System and method for approximating nonlinear functions
    1.
    发明授权
    System and method for approximating nonlinear functions 失效
    用于近似非线性函数的系统和方法

    公开(公告)号:US5367702A

    公开(公告)日:1994-11-22

    申请号:US000071

    申请日:1993-01-04

    CPC分类号: G06F7/552 G06F2207/5525

    摘要: A system (10) is provided for approximating a nonlinear function. The system (10) comprises first and second multiple generating circuits (12) and (14) for multiplying a first quantity and a second quantity by up to three integer powers of two. First and second function generating circuits (16) and (18) generate first and second functions of the first and the second quantities by combining the multiples generated in first and second multiple generating circuits (12) and (14). First and second approximation generating circuits (20) and (22) generate first and second approximations of the nonlinear function by shifting the output of first and second function generating circuits (16) and (18). Approximation selecting circuit (24) outputs the appropriate approximation generated in first and second approximation generating circuits (20) and (22).

    摘要翻译: 提供一种用于近似非线性函数的系统(10)。 系统(10)包括用于将第一数量和第二数量乘以最多三个整数二的幂数的第一和第二多个产生电路(12)和(14)。 第一和第二功能发生电路(16)和(18)通过组合在第一和第二多个发电电路(12)和(14)中产生的倍数来产生第一和第二量的第一和第二功能。 第一和第二近似产生电路(20)和(22)通过移位第一和第二函数发生电路(16)和(18)的输出来产生非线性函数的第一和第二近似。 近似选择电路(24)输出在第一和第二近似发生电路(20)和(22)中产生的适当近似。

    Absolute time scale clock
    4.
    发明授权

    公开(公告)号:US06567346B2

    公开(公告)日:2003-05-20

    申请号:US09757074

    申请日:2001-01-08

    IPC分类号: G04C1500

    CPC分类号: G04F5/16

    摘要: An absolute time scale clock includes a radioactive isotope and a computer. The computer includes a processor that determines an indication of the current absolute time and a memory that stores a decay constant of the radioactive isotope, a reference time, and an amount of the isotope at the reference time. A energy supply that provides power to the computer. The absolute time scale clock further includes a detector positioned to respond to emissions from the radioactive isotope. The detector generates an indication of the number of emissions over a time interval that varies with the decay rate of the isotope. The processor is responsive to the indication from the detector, the decay constant, the reference time, and the reference amount to determine the indication of current absolute time.

    Scanning electron microscope based parametric testing method and
apparatus
    5.
    发明授权
    Scanning electron microscope based parametric testing method and apparatus 失效
    基于扫描电子显微镜的参数测试方法和装置

    公开(公告)号:US5159752A

    公开(公告)日:1992-11-03

    申请号:US595920

    申请日:1990-11-30

    IPC分类号: G01R31/305

    CPC分类号: G01R31/305 Y10T29/49155

    摘要: A scanning electron microscope (28) is connected to a test structure (48) formed on a semiconductor wafer. The test structure (48) comprises a plurality of first parallel structures (54) and a plurality of second parallel structure (56) transverse to and interlocking with the first structures (54). An island (60) is formed within a grid (58) formed by the structures (54-56) and is separated therefrom. An electron beam (38) from the scanning electron microscope (28) is aimed at the structure (48) and secondary electrons emitted therefrom are visually displayed on a monitor (44). The visual display (47) provides information on whether the island (60) is electrically separated from the mesh (58) or shorted thereto by comparing the intensity of the various islands (60).

    摘要翻译: 扫描电子显微镜(28)连接到形成在半导体晶片上的测试结构(48)。 测试结构(48)包括多个第一平行结构(54)和与第一结构(54)横向并与其互锁的多个第二平行结构(56)。 岛(60)形成在由结构(54-56)形成的格栅(58)内并与之隔开。 来自扫描电子显微镜(28)的电子束(38)针对结构(48),并且从其发射的二次电子可视地显示在监视器(44)上。 视觉显示(47)提供关于岛(60)是否与网(58)电分离或与其短路的信息,通过比较各岛(60)的强度来提供信息。

    Integrated Circuit Having Interleaved Gridded Features, Mask Set, and Method for Printing
    6.
    发明申请
    Integrated Circuit Having Interleaved Gridded Features, Mask Set, and Method for Printing 有权
    具有交错网格特征的集成电路,掩模套和打印方法

    公开(公告)号:US20120220133A1

    公开(公告)日:2012-08-30

    申请号:US13447629

    申请日:2012-04-16

    IPC分类号: H01L21/32

    摘要: A method for fabricating an integrated circuit includes the steps of: providing a substrate having a semiconductor surface; providing a hardmask material on the semiconductor surface. For at least one masking level of the integrated circuit: providing a mask pattern for the masking level partitioned into a first mask and at least one second mask, the first mask providing features in a first grid pattern and the at least one second mask providing features in a second grid pattern, wherein the first and the second grid pattern have respective features which interleave with one another over at least one area; applying a first photoresist layer with the first mask; exposing the first grid pattern using the first mask; developing the first photoresist layer; etching the hardmask material to transfer the first grid pattern in the surface of the substrate; removing the first photoresist layer.

    摘要翻译: 一种用于制造集成电路的方法包括以下步骤:提供具有半导体表面的衬底; 在半导体表面上提供硬掩模材料。 对于集成电路的至少一个掩蔽级别:提供分割为第一掩模和至少一个第二掩模的掩蔽级别的掩模图案,所述第一掩模提供第一栅格图案中的特征,并且所述至少一个第二掩模提供特征 在第二格栅图案中,其中第一和第二格栅图案具有在至少一个区域上彼此交错的各自特征; 用第一掩模施加第一光致抗蚀剂层; 使用第一掩模曝光第一格栅图案; 显影第一光致抗蚀剂层; 蚀刻硬掩模材料以将衬底的表面中的第一栅格图案转移; 去除第一光致抗蚀剂层。

    ON-DIE PARAMETRIC TEST MODULES FOR IN-LINE MONITORING OF CONTEXT DEPENDENT EFFECTS
    7.
    发明申请
    ON-DIE PARAMETRIC TEST MODULES FOR IN-LINE MONITORING OF CONTEXT DEPENDENT EFFECTS 有权
    用于在线监测上下文相关效果的模拟参数测试模块

    公开(公告)号:US20120074973A1

    公开(公告)日:2012-03-29

    申请号:US12890146

    申请日:2010-09-24

    IPC分类号: G01R31/3187

    CPC分类号: G01R31/2831

    摘要: An integrated circuit (IC) die has an on-die parametric test module. A semiconductor substrate has die area, and a functional IC formed on an IC portion of the die area including a plurality of circuit elements configured for performing a circuit function. The on-die parametric test module is formed on the semiconductor substrate in a portion of the die area different from the IC portion. The on-die parametric test module includes a reference layout that provides at least one active reference MOS transistor, wherein the active reference MOS transistor has a reference spacing value for each of a plurality of context dependent effect parameters. A plurality of different variant layouts are included on the on-die parametric test module. Each variant layout provides at least one active variant MOS transistor that provides a variation with respect to the reference spacing value for at least one of the context dependent effect parameters.

    摘要翻译: 集成电路(IC)管芯具有管芯上的参数测试模块。 半导体衬底具有管芯区域,以及形成在管芯区域的IC部分上的功能IC,包括被配置为执行电路功能的多个电路元件。 在与IC部分不同的管芯区域的一部分中,在半导体衬底上形成管芯上参数测试模块。 片上参数测试模块包括提供至少一个有源参考MOS晶体管的参考布局,其中有源参考MOS晶体管具有针对多个上下文相关效应参数中的每一个的参考间隔值。 在片上参数测试模块上包括多个不同的变体布局。 每个变体布局提供至少一个有源变体MOS晶体管,其针对上下文相关效应参数中的至少一个提供关于参考间隔值的变化。

    SYSTEM AND METHOD FOR MAKING PHOTOMASKS
    8.
    发明申请
    SYSTEM AND METHOD FOR MAKING PHOTOMASKS 有权
    制作光子的系统和方法

    公开(公告)号:US20090125865A1

    公开(公告)日:2009-05-14

    申请号:US11940270

    申请日:2007-11-14

    IPC分类号: G06F17/50 H05K1/00

    CPC分类号: G03F1/36

    摘要: The present disclosure is directed a method for preparing photomask patterns. The method comprises receiving drawn pattern data for a design database. The drawn pattern data describes first device features and second device features, the second device features being associated with design specifications for providing a desired connectivity of the first device features to the second device features. At least a first plurality of the first device features have drawn patterns that will not result in sufficient coverage to effect the desired connectivity. Photomask patterns are formed for the first device features, wherein the photomask patterns for the first plurality of the first device features will result in the desired coverage. Integrated circuit devices formed using the principles of the present disclosure are also taught.

    摘要翻译: 本公开涉及一种制备光掩模图案的方法。 该方法包括接收用于设计数据库的绘制图案数据。 所绘制的图案数据描述了第一设备特征和第二设备特征,第二设备特征与用于向第二设备特征提供第一设备特征的期望连接性的设计规范相关联。 至少第一多个第一设备特征具有不会导致足够的覆盖以实现期望的连接性的图形。 为第一器件特征形成光掩模图案,其中用于第一多个第一器件特征的光掩模图案将导致期望的覆盖。 还教导了使用本公开的原理形成的集成电路器件。

    System and method for automatically toggling the alert of a wireless device
    9.
    发明申请
    System and method for automatically toggling the alert of a wireless device 审中-公开
    自动切换无线设备的警报的系统和方法

    公开(公告)号:US20070287507A1

    公开(公告)日:2007-12-13

    申请号:US11450447

    申请日:2006-06-12

    IPC分类号: H04B1/38 G08B5/22 G08B7/00

    CPC分类号: H04M19/04 H04W4/021 H04W4/16

    摘要: A system and method for communicating with a wireless device to automatically toggle the alert. The control station automatically transmits at least one signal to the wireless device, which instructs the wireless device to use a silent alert. The control station can also include a database for storing identifiers of wireless devices having users who must remain available, allowing those wireless devices to use a tactile alert instead of a silent alert. The control station can automatically instruct the wireless device to use a silent alert, a tactile alert, or an audible alert depending upon the time of day.

    摘要翻译: 用于与无线设备通信以自动切换警报的系统和方法。 控制站自动向无线设备发送至少一个信号,无线设备指示无线设备使用无声警报。 控制站还可以包括用于存储具有必须保持可用的用户的无线设备的标识符的数据库,允许这些无线设备使用触觉警报而不是静默警报。 控制站可以根据一天中的时间自动地指示无线设备使用无声警报,触觉警报或可听警报。

    Integrated circuit layout and verification method

    公开(公告)号:US06553558B2

    公开(公告)日:2003-04-22

    申请号:US09737680

    申请日:2000-12-14

    IPC分类号: G06F1750

    CPC分类号: G03F1/36 G03F7/70441

    摘要: A method of performing and verifying an integrated circuit layout is provided that comprises the steps of performing the layout of a mask. Proximity correction techniques are then applied to the mask layout data. Theoretical contours which comprise curvilinear forms are then extrapolated from the corrected mask data set. The curvilinear contour data is then bounded using boxing algorithms in order to generate a bounded contour data set. The bounded contour data set can then be compared to the original input mask data to detect design rule violations and other characteristics of the original layout.