Enhanced field effect transistor
    7.
    发明授权
    Enhanced field effect transistor 失效
    增强型场效应晶体管

    公开(公告)号:US08138054B2

    公开(公告)日:2012-03-20

    申请号:US12416264

    申请日:2009-04-01

    IPC分类号: H01L21/336

    摘要: An enhanced FET capable of controlling current above and below a gate of the FET. The FET is formed on a semiconductor substrate. A source and drain are formed in the substrate (or in a well in the substrate). A first epitaxial layer of similar doping to the source and drain are grown on the source and drain, the first epitaxial layer is thicker than the gate, but not so thick as to cover the top of the gate. A second epitaxial layer of opposite doping is grown on the first epitaxial layer thick enough to cover the top of the gate. The portion of the second epitaxial layer above the gate serves as a body through which the gate controls current flow between portions of the first epitaxial layer over the drain and the source.

    摘要翻译: 一种能够控制FET栅极上下电流的增强型FET。 FET形成在半导体衬底上。 源极和漏极形成在衬底(或衬底中的阱中)。 在源极和漏极上生长与源极和漏极类似的掺杂的第一外延层,第一外延层比栅极厚,但不如覆盖栅极的顶部那样厚。 在第一外延层上生长相当掺杂的第二外延层,其厚度足以覆盖栅极的顶部。 栅极上方的第二外延层的部分用作主体,栅极通过该主体控制在漏极和源极之间的第一外延层的部分之间的电流。

    ENHANCED FIELD EFFECT TRANSISTOR
    8.
    发明申请
    ENHANCED FIELD EFFECT TRANSISTOR 失效
    增强型场效应晶体管

    公开(公告)号:US20100252868A1

    公开(公告)日:2010-10-07

    申请号:US12416264

    申请日:2009-04-01

    摘要: An enhanced FET capable of controlling current above and below a gate of the FET. The FET is formed on a semiconductor substrate. A source and drain are formed in the substrate (or in a well in the substrate). A first epitaxial layer of similar doping to the source and drain are grown on the source and drain, the first epitaxial layer is thicker than the gate, but not so thick as to cover the top of the gate. A second epitaxial layer of opposite doping is grown on the first epitaxial layer thick enough to cover the top of the gate. The portion of the second epitaxial layer above the gate serves as a body through which the gate controls current flow between portions of the first epitaxial layer over the drain and the source.

    摘要翻译: 一种能够控制FET栅极上下电流的增强型FET。 FET形成在半导体衬底上。 源极和漏极形成在衬底(或衬底中的阱中)。 在源极和漏极上生长与源极和漏极类似的掺杂的第一外延层,第一外延层比栅极厚,但不如覆盖栅极的顶部那样厚。 在第一外延层上生长相当掺杂的第二外延层,其厚度足以覆盖栅极的顶部。 栅极上方的第二外延层的部分用作主体,栅极通过该主体控制在漏极和源极之间的第一外延层的部分之间的电流。