摘要:
A decompression device includes an upstream throttle portion, a middle passage portion and a downstream throttle portion, which are arranged within a body portion. The upstream throttle portion is a variable throttle including an upstream throttle passage in which the refrigerant is decompressed and expanded, and a valve body having an open degree adjusting portion configured to adjust an open degree of the upstream throttle passage. The downstream throttle portion is a fixed throttle for decompressing and expanding refrigerant flowing from the middle passage portion. Furthermore, a refrigerant passage defined from the upstream throttle portion to the downstream throttle portion through the middle passage portion is provided in the body portion, and is bent at least at a bent portion in which the refrigerant flow is bent in the body portion.
摘要:
A decompression device includes an upstream throttle portion, a middle passage portion and a downstream throttle portion, which are arranged within a body portion. The upstream throttle portion is a variable throttle including an upstream throttle passage in which the refrigerant is decompressed and expanded, and a valve body having an open degree adjusting portion configured to adjust an open degree of the upstream throttle passage. The downstream throttle portion is a fixed throttle for decompressing and expanding refrigerant flowing from the middle passage portion. Furthermore, a refrigerant passage defined from the upstream throttle portion to the downstream throttle portion through the middle passage portion is provided in the body portion, and is bent at least at a bent portion in which the refrigerant flow is bent in the body portion.
摘要:
A condenser of a refrigerant cycle system includes a first heat exchange unit into which refrigerant discharged from a compressor flows, a second heat exchange unit disposed at a downstream of the first heat exchange unit in a refrigerant flow direction, and a gas-liquid separator disposed between the first and second heat exchange units in the refrigerant flow direction. In the refrigerant cycle system, at least gas refrigerant separated in the gas-liquid separator flows into the second heat exchange unit so that an amount of liquid refrigerant stored in the gas-liquid separator is changed in accordance with a super-heating degree of refrigerant discharged from the compressor.
摘要:
A first heat exchange unit is for condensing a refrigerant discharged from a compressor. A second heat exchange unit is provided downstream from the first heat exchange unit. A gas-liquid separator, into which part of the refrigerant from the compressor and part of the refrigerant from the first exchange unit flow, is for separating the refrigerants into a gas and a liquid refrigerant to accumulate the liquid refrigerant. The gas refrigerant in the separator is lead to the second heat exchange unit. A primary refrigerant flow path, included in the first heat exchange unit, is for leading the refrigerant to the second heat exchange unit. A branch refrigerant flow path, included in the first heat exchange unit and independently partitioned from the primary refrigerant flow path, is for leading the refrigerant to the separator.
摘要:
A variable restrict valve is disposed at the upstream side of a refrigerant flow, a fixed restrictor is disposed at the downstream side of the variable restrict valve, an intermediate space is provided between the variable restrict valve and the fixed restrictor, a passage sectional area of the intermediate space is set to be larger than the fixed restrictor and passage length L of the intermediate space is set to be larger than a predetermined length required when the flow of refrigerant injected from the variable restrict valve expands more than the passage sectional area of the fixed restrictor.
摘要:
An accumulator is disposed in a refrigerant circuit at a position on the suction side of a compressor, separates the gas and liquid phases of the refrigerant, and contains the liquid refrigerant. The accumulator comprises: a pressure container (2) having an inner space (S) formed therein; a refrigerant inlet opening (5) provided in the pressure container; a refrigerant outlet opening (6); a conduction pipe (8) for conducting a refrigerant within the pressure container to the outlet opening; and a gas-liquid separation means (15) provided with a separation plate (16) provided within the pressure container so as to face the inlet opening and so as to expand substantially perpendicularly to the direction of the line of flow at the inlet opening. The gas-liquid separation means has, in the region of the separation plate which faces the inlet opening, a mountain-shaped protrusion (18) having a crest (18a) and a sloped surface (18b), the crest (18a) protruding toward the inlet opening.
摘要:
A method for forming a circuit pattern is disclosed. A circuit pattern that forms an electrically conductive layer (2L) is formed on an insulating resin (11) that forms a first insulating layer (1L). An insulating resin (13) that forms a second insulating layer (3L) is laminated on the insulating resin (11) on which the circuit pattern has been formed. A trench (14) is formed in the laminated insulating resin (13) to expose the circuit pattern. An electroless plating metal (15) is buried by electroless plating in the trench (14) formed.
摘要:
A surface processing method and a surface processing agent for effectively removing smear produced in a via or the like are disclosed. The smear is to be removed without etching an inner metalized layer without using expensive permanganates that might impose a greater load on an environment and operators. By removing the smear, the tightness in adhesion between an inner metalized circuit layer and plating metal as well as reliability in electrical connection may be improved. To this end, a surface processing method for a resin-containing substrate of a printed circuit board is provided in which the smear left in an opening, such as a blind via, a through-hole or a trench, formed in the substrate, may be removed without etching a metalized inner layer. The surface processing method immerses the interconnect substrate in a weakly acidic to weakly alkaline first processing solution at least containing hydrogen peroxide and subsequently in a second processing solution at least containing an alkali compound and an organic solvent.
摘要:
A refrigerant cycle system includes a first heat-exchanging portion for condensing gas refrigerant discharged from a compressor, a gas-liquid separator into which all of refrigerant after passing through the first heat-exchanging portion and a part of gas refrigerant discharged from the compressor are introduced, and a second heat-exchanging portion for cooling and condensing refrigerant flowing from the gas-liquid separator. Because all of the condensed refrigerant from the first heat-exchanging portion is introduced into the gas-liquid separator, a passage area of a gas refrigerant introduction passage for introducing gas refrigerant from the compressor into the gas-liquid separator can be set relatively large. Therefore, a dimension difference of the gas refrigerant introducing passage in manufacturing is not greatly affected to an adjustment of a liquid refrigerant amount in the gas-liquid separator.
摘要:
Disclosed is an electroless plating solution exhibiting a good plating metal filling performance even for larger trenches or vias of several to one hundred and tens of μm, in a manner free from voids or seams, and allowing maintenance of stabilized performance for prolonged time. The electroless plating solution contains at least a water-soluble metal salt, a reducing agent for reducing metal ions derived from the water-soluble metal salt, and a chelating agent. In addition, the electroless plating solution contains a sulfur-based organic compound as a leveler having at least one aliphatic cyclic group or aromatic cyclic group to which may be linked at least one optional substituent. The aliphatic cyclic group or the aromatic cyclic group contains optional numbers of carbon atoms, oxygen atoms, phosphorus atoms, sulfur atoms and nitrogen atoms.