效有机 - 无机复合薄膜及其制备方法公开(公告)号：US07749606B2
公开(公告)日：2010-07-06
申请号：US10594936
申请日：2005-03-31
CPC分类号： C03C17/009 , C03C17/007 , C03C2217/213 , C03C2217/44 , C03C2218/113 , C08J7/047 , C08J2483/00 , C09D1/00 , C09D4/00 , Y10T428/2962 , Y10T428/2995 , Y10T428/31663 , C08G77/00
摘要： An article with an organic-inorganic composite film that contains silica as its main component and does not separate from the substrate after the Taber abrasion test prescribed in Japanese Industrial Standards (JIS) R 3212. This composite film is formed of a coating solution containing a hydrophilic organic polymer by a sol-gel process. In this solution, for example, the amount of silicon alkoxide exceeds 3 mass % in terms of a SiO2 concentration. When the coating solution contains a phosphorus source, the molality of protons is 0.0001 to 0.2 mol/kg while the number of moles of water is at least four times the total number of moles of silicon atoms contained in the silicon alkoxide. This sol-gel process allows a film with excellent mechanical strength to be obtained even when the substrate is not heated up to a temperature exceeding 400° C. and the film thickness exceeds 250 nm.
摘要翻译： 在日本工业标准（JIS）R 3212中规定的泰伯磨损试验之后，含有以二氧化硅为主要成分并且不与基板分离的有机 - 无机复合膜的制品。该复合膜由含有 通过溶胶 - 凝胶法制备亲水性有机聚合物。 在该溶液中，例如，以SiO 2浓度计，硅醇盐的量超过3质量％。 当涂层溶液含有磷源时，质子的摩尔数为0.0001至0.2mol / kg，水的摩尔数至少为硅醇盐中所含的硅原子总摩尔数的四倍。 这种溶胶 - 凝胶法即使当基板未被加热到超过400℃的温度并且膜厚度超过250nm时，也能够获得具有优异机械强度的膜。
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公开(公告)号：US08039111B2
公开(公告)日：2011-10-18
申请号：US12083038
申请日：2006-10-05
CPC分类号： C03C17/009 , Y10T428/26 , Y10T428/265 , Y10T428/31504
摘要： An article with a silica-based film that contains an organic material and has excellent mechanical strength. This article includes a substrate and an organic-inorganic composite film that is formed on the surface of the substrate. The organic-inorganic composite film contains silica as its main component. A value of (0.19A+0.03) or lower (A denotes the film thickness [μm]) is obtained through X-ray diffraction analysis on the organic-inorganic composite film, with the X-ray incident angle being fixed at 1° with respect to the surface of the organic-inorganic composite film, when the intensity of a peak at a diffraction angle of 3° to 10° is standardized using the intensity of a halo pattern peak at a diffraction angle of 20° to 30°. A value of 0.25 or lower is obtained through Fourier transform infrared spectroscopy analysis on the organic-inorganic composite film, when the intensity of a peak at around 950 cm−1 based on a Si—OH group is standardized using the intensity of a peak at around 1100 cm−1 based on a Si—O—Si bond.
摘要翻译： 具有含有有机材料并具有优异机械强度的二氧化硅基膜的制品。 该制品包括基材和形成在基材表面上的有机 - 无机复合膜。 有机 - 无机复合膜含有二氧化硅作为其主要成分。 通过对有机 - 无机复合膜的X射线衍射分析获得（0.19A + 0.03）以下的值（A表示膜厚度[μm]），将X射线入射角度固定为1°， 相对于有机 - 无机复合膜的表面，使用衍射角为20°〜30°的光晕图案峰的强度，将衍射角为3°〜10°的峰的强度标准化。 通过对有机 - 无机复合膜的傅里叶变换红外光谱分析，当使用基于Si-OH基的950cm -1附近的峰强度用标准化的峰强度进行标准化时，可获得0.25以下的值 基于Si-O-Si键约1100cm -1。
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公开(公告)号：US20070212534A1
公开(公告)日：2007-09-13
申请号：US10594606
申请日：2005-03-31
IPC分类号： B32B17/06
CPC分类号： C03C17/009 , C03C17/007 , C03C2217/213 , C03C2217/44 , C03C2218/113 , C08J7/047 , C08J2483/00 , C09D1/00 , C09D4/00 , Y10T428/2962 , Y10T428/2995 , Y10T428/31663 , C08G77/00
摘要： The present invention provides an article with a silica-based film, wherein the film does not separate from a substrate after the Taber abrasion test prescribed in Japanese Industrial Standards (JIS) R 3212 although the thickness of the film formed by a sol-gel process exceeds 300 nm. This film can be formed by an improved sol-gel process, that is, a sol-gel process by using a coating solution wherein silicon alkoxide has a concentration of more than 3 mass % and less than 9 mass % in terms of a SiO2 concentration, the molality of protons is 0.001 to 0.2 mol/kg, and the number of moles of the water is at least four times and at most ten times the total number of moles of the silicon atoms, and by heating a substrate at the temperature above 100° C.
摘要翻译： 本发明提供了一种具有二氧化硅基膜的制品，其中在日本工业标准（JIS）R 3212中规定的泰伯磨损试验之后，该膜不与基底分离，尽管通过溶胶 - 凝胶法形成的膜的厚度 超过300nm。 该膜可以通过改进的溶胶 - 凝胶法形成，即通过使用其中硅醇盐的浓度大于3质量％且小于9质量％的涂覆溶液的溶胶 - 凝胶法， SUB> 2 浓度时，质子的摩尔数为0.001〜0.2mol / kg，水的摩尔数为硅原子总摩尔数的4倍以上10倍以下， 通过在100℃以上的温度下加热基材
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公开(公告)号：US20090246512A1
公开(公告)日：2009-10-01
申请号：US12083038
申请日：2006-10-05
CPC分类号： C03C17/009 , Y10T428/26 , Y10T428/265 , Y10T428/31504
摘要： An article with a silica-based film that contains an organic material and has excellent mechanical strength. This article includes a substrate and an organic-inorganic composite film that is formed on the surface of the substrate. The organic-inorganic composite film contains silica as its main component. A value of (0.19A+0.03) or lower (A denotes the film thickness [μm]) is obtained through X-ray diffraction analysis on the organic-inorganic composite film, with the X-ray incident angle being fixed at 1° with respect to the surface of the organic-inorganic composite film, when the intensity of a peak at a diffraction angle of 3° to 10° is standardized using the intensity of a halo pattern peak at a diffraction angle of 20° to 30°. A value of 0.25 or lower is obtained through Fourier transform infrared spectroscopy analysis on the organic-inorganic composite film, when the intensity of a peak at around 950 cm−1 based on a Si—OH group is standardized using the intensity of a peak at around 1100 cm−1 based on a Si—O—Si bond.
摘要翻译： 具有含有有机材料并具有优异机械强度的二氧化硅基膜的制品。 该制品包括基材和形成在基材表面上的有机 - 无机复合膜。 有机 - 无机复合膜含有二氧化硅作为其主要成分。 通过对有机 - 无机复合膜的X射线衍射分析得到（0.19A + 0.03）以下的值（A表示膜厚度[μm]），将X射线入射角固定为1°， 相对于有机 - 无机复合膜的表面，使用衍射角为20°〜30°的光晕图案峰的强度，将衍射角为3°〜10°的峰的强度标准化。 通过对有机 - 无机复合膜的傅立叶变换红外光谱分析，当使用基于Si-OH基团的约950cm -1处的峰强度通过使用Si-OH基的峰强度来标准化时，获得0.25以下的值 基于Si-O-Si键约1100cm -1。
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6.发明申请公开(公告)号：US20070212571A1
公开(公告)日：2007-09-13
申请号：US10594936
申请日：2005-03-31
IPC分类号： C01B33/152 , B32B13/04 , B32B19/00
CPC分类号： C03C17/009 , C03C17/007 , C03C2217/213 , C03C2217/44 , C03C2218/113 , C08J7/047 , C08J2483/00 , C09D1/00 , C09D4/00 , Y10T428/2962 , Y10T428/2995 , Y10T428/31663 , C08G77/00
摘要： An article with an organic-inorganic composite film that contains silica as its main component and does not separate from the substrate after the Taber abrasion test prescribed in Japanese Industrial Standards (JIS) R 3212. This composite film is formed of a coating solution containing a hydrophilic organic polymer by a sol-gel process. In this solution, for example, the amount of silicon alkoxide exceeds 3 mass % in terms of a SiO2 concentration. When the coating solution contains a phosphorus source, the molality of protons is 0.0001 to 0.2 mol/kg while the number of moles of water is at least four times the total number of moles of silicon atoms contained in the silicon alkoxide. This sol-gel process allows a film with excellent mechanical strength to be obtained even when the substrate is not heated up to a temperature exceeding 400° C. and the film thickness exceeds 250 nm.
摘要翻译： 在日本工业标准（JIS）R 3212中规定的泰伯磨损试验之后，含有以二氧化硅为主要成分并且不与基板分离的有机 - 无机复合膜的制品。该复合膜由含有 通过溶胶 - 凝胶法制备亲水性有机聚合物。 在该溶液中，例如，以SiO 2浓度计，硅烷氧化物的量超过3质量％。 当涂层溶液含有磷源时，质子的摩尔数为0.0001至0.2mol / kg，水的摩尔数至少为硅醇盐中所含的硅原子总摩尔数的四倍。 这种溶胶 - 凝胶法即使当基板未被加热到超过400℃的温度并且膜厚度超过250nm时，也能够获得具有优异机械强度的膜。
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公开(公告)号：US20070289493A1
公开(公告)日：2007-12-20
申请号：US11807455
申请日：2007-05-29
IPC分类号： C04B41/50
CPC分类号： G02B5/208 , C03C17/007 , C03C17/009 , C03C17/366 , C03C2217/213 , C03C2217/228 , C03C2217/231 , C03C2217/244 , C03C2217/29 , C03C2217/45 , C03C2217/475 , C03C2217/476 , C03C2217/948 , C03C2218/114 , C08J7/047 , C09D183/02
摘要： A transparent article with a silica-based infrared shielding film is provided. The film has excellent abrasion resistance and advanced infrared absorbency. The film contains an organic material and an inorganic material and is formed on a surface of the transparent substrate. The film contains silica as the main component and does not separate from the transparent substrate after the Taber abrasion test prescribed in Japanese Industrial Standards (JIS) R 3212 that is carried out with respect to a surface of the film. The film further contains a manganese compound and at least one selected from indium tin oxide and antimony tin oxide. The manganese compound preferably includes manganese oxide.
摘要翻译： 提供了具有二氧化硅基红外屏蔽膜的透明制品。 该膜具有优异的耐磨性和先进的红外吸收性。 该膜含有有机材料和无机材料，并形成在透明基板的表面上。 该薄膜含有二氧化硅作为主要成分，并且在相对于膜的表面进行的日本工业标准（JIS）R 3212中规定的泰伯磨损试验之后，不与透明基板分离。 膜还含有锰化合物和选自氧化铟锡和氧化锑锡中的至少一种。 锰化合物优选包含氧化锰。
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8.发明申请公开(公告)号：US20050005645A1
公开(公告)日：2005-01-13
申请号：US10496704
申请日：2002-11-29
CPC分类号： C03C1/024 , B32B17/10036 , B32B17/10339 , B32B17/10761 , C03B18/12 , C03C1/02 , C03C1/10 , C03C17/007 , C03C2217/45 , C03C2217/475
摘要： The present invention provides a method for manufacturing a glass sheet in which a raw material containing glass cullets is melted to form the glass sheet, wherein the glass cullets include a colored film and this colored film contains an alkali metal oxide, a silicon oxide, and fine particles containing carbon as their main component. The glass cullets can be recycled as a part of the raw material for glass in spite of the colored film included therein since in the glass cullets, the fine particles containing carbon as their main component are contained as a colorant.
摘要翻译： 本发明提供一种玻璃板的制造方法，其中含有玻璃碎片的原料熔化形成玻璃板，其中玻璃碎片包括着色膜，该着色膜含有碱金属氧化物，氧化硅和 以碳为主要成分的微粒子。 作为玻璃原料的一部分，玻璃碎片可以回收，尽管其中包含着色膜，由于在玻璃碎片中含有以碳为主要成分的微粒作为着色剂。
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9.发明申请Glass substrate with colored film fine-particle-containing solution for forming colored film and method for producing glass substrate with colored film 审中-公开具有用于形成着色膜的带有彩色膜微粒的溶液的玻璃基板和用彩色膜制造玻璃基板的方法公开(公告)号：US20050003209A1
公开(公告)日：2005-01-06
申请号：US10496701
申请日：2002-11-29
CPC分类号： C03B18/12 , B32B17/10036 , B32B17/10339 , B32B17/10761 , C03C1/02 , C03C1/024 , C03C1/10 , C03C17/002 , C03C17/007 , C03C2217/452 , C03C2217/475 , Y10T428/25 , Y10T428/265 , Y10T428/31616
摘要： The present invention provides a glass sheet with a colored film that can be recycled as a cutlet raw material. The glass sheet includes a glass substrate and a colored film that coats at least part of the surface thereof. This colored film includes an alkali metal oxide, a silicon oxide, and fine particles containing carbon as their main component. The colored film functions as light-shielding films that reduce the visible light transmittance and ultraviolet transmittance.
摘要翻译： 本发明提供一种具有可作为切片原料再循环的着色膜的玻璃板。 玻璃板包括玻璃基板和涂覆其表面的至少一部分的着色膜。 该着色膜包括碱金属氧化物，氧化硅和以碳为主要成分的微粒。 着色膜用作减少可见光透射率和紫外线透射率的遮光膜。
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公开(公告)号：US20050003210A1
公开(公告)日：2005-01-06
申请号：US10841680
申请日：2004-05-06
CPC分类号： C03C17/007 , C03C2217/45 , C03C2217/475 , C03C2217/476 , Y10T428/257
摘要： The invention provides a substrate with a film, in which functional particles are dispersed, and whose transparency is maintained even when heated. The film includes a matrix including an alkali metal oxide and a silicon oxide, and functional particles dispersed in the matrix is formed on a substrate. The alkali metal oxide includes at least sodium, and lithium and/or potassium. A mole ratio R2O/SiO2 of the alkali metal oxide to the silicon oxide included in the film is in a range of 17/100 to 22/100. The haze ratio of this substrate with a film stays low even when heated.
摘要翻译： 本发明提供一种具有膜的基材，其中功能性颗粒被分散，并且即使在加热时其透明性也被保持。 该膜包括包含碱金属氧化物和氧化硅的基质，分散在基质中的功能性粒子形成在基材上。 碱金属氧化物至少包括钠和锂和/或钾。 包括在膜中的碱金属氧化物与氧化硅的摩尔比R2O / SiO 2在17/100至22/100的范围内。 即使加热，该基板与膜的雾度比也保持较低。
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