公开(公告)号：US20070252963A1

公开(公告)日：2007-11-01

申请号：US10583985

申请日：2004-12-22

申请人： Theodorus Modderman ,  Nicolaas Antonius Allegondus Van Asten ,  Johan Van Boxmeer ,  Gerrit Nijmeijer

发明人： Theodorus Modderman ,  Nicolaas Antonius Allegondus Van Asten ,  Johan Van Boxmeer ,  Gerrit Nijmeijer

IPC分类号： G03B27/32 ,  G03C5/00

CPC分类号： G03B27/42 ,  G03F9/7003 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7034

摘要： A method of exposing a substrate (e.g. in a lithographic apparatus comprising a substrate table to support a substrate) according to one embodiment of the invention includes performing first and a second height measurement of a part of at least one substrate with a first and second sensor, generating and storing an offset error map based on a difference between the measurements; generating and storing a height map of portions of the substrate (or another substrate that has had a similar processing as the part) by performing height measurements with the first sensor and correcting this height map by means of the offset error map; and exposing the substrate (or the other substrate).

摘要翻译： 根据本发明的一个实施例的曝光衬底（例如，在包括衬底台的光刻设备中以支撑衬底）的方法包括使用第一和第二传感器执行至少一个衬底的一部分的第一和第二高度测量 基于所述测量之间的差产生和存储偏移误差图; 通过利用第一传感器执行高度测量并通过偏移误差图校正该高度图来生成和存储基板（或具有与该部分相似的处理的另一基板）的部分的高度图; 并使基板（或另一个基板）曝光。

公开(公告)号：US20050134816A1

公开(公告)日：2005-06-23

申请号：US10740824

申请日：2003-12-22

申请人： Theodorus Modderman ,  Nicolaas Antonius Allegondus Van Asten ,  Gerrit Nijmeijer

发明人： Theodorus Modderman ,  Nicolaas Antonius Allegondus Van Asten ,  Gerrit Nijmeijer

IPC分类号： G03F9/00 ,  G03B27/42

CPC分类号： G03F9/7053 ,  G03F9/7026 ,  G03F9/7034 ,  G03F9/7049

摘要： A method of exposing a substrate (e.g. in a lithographic apparatus comprising a substrate table to support a substrate) according to one embodiment of the invention includes performing first and a second height measurement of a part of at least one substrate with a first and second sensor, generating and storing an offset error map based on a difference between the measurements; generating and storing a height map of portions of the substrate (or another substrate that has had a similar processing as the part) by performing height measurements with the first sensor and correcting this height map by means of the offset error map; and exposing the substrate (or the other substrate).

摘要翻译： 根据本发明的一个实施例的曝光衬底（例如，在包括衬底台的光刻设备中以支撑衬底）的方法包括使用第一和第二传感器执行至少一个衬底的一部分的第一和第二高度测量 基于所述测量之间的差产生和存储偏移误差图; 通过利用第一传感器执行高度测量并通过偏移误差图校正该高度图来生成和存储基板（或具有与该部分相似的处理的另一基板）的部分的高度图; 并使基板（或另一个基板）曝光。

公开(公告)号：US20070013915A1

公开(公告)日：2007-01-18

申请号：US11446563

申请日：2006-06-05

申请人： Nicolaas Antonius Allegondus Van Asten ,  Oana Balan ,  Luberthus Ouwehand ,  Machiel Jacobus Viguurs ,  Alexander Charles Van Well ,  Lun Cheng ,  Huibert Blokland ,  Elke Loenhout ,  Hans Bakker

发明人： Nicolaas Antonius Allegondus Van Asten ,  Oana Balan ,  Luberthus Ouwehand ,  Machiel Jacobus Viguurs ,  Alexander Charles Van Well ,  Lun Cheng ,  Huibert Blokland ,  Elke Loenhout ,  Hans Bakker

IPC分类号： G01B11/02

CPC分类号： G03F9/7049 ,  G01B11/0625 ,  G03F9/7034 ,  G03F9/7088

摘要： A level sensor for determining a height of a substrate. In one configuration, the level sensor forms part of a lithographic apparatus that includes a projection lens system. The level sensor generates one or more measurement beams and directs the measurement beam to a measurement spot on a substrate having a first reflecting surface, and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal. In one configuration, the level sensor has an optical element arranged to direct the reference beam towards a detection branch via an optical reference path arranged to be insensitive to the position of the projection lens system and the first reflecting surface. In one configuration, the level sensor is configured to direct the measurement beam and reference beam along optical paths that are at least partially substantially equal in at least one of the reference branch and the projection branch.

摘要翻译： 一种用于确定基板的高度的液位传感器。 在一种配置中，液位传感器构成包括投影透镜系统的光刻设备的一部分。 液位传感器产生一个或多个测量光束并将测量光束引导到具有第一反射表面的衬底上的测量点，并产生反射的测量光束。 液位传感器还产生一个或多个参考光束。 检测器分别检测反射的测量光束和参考光束，分别产生测量信号和参考信号，测量信号指示测量点处的高度。 接收这些信号并根据参考信号校正测量信号的处理器。 在一种配置中，液位传感器具有光学元件，其布置成经由布置成对投影透镜系统和第一反射表面的位置不敏感的光学参考路径将参考光束引向检测支路。 在一种配置中，水平传感器被配置成沿着在至少一个参考分支和投影分支中至少部分地相等的光路引导测量光束和参考光束。

公开(公告)号：US20060274324A1

公开(公告)日：2006-12-07

申请号：US11252254

申请日：2005-10-18

申请人： Nicolaas Antonius Allegondus Van Asten ,  Oana Balan ,  Luberthus Ouwehand ,  Machiel Jacobus Viguurs ,  Alexander Charles Van Well ,  Lun Cheng ,  Huibert Blokland ,  Elke Van Loenhout ,  Hans Baltus Bakker

发明人： Nicolaas Antonius Allegondus Van Asten ,  Oana Balan ,  Luberthus Ouwehand ,  Machiel Jacobus Viguurs ,  Alexander Charles Van Well ,  Lun Cheng ,  Huibert Blokland ,  Elke Van Loenhout ,  Hans Baltus Bakker

IPC分类号： G01B11/02

CPC分类号： G03F9/7049 ,  G01B11/0625 ,  G03F9/7034 ,  G03F9/7088

摘要： The invention relates to a level sensor for determining a height of a substrate. The level sensor generates one or more measurement beam and directs the measurement beam to a measurement spot on the substrate and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal. The level sensor has an optical arrangement in a predetermined area close to where the substrate is to be located. The measurement beam and the reference beam propagate along substantially equal optical paths of propagation in the predetermined area. The optical arrangement deviates the reference beam from the substantially equal optical paths of propagation in the predetermined area such that the at least one reference beam does not hit the substrate.

摘要翻译： 本发明涉及一种用于确定基板高度的液位传感器。 液位传感器产生一个或多个测量光束，并将测量光束引导到衬底上的测量点，并产生反射的测量光束。 液位传感器还产生一个或多个参考光束。 检测器分别检测反射的测量光束和参考光束，分别产生测量信号和参考信号，测量信号指示测量点处的高度。 接收这些信号并根据参考信号校正测量信号的处理器。 液位传感器在靠近基板的位置的预定区域具有光学布置。 测量光束和参考光束沿预定区域中基本相等的传播光路传播。 光学布置将参考光束从预定区域中的基本上相等的传播光路径偏离，使得至少一个参考光束不会撞击基板。