-
公开(公告)号：US20070212534A1
公开(公告)日：2007-09-13
申请号：US10594606
申请日：2005-03-31
IPC分类号： B32B17/06
CPC分类号： C03C17/009 , C03C17/007 , C03C2217/213 , C03C2217/44 , C03C2218/113 , C08J7/047 , C08J2483/00 , C09D1/00 , C09D4/00 , Y10T428/2962 , Y10T428/2995 , Y10T428/31663 , C08G77/00
摘要： The present invention provides an article with a silica-based film, wherein the film does not separate from a substrate after the Taber abrasion test prescribed in Japanese Industrial Standards (JIS) R 3212 although the thickness of the film formed by a sol-gel process exceeds 300 nm. This film can be formed by an improved sol-gel process, that is, a sol-gel process by using a coating solution wherein silicon alkoxide has a concentration of more than 3 mass % and less than 9 mass % in terms of a SiO2 concentration, the molality of protons is 0.001 to 0.2 mol/kg, and the number of moles of the water is at least four times and at most ten times the total number of moles of the silicon atoms, and by heating a substrate at the temperature above 100° C.
摘要翻译： 本发明提供了一种具有二氧化硅基膜的制品，其中在日本工业标准（JIS）R 3212中规定的泰伯磨损试验之后，该膜不与基底分离，尽管通过溶胶 - 凝胶法形成的膜的厚度 超过300nm。 该膜可以通过改进的溶胶 - 凝胶法形成，即通过使用其中硅醇盐的浓度大于3质量％且小于9质量％的涂覆溶液的溶胶 - 凝胶法， SUB> 2 浓度时，质子的摩尔数为0.001〜0.2mol / kg，水的摩尔数为硅原子总摩尔数的4倍以上10倍以下， 通过在100℃以上的温度下加热基材
-
公开(公告)号：US20070036985A1
公开(公告)日：2007-02-15
申请号：US11541144
申请日：2006-09-28
申请人： Kazutaka Kamitani , Kazuyuki Inoguchi , Teruyuki Sasaki , Nobuki Iwai , Hisashi Ogawa , Takashi Muromachi
发明人： Kazutaka Kamitani , Kazuyuki Inoguchi , Teruyuki Sasaki , Nobuki Iwai , Hisashi Ogawa , Takashi Muromachi
CPC分类号： C03C17/009 , C03C17/007 , C03C17/366 , C03C2217/211 , C03C2217/213 , C03C2217/231 , C03C2217/244 , C03C2217/29 , C03C2217/44 , C03C2217/476 , C03C2217/948 , C03C2218/113 , C09D4/00 , C08G77/00
摘要： An infrared ray-cutting glass according to which the capability of an IR-cutting component can be sufficiently maintained while securing sufficient hardness. The IR-cutting glass 100 is comprised of a glass substrate 20, and an IR-cutting film 10 containing ITO fine particles 12 as an infrared ray-cutting component. The IR-cutting film 10 is formed, using an infrared ray-cutting component not containing a fluorine component, on a surface of the glass substrate 20 by a sol-gel method carried out at a low temperature of less than 350° C. The IR-cutting glass 100 having the IR-cutting glass 10 has a haze of not more than 7% after a wear resistance test carried out on the surface on which the IR-cutting film 10 is formed.
摘要翻译： 一种红外线光线切割用玻璃，其能够在确保足够的硬度的同时充分保持IR切断部件的能力。 IR切割玻璃100由玻璃基板20和含有作为红外线光线切断部件的ITO微粒12的IR切断膜10构成。 通过在小于350℃的低温下进行的溶胶 - 凝胶法，在玻璃基板20的表面上形成使用不含氟成分的红外线切断用红外线切断膜10。 在形成有IR切割膜10的表面进行耐磨性试验后，具有IR切割玻璃10的IR切割玻璃100具有不大于7％的雾度。
-
公开(公告)号：US08039111B2
公开(公告)日：2011-10-18
申请号：US12083038
申请日：2006-10-05
CPC分类号： C03C17/009 , Y10T428/26 , Y10T428/265 , Y10T428/31504
摘要： An article with a silica-based film that contains an organic material and has excellent mechanical strength. This article includes a substrate and an organic-inorganic composite film that is formed on the surface of the substrate. The organic-inorganic composite film contains silica as its main component. A value of (0.19A+0.03) or lower (A denotes the film thickness [μm]) is obtained through X-ray diffraction analysis on the organic-inorganic composite film, with the X-ray incident angle being fixed at 1° with respect to the surface of the organic-inorganic composite film, when the intensity of a peak at a diffraction angle of 3° to 10° is standardized using the intensity of a halo pattern peak at a diffraction angle of 20° to 30°. A value of 0.25 or lower is obtained through Fourier transform infrared spectroscopy analysis on the organic-inorganic composite film, when the intensity of a peak at around 950 cm−1 based on a Si—OH group is standardized using the intensity of a peak at around 1100 cm−1 based on a Si—O—Si bond.
摘要翻译： 具有含有有机材料并具有优异机械强度的二氧化硅基膜的制品。 该制品包括基材和形成在基材表面上的有机 - 无机复合膜。 有机 - 无机复合膜含有二氧化硅作为其主要成分。 通过对有机 - 无机复合膜的X射线衍射分析获得（0.19A + 0.03）以下的值（A表示膜厚度[μm]），将X射线入射角度固定为1°， 相对于有机 - 无机复合膜的表面，使用衍射角为20°〜30°的光晕图案峰的强度，将衍射角为3°〜10°的峰的强度标准化。 通过对有机 - 无机复合膜的傅里叶变换红外光谱分析，当使用基于Si-OH基的950cm -1附近的峰强度用标准化的峰强度进行标准化时，可获得0.25以下的值 基于Si-O-Si键约1100cm -1。
-
公开(公告)号：US20090246512A1
公开(公告)日：2009-10-01
申请号：US12083038
申请日：2006-10-05
CPC分类号： C03C17/009 , Y10T428/26 , Y10T428/265 , Y10T428/31504
摘要： An article with a silica-based film that contains an organic material and has excellent mechanical strength. This article includes a substrate and an organic-inorganic composite film that is formed on the surface of the substrate. The organic-inorganic composite film contains silica as its main component. A value of (0.19A+0.03) or lower (A denotes the film thickness [μm]) is obtained through X-ray diffraction analysis on the organic-inorganic composite film, with the X-ray incident angle being fixed at 1° with respect to the surface of the organic-inorganic composite film, when the intensity of a peak at a diffraction angle of 3° to 10° is standardized using the intensity of a halo pattern peak at a diffraction angle of 20° to 30°. A value of 0.25 or lower is obtained through Fourier transform infrared spectroscopy analysis on the organic-inorganic composite film, when the intensity of a peak at around 950 cm−1 based on a Si—OH group is standardized using the intensity of a peak at around 1100 cm−1 based on a Si—O—Si bond.
摘要翻译： 具有含有有机材料并具有优异机械强度的二氧化硅基膜的制品。 该制品包括基材和形成在基材表面上的有机 - 无机复合膜。 有机 - 无机复合膜含有二氧化硅作为其主要成分。 通过对有机 - 无机复合膜的X射线衍射分析得到（0.19A + 0.03）以下的值（A表示膜厚度[μm]），将X射线入射角固定为1°， 相对于有机 - 无机复合膜的表面，使用衍射角为20°〜30°的光晕图案峰的强度，将衍射角为3°〜10°的峰的强度标准化。 通过对有机 - 无机复合膜的傅立叶变换红外光谱分析，当使用基于Si-OH基团的约950cm -1处的峰强度通过使用Si-OH基的峰强度来标准化时，获得0.25以下的值 基于Si-O-Si键约1100cm -1。
-
5.发明申请公开(公告)号：US20070212571A1
公开(公告)日：2007-09-13
申请号：US10594936
申请日：2005-03-31
IPC分类号： C01B33/152 , B32B13/04 , B32B19/00
CPC分类号： C03C17/009 , C03C17/007 , C03C2217/213 , C03C2217/44 , C03C2218/113 , C08J7/047 , C08J2483/00 , C09D1/00 , C09D4/00 , Y10T428/2962 , Y10T428/2995 , Y10T428/31663 , C08G77/00
摘要： An article with an organic-inorganic composite film that contains silica as its main component and does not separate from the substrate after the Taber abrasion test prescribed in Japanese Industrial Standards (JIS) R 3212. This composite film is formed of a coating solution containing a hydrophilic organic polymer by a sol-gel process. In this solution, for example, the amount of silicon alkoxide exceeds 3 mass % in terms of a SiO2 concentration. When the coating solution contains a phosphorus source, the molality of protons is 0.0001 to 0.2 mol/kg while the number of moles of water is at least four times the total number of moles of silicon atoms contained in the silicon alkoxide. This sol-gel process allows a film with excellent mechanical strength to be obtained even when the substrate is not heated up to a temperature exceeding 400° C. and the film thickness exceeds 250 nm.
摘要翻译： 在日本工业标准（JIS）R 3212中规定的泰伯磨损试验之后，含有以二氧化硅为主要成分并且不与基板分离的有机 - 无机复合膜的制品。该复合膜由含有 通过溶胶 - 凝胶法制备亲水性有机聚合物。 在该溶液中，例如，以SiO 2浓度计，硅烷氧化物的量超过3质量％。 当涂层溶液含有磷源时，质子的摩尔数为0.0001至0.2mol / kg，水的摩尔数至少为硅醇盐中所含的硅原子总摩尔数的四倍。 这种溶胶 - 凝胶法即使当基板未被加热到超过400℃的温度并且膜厚度超过250nm时，也能够获得具有优异机械强度的膜。
-
6.发明授权Article with organic-inorganic composite film and process for producing the same 失效有机 - 无机复合薄膜及其制备方法公开(公告)号：US07749606B2
公开(公告)日：2010-07-06
申请号：US10594936
申请日：2005-03-31
CPC分类号： C03C17/009 , C03C17/007 , C03C2217/213 , C03C2217/44 , C03C2218/113 , C08J7/047 , C08J2483/00 , C09D1/00 , C09D4/00 , Y10T428/2962 , Y10T428/2995 , Y10T428/31663 , C08G77/00
摘要： An article with an organic-inorganic composite film that contains silica as its main component and does not separate from the substrate after the Taber abrasion test prescribed in Japanese Industrial Standards (JIS) R 3212. This composite film is formed of a coating solution containing a hydrophilic organic polymer by a sol-gel process. In this solution, for example, the amount of silicon alkoxide exceeds 3 mass % in terms of a SiO2 concentration. When the coating solution contains a phosphorus source, the molality of protons is 0.0001 to 0.2 mol/kg while the number of moles of water is at least four times the total number of moles of silicon atoms contained in the silicon alkoxide. This sol-gel process allows a film with excellent mechanical strength to be obtained even when the substrate is not heated up to a temperature exceeding 400° C. and the film thickness exceeds 250 nm.
摘要翻译： 在日本工业标准（JIS）R 3212中规定的泰伯磨损试验之后，含有以二氧化硅为主要成分并且不与基板分离的有机 - 无机复合膜的制品。该复合膜由含有 通过溶胶 - 凝胶法制备亲水性有机聚合物。 在该溶液中，例如，以SiO 2浓度计，硅醇盐的量超过3质量％。 当涂层溶液含有磷源时，质子的摩尔数为0.0001至0.2mol / kg，水的摩尔数至少为硅醇盐中所含的硅原子总摩尔数的四倍。 这种溶胶 - 凝胶法即使当基板未被加热到超过400℃的温度并且膜厚度超过250nm时，也能够获得具有优异机械强度的膜。
-
公开(公告)号：US20100040890A1
公开(公告)日：2010-02-18
申请号：US12519460
申请日：2007-12-17
申请人： Teruyuki Sasaki , Kazutaka Kamitani
发明人： Teruyuki Sasaki , Kazutaka Kamitani
CPC分类号： C08J7/06 , C03C17/007 , C03C2217/452 , C03C2217/47 , C03C2217/48 , C03C2217/78 , C03C2218/113 , C08J2369/00 , Y10T428/25 , Y10T428/259 , Y10T428/31612
摘要： The present invention allows abrasion resistance in silica-based films containing an organic material to be improved. Such a silica-based film contains silica as an inorganic oxide to be its main component, and a poorly water-soluble polymer as an organic material. Example of the poorly water-soluble polymer include a polymer having a solubility of 1.0 g or less with respect to 100 g of water at 25° C., such as polycaprolactone polyol, bisphenol A polyol and glycerol polyol. The silica-based film exhibits good abrasion resistance not only in the Taber abrasion test, but also in the steel wool abrasion test.
摘要翻译： 本发明允许改善含有有机材料的二氧化硅基膜中的耐磨性。 这种二氧化硅系膜作为主要成分含有作为无机氧化物的二氧化硅，作为有机材料含有难溶于水的聚合物。 低水溶性聚合物的实例包括相对于25℃下100g的溶解度为1.0g或更低的聚合物，例如聚己内酯多元醇，双酚A多元醇和甘油多元醇。 二氧化硅基膜不仅在泰伯磨损试验中，而且在钢丝毛磨损试验中也表现出良好的耐磨性。
-
公开(公告)号：US08021749B2
公开(公告)日：2011-09-20
申请号：US12519460
申请日：2007-12-17
申请人： Teruyuki Sasaki , Kazutaka Kamitani
发明人： Teruyuki Sasaki , Kazutaka Kamitani
CPC分类号： C08J7/06 , C03C17/007 , C03C2217/452 , C03C2217/47 , C03C2217/48 , C03C2217/78 , C03C2218/113 , C08J2369/00 , Y10T428/25 , Y10T428/259 , Y10T428/31612
摘要： The present invention allows abrasion resistance in silica-based films containing an organic material to be improved. Such a silica-based film contains silica as an inorganic oxide to be its main component, and a poorly water-soluble polymer as an organic material. Example of the poorly water-soluble polymer include a polymer having a solubility of 1.0 g or less with respect to 100 g of water at 25° C., such as polycaprolactone polyol, bisphenol A polyol and glycerol polyol. The silica-based film exhibits good abrasion resistance not only in the Taber abrasion test, but also in the steel wool abrasion test.
摘要翻译： 本发明允许改善含有有机材料的二氧化硅基膜中的耐磨性。 这种二氧化硅系膜作为主要成分含有作为无机氧化物的二氧化硅，作为有机材料含有难溶于水的聚合物。 低水溶性聚合物的实例包括相对于25℃下100g的溶解度为1.0g或更低的聚合物，例如聚己内酯多元醇，双酚A多元醇和甘油多元醇。 二氧化硅基膜不仅在泰伯磨损试验中，而且在钢丝毛磨损试验中也表现出良好的耐磨性。
-
公开(公告)号：US07006291B2
公开(公告)日：2006-02-28
申请号：US10630925
申请日：2003-07-31
申请人： Masahiro Hori , Teruyuki Sasaki , Hiroaki Yamamoto , Kentaro Fukuda , Kenichi Yamada , Toshiaki Anzaki , Kenjiro Hamanaka , Koichiro Nakamura , Masaatsu Kido
发明人： Masahiro Hori , Teruyuki Sasaki , Hiroaki Yamamoto , Kentaro Fukuda , Kenichi Yamada , Toshiaki Anzaki , Kenjiro Hamanaka , Koichiro Nakamura , Masaatsu Kido
IPC分类号： G02B1/10
CPC分类号： G02B1/14 , G02B1/041 , G02B1/105 , G02B1/113 , G02B3/0006 , G02B3/0031 , G02B3/0056 , C08L63/00
摘要： The optical device having a predetermined surface profile of the invention is fabricated by forming a multi-layered dielectric film on the surface of a solid composition layer having a glass transition temperature of not lower than 100° C. The solid composition layer is formed by molding and curing a polymerizable organic group-having fluid composition. The curing may be effected through photopolymerization or thermal polymerization of the polymerizable organic group in the composition, and a predetermined surface profile is transferred onto the composition layer from the mold used. The cured composition is released from the mold, and this is coated with a multi-layered dielectric film.
摘要翻译： 通过在玻璃化转变温度不低于100℃的固体组合物层的表面上形成多层电介质膜来制造具有本发明的预定表面轮廓的光学装置。固体组合物层通过模制 并固化具有可聚合的含有机基团的流体组合物。 可以通过组合物中的可聚合有机基团的光聚合或热聚合来实现固化，并且将预定的表面轮廓从所使用的模具转移到组合物层上。 固化的组合物从模具中释放，并用多层电介质膜涂覆。
-
-
-
-
-
-
-
-
搜索结果
9 条记录 (耗时 0.025 秒)
