公开(公告)号：US20180233384A1

公开(公告)日：2018-08-16

申请号：US15895106

申请日：2018-02-13

Applicant: Tokyo Electron Limited

Inventor： Takashi Nagai ,  Hideaki Sato ,  Junichi Kitano ,  Kenji Goto

IPC: H01L21/67

CPC classification number: H01L21/67086 ,  H01L21/31111 ,  H01L21/67017 ,  H01L21/67034 ,  H01L21/67057 ,  H01L21/67173 ,  H01L21/67207 ,  H01L21/67248 ,  H01L21/67253

Abstract: A substrate liquid processing apparatus includes a processing tub 34 which is configured to store therein a processing liquid and in which a processing of a substrate is performed by immersing the substrate in the stored processing liquid; a circulation line 50 connected to the processing tub; a pump 51 provided at the circulation line and configured to generate a flow of the processing liquid flowing out from the processing tub and returning back to the processing tub after passing through the circulation line; and a heater 52 provided at the circulation line and configured to heat the processing liquid. At least two temperature sensors 81 to 83 are provided at different positions within a circulation system including the processing tub and the circulation line. Controllers 90 and 100 control a heat generation amount of the heater based on detection temperatures of the at least two temperature sensors.

公开(公告)号：US11410861B2

公开(公告)日：2022-08-09

申请号：US15895106

申请日：2018-02-13

Applicant: Tokyo Electron Limited

Inventor： Takashi Nagai ,  Hideaki Sato ,  Junichi Kitano ,  Kenji Goto

IPC: H01L21/67 ,  H01L21/311

Abstract: A substrate liquid processing apparatus includes a processing tub 34 which is configured to store therein a processing liquid and in which a processing of a substrate is performed by immersing the substrate in the stored processing liquid; a circulation line 50 connected to the processing tub; a pump 51 provided at the circulation line and configured to generate a flow of the processing liquid flowing out from the processing tub and returning back to the processing tub after passing through the circulation line; and a heater 52 provided at the circulation line and configured to heat the processing liquid. At least two temperature sensors 81 to 83 are provided at different positions within a circulation system including the processing tub and the circulation line. Controllers 90 and 100 control a heat generation amount of the heater based on detection temperatures of the at least two temperature sensors.