公开(公告)号：US20170278727A1

公开(公告)日：2017-09-28

申请号：US15454108

申请日：2017-03-09

Applicant: Tokyo Electron Limited

Inventor： Nobuhiko Mouri ,  Shingo Kamitomo ,  Masakazu Yarimitsu ,  Takeru Hirose ,  Tomohito Ura

IPC: H01L21/67 ,  B08B3/04 ,  B08B1/00 ,  H01L21/687

CPC classification number: H01L21/67046 ,  B08B1/002 ,  B08B17/00 ,  H01L21/67051 ,  H01L21/68735

Abstract: A liquid residue on a bottom surface of a substrate can be reduced while placing the substrate accurately. A liquid processing apparatus includes an inclined portion, a plurality of supporting members, a processing liquid supply unit and a rotation unit. The inclined portion is provided under the substrate, and has an inclined surface which is inclined downwards from an outer side of the substrate toward an inner side thereof and is extended along a circumferential direction of the substrate. The supporting members are protruded from the inclined surface and configured to support the substrate from below. The processing liquid supply unit is configured to supply a processing liquid onto a top surface of the substrate. The rotation unit is configured to rotate the inclined portion. Further, each of the supporting members has a long narrow shape extended from the outer side of the substrate toward the inner side thereof.

公开(公告)号：US10665478B2

公开(公告)日：2020-05-26

申请号：US15454108

申请日：2017-03-09

Applicant: Tokyo Electron Limited

Inventor： Nobuhiko Mouri ,  Shingo Kamitomo ,  Masakazu Yarimitsu ,  Takeru Hirose ,  Tomohito Ura

IPC: H01L21/304 ,  H01L21/67 ,  B08B1/00 ,  B08B17/00 ,  H01L21/687

Abstract: A liquid residue on a bottom surface of a substrate can be reduced while placing the substrate accurately. A liquid processing apparatus includes an inclined portion, a plurality of supporting members, a processing liquid supply unit and a rotation unit. The inclined portion is provided under the substrate, and has an inclined surface which is inclined downwards from an outer side of the substrate toward an inner side thereof and is extended along a circumferential direction of the substrate. The supporting members are protruded from the inclined surface and configured to support the substrate from below. The processing liquid supply unit is configured to supply a processing liquid onto a top surface of the substrate. The rotation unit is configured to rotate the inclined portion. Further, each of the supporting members has a long narrow shape extended from the outer side of the substrate toward the inner side thereof.