公开(公告)号：US20240420359A1

公开(公告)日：2024-12-19

申请号：US18820492

申请日：2024-08-30

Applicant: Tokyo Electron Limited

Inventor： Toshihiro KITAO ,  Jun SHINAGAWA ,  Masato KAZUI ,  Makoto IGARASHI ,  Toshihiro OHNO

IPC: G06T7/62 ,  G06T7/00 ,  G06T7/50

Abstract: The profile detecting method includes: detecting a specific shape included in a detection target image from the detection target image including the specific shape using a model that has learned a learning image including the specific shape and information regarding the specific shape included in the learning image; and outputting shape information of the detected specific shape.

公开(公告)号：US20170372877A1

公开(公告)日：2017-12-28

申请号：US15630365

申请日：2017-06-22

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takafumi NOGAMI ,  Makoto IGARASHI

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01J37/32935 ,  H01J37/32201 ,  H01J37/32266 ,  H01J37/32715 ,  H01J37/32926 ,  H01J2237/332 ,  H01L21/67253 ,  H01L21/68714

Abstract: A support apparatus for plasma adjustment includes a storage part storing index value estimation data including data defining an amount of change in an index value between adjustment positions for each of the adjustment parts, the index value corresponding to electron density of plasma, an input part for inputting a measurement result of the index value obtained when plasma is generated and the adjustment positions of the adjustment parts, and a data processing part configured to estimate the index value for each of adjustment positions of the adjustment parts based on input items input to the input part and the estimation data and configured to select proper combinations of the adjustment positions of the adjustment parts based on combinations of the adjustment positions of the adjustment parts and estimated values of a plurality of index values in the circumferential direction corresponding to the respective combinations.