公开(公告)号：US20220395776A1

公开(公告)日：2022-12-15

申请号：US17805880

申请日：2022-06-08

Applicant: Tokyo Electron Limited

Inventor： Keisuke Tsugao ,  Daisuke Aoki

IPC: B01D53/78 ,  B01D53/34

Abstract: A gas processing apparatus includes a duct, a partition plate and a liquid supply. The duct has therein a flow path through which a gas passes. The partition plate is configured to divide the flow path into multiple spaces, and is formed of a porous material, through which the gas passes, configured to retain a liquid. The liquid supply is configured to supply a dissolving liquid configured to dissolve a target component contained in the gas to the partition plate. The gas passing through the flow path is brought into contact with the dissolving liquid retained in the partition plate.

公开(公告)号：US10128132B2

公开(公告)日：2018-11-13

申请号：US15807647

申请日：2017-11-09

Applicant: Tokyo Electron Limited

Inventor： Junya Minamida ,  Keisuke Tsugao

IPC: H01L21/67

Abstract: A substrate liquid processing apparatus includes a liquid unit configured to process a liquid processing unit configured to process a substrate with multiple kinds of processing liquids, an exhaust pipe connected to the liquid processing unit, and configured to allow an exhaust gas from the liquid processing unit to flow therein, a plurality of individual exhaust pipes provided to correspond to at least one of the multiple kinds of processing liquids, and an exhaust switching unit connected to the exhaust pipe and the individual exhaust pipes, and configured to change a discharge destination of the exhaust gas flowing within the exhaust pipe to one of the individual exhaust pipes. The exhaust switching unit is positioned above the liquid processing unit.

公开(公告)号：US09842747B2

公开(公告)日：2017-12-12

申请号：US14924916

申请日：2015-10-28

Applicant: Tokyo Electron Limited

Inventor： Junya Minamida ,  Keisuke Tsugao

IPC: F16K11/20 ,  H01L21/67

CPC classification number: H01L21/67017 ,  H01L21/6715

Abstract: A substrate liquid processing apparatus includes a liquid processing unit that processes a substrate with processing liquids, an exhaust pipe, individual exhaust pipes corresponding to at least one of the processing liquids and an exhaust switching unit. Further, the exhaust switching unit comprises an exhaust gas inlet chamber and switching mechanisms. The switching mechanisms correspond to the individual exhaust pipes, respectively, and each of the switching mechanisms includes an exhaust gas suction opening communicating with the exhaust gas inlet chamber; an outlet opening communicating with a corresponding one of the individual exhaust pipes; an exterior air suction opening; and a valve body that switches a communication state of the exhaust gas suction opening, the outlet opening and the exterior air suction opening between a state where the exhaust gas suction opening communicates with the outlet opening and a state where the exterior air suction opening communicates therewith.

公开(公告)号：US20170008044A1

公开(公告)日：2017-01-12

申请号：US15198705

申请日：2016-06-30

Applicant: Tokyo Electron Limited

Inventor： Tomonori Okumura ,  Takashi Ajishi ,  Keisuke Tsugao

IPC: B08B9/032 ,  F16K37/00 ,  H01L21/67 ,  G05D7/06

CPC classification number: B08B9/0325 ,  B08B2203/0229 ,  C11D11/0047 ,  G05D7/0635 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67253

Abstract: Disclosed is a substrate processing apparatus including a chamber, a first measuring unit, an exhaust pipe, a regulation valve, an opening degree detection unit, a valve controller, and a clogging detection unit. The chamber accommodates therein a substrate to be processed by using a processing fluid. The first measuring unit measures an internal pressure of the chamber. An exhaust from the chamber flows through the exhaust pipe. The regulation valve regulates an exhaust volume of the exhaust pipe. The opening degree detection unit detects a valve opening degree of the regulation valve. The valve controller controls the valve opening degree of the regulation valve based on a measurement result of the first measuring unit to keep the internal pressure within a specified range. The clogging detection unit detects clogging of the exhaust pipe based on the valve opening degree detected by the opening degree detection unit.

Abstract translation: 公开了一种基板处理装置，包括室，第一测量单元，排气管，调节阀，开度检测单元，阀控制器和堵塞检测单元。 在其中容纳有通过使用处理流体处理的基板。 第一测量单元测量腔室的内部压力。 来自腔室的废气流经排气管。 调节阀调节排气管的排气量。 开度检测单元检测调节阀的开度。 阀控制器基于第一测量单元的测量结果控制调节阀的开度，以将内部压力保持在指定范围内。 堵塞检测单元基于由开度检测单元检测到的阀开度来检测排气管的堵塞。

公开(公告)号：US20160124438A1

公开(公告)日：2016-05-05

申请号：US14924916

申请日：2015-10-28

Applicant: Tokyo Electron Limited

Inventor： Junya Minamida ,  Keisuke Tsugao

IPC: G05D7/00 ,  F16K11/00

CPC classification number: H01L21/67017 ,  H01L21/6715

Abstract: A substrate liquid processing apparatus includes a liquid processing unit that processes a substrate with processing liquids, an exhaust pipe, individual exhaust pipes corresponding to at least one of the processing liquids and an exhaust switching unit. Further, the exhaust switching unit comprises an exhaust gas inlet chamber and switching mechanisms. The switching mechanisms correspond to the individual exhaust pipes, respectively, and each of the switching mechanisms includes an exhaust gas suction opening communicating with the exhaust gas inlet chamber; an outlet opening communicating with a corresponding one of the individual exhaust pipes; an exterior air suction opening; and a valve body that switches a communication state of the exhaust gas suction opening, the outlet opening and the exterior air suction opening between a state where the exhaust gas suction opening communicates with the outlet opening and a state where the exterior air suction opening communicates therewith.

Abstract translation: 基板液体处理装置包括用处理液处理基板的液体处理单元，排气管，对应于至少一个处理液体的排气管和排气切换单元。 此外，排气切换单元包括排气入口室和切换机构。 切换机构分别对应于各个排气管，并且每个切换机构包括与排气入口室连通的排气吸入口; 与所述各个排气管中的相应一个连通的出口; 外部空气吸入口; 以及阀体，其在排气吸入口与出口开口连通的状态与外部空气吸入口与其连通的状态与外部吸气口与其连通的状态之间切换排气吸入口，出口开口和外部空气吸入口的连通状态 。

公开(公告)号：US20220399209A1

公开(公告)日：2022-12-15

申请号：US17806150

申请日：2022-06-09

Applicant: Tokyo Electron Limited

Inventor： Keisuke Tsugao ,  Tomonori Okumura

IPC: H01L21/67 ,  C23C16/44

Abstract: A substrate processing apparatus includes processing units, an exhaust path, a gas processing apparatus and a controller. Each processing unit is configured to process a substrate by using a chemical. A gas exhausted from the processing units flows through the exhaust path. The gas processing apparatus is provided in the exhaust path to remove a target component contained in the gas. The gas processing apparatus includes a duct, a partition plate and a liquid supply. The duct has therein a flow path. The partition plate divides the flow path into spaces, and is formed of a porous material, through which the gas passes, configured to retain a liquid. The liquid supply is configured to supply a dissolving liquid configured to dissolve the target component to the partition plate. The controller adjusts a flow rate of the dissolving liquid according to operation information indicating an operational status of the processing units.

公开(公告)号：US10022758B2

公开(公告)日：2018-07-17

申请号：US15198705

申请日：2016-06-30

Applicant: Tokyo Electron Limited

Inventor： Tomonori Okumura ,  Takashi Ajishi ,  Keisuke Tsugao

IPC: B08B9/032 ,  F16K37/00 ,  H01L21/67 ,  G05D7/06 ,  C11D11/00

Abstract: Disclosed is a substrate processing apparatus including a chamber, a first measuring unit, an exhaust pipe, a regulation valve, an opening degree detection unit, a valve controller, and a clogging detection unit. The chamber accommodates therein a substrate to be processed by using a processing fluid. The first measuring unit measures an internal pressure of the chamber. An exhaust from the chamber flows through the exhaust pipe. The regulation valve regulates an exhaust volume of the exhaust pipe. The opening degree detection unit detects a valve opening degree of the regulation valve. The valve controller controls the valve opening degree of the regulation valve based on a measurement result of the first measuring unit to keep the internal pressure within a specified range. The clogging detection unit detects clogging of the exhaust pipe based on the valve opening degree detected by the opening degree detection unit.

公开(公告)号：US20180068873A1

公开(公告)日：2018-03-08

申请号：US15807647

申请日：2017-11-09

Applicant: Tokyo Electron Limited

Inventor： Junya Minamida ,  Keisuke Tsugao

IPC: H01L21/67

CPC classification number: H01L21/67017 ,  H01L21/6715

Abstract: A substrate liquid processing apparatus includes a liquid unit configured to process a liquid processing unit configured to process a substrate with multiple kinds of processing liquids, an exhaust pipe connected to the liquid processing unit, and configured to allow an exhaust gas from the liquid processing unit to flow therein, a plurality of individual exhaust pipes provided to correspond to at least one of the multiple kinds of processing liquids, and an exhaust switching unit connected to the exhaust pipe and the individual exhaust pipes, and configured to change a discharge destination of the exhaust gas flowing within the exhaust pipe to one of the individual exhaust pipes. The exhaust switching unit is positioned above the liquid processing unit.