摘要:
A system (10) is provided for approximating a nonlinear function. The system (10) comprises first and second multiple generating circuits (12) and (14) for multiplying a first quantity and a second quantity by up to three integer powers of two. First and second function generating circuits (16) and (18) generate first and second functions of the first and the second quantities by combining the multiples generated in first and second multiple generating circuits (12) and (14). First and second approximation generating circuits (20) and (22) generate first and second approximations of the nonlinear function by shifting the output of first and second function generating circuits (16) and (18). Approximation selecting circuit (24) outputs the appropriate approximation generated in first and second approximation generating circuits (20) and (22).
摘要:
A scanning electron microscope (28) is connected to a test structure (48) formed on a semiconductor wafer. The test structure (48) comprises a plurality of first parallel structures (54) and a plurality of second parallel structure (56) transverse to and interlocking with the first structures (54). An island (60) is formed within a grid (58) formed by the structures (54-56) and is separated therefrom. An electron beam (38) from the scanning electron microscope (28) is aimed at the structure (48) and secondary electrons emitted therefrom are visually displayed on a monitor (44). The visual display (47) provides information on whether the island (60) is electrically separated from the mesh (58) or shorted thereto by comparing the intensity of the various islands (60).
摘要:
Memory chips with data memory (202), embedded logic (206) and broadcast memory (204) for two modes of operation are disclosed. A first mode of operation is the usual memory mode expected of a data RAM. The second mode of operation allows localized computation and/or processing of the data in data memory (202) by the embedded logic (206) with minimal handshaking with a remote CPU. In a functioning system, the memory chips are organized in a hierarchical manner and include address-associative memory systems.
摘要:
An absolute time scale clock includes a radioactive isotope and a computer. The computer includes a processor that determines an indication of the current absolute time and a memory that stores a decay constant of the radioactive isotope, a reference time, and an amount of the isotope at the reference time. A energy supply that provides power to the computer. The absolute time scale clock further includes a detector positioned to respond to emissions from the radioactive isotope. The detector generates an indication of the number of emissions over a time interval that varies with the decay rate of the isotope. The processor is responsive to the indication from the detector, the decay constant, the reference time, and the reference amount to determine the indication of current absolute time.
摘要:
A scanning electron microscope (28) is connected to a test structure (48) formed on a semiconductor wafer. The test structure (48) comprises a plurality of first parallel structures (54) and a plurality of second parallel structure (56) transverse to and interlocking with the first structures (54). An island (60) is formed within a grid (58) formed by the structures (54-56) and is separated therefrom. An electron beam (38) from the scanning electron microscope (28) is aimed at the structure (48) and secondary electrons emitted therefrom are visually displayed on a monitor (44). The visual display (47) provides information on whether the island (60) is electrically separated from the mesh (58) or shorted thereto by comparing the intensity of the various islands (60).
摘要:
A method for fabricating an integrated circuit includes the steps of: providing a substrate having a semiconductor surface; providing a hardmask material on the semiconductor surface. For at least one masking level of the integrated circuit: providing a mask pattern for the masking level partitioned into a first mask and at least one second mask, the first mask providing features in a first grid pattern and the at least one second mask providing features in a second grid pattern, wherein the first and the second grid pattern have respective features which interleave with one another over at least one area; applying a first photoresist layer with the first mask; exposing the first grid pattern using the first mask; developing the first photoresist layer; etching the hardmask material to transfer the first grid pattern in the surface of the substrate; removing the first photoresist layer.
摘要:
An integrated circuit (IC) die has an on-die parametric test module. A semiconductor substrate has die area, and a functional IC formed on an IC portion of the die area including a plurality of circuit elements configured for performing a circuit function. The on-die parametric test module is formed on the semiconductor substrate in a portion of the die area different from the IC portion. The on-die parametric test module includes a reference layout that provides at least one active reference MOS transistor, wherein the active reference MOS transistor has a reference spacing value for each of a plurality of context dependent effect parameters. A plurality of different variant layouts are included on the on-die parametric test module. Each variant layout provides at least one active variant MOS transistor that provides a variation with respect to the reference spacing value for at least one of the context dependent effect parameters.
摘要:
The present disclosure is directed a method for preparing photomask patterns. The method comprises receiving drawn pattern data for a design database. The drawn pattern data describes first device features and second device features, the second device features being associated with design specifications for providing a desired connectivity of the first device features to the second device features. At least a first plurality of the first device features have drawn patterns that will not result in sufficient coverage to effect the desired connectivity. Photomask patterns are formed for the first device features, wherein the photomask patterns for the first plurality of the first device features will result in the desired coverage. Integrated circuit devices formed using the principles of the present disclosure are also taught.
摘要:
A system and method for communicating with a wireless device to automatically toggle the alert. The control station automatically transmits at least one signal to the wireless device, which instructs the wireless device to use a silent alert. The control station can also include a database for storing identifiers of wireless devices having users who must remain available, allowing those wireless devices to use a tactile alert instead of a silent alert. The control station can automatically instruct the wireless device to use a silent alert, a tactile alert, or an audible alert depending upon the time of day.
摘要:
A method of performing and verifying an integrated circuit layout is provided that comprises the steps of performing the layout of a mask. Proximity correction techniques are then applied to the mask layout data. Theoretical contours which comprise curvilinear forms are then extrapolated from the corrected mask data set. The curvilinear contour data is then bounded using boxing algorithms in order to generate a bounded contour data set. The bounded contour data set can then be compared to the original input mask data to detect design rule violations and other characteristics of the original layout.