公开(公告)号：US20210272779A1

公开(公告)日：2021-09-02

申请号：US17272771

申请日：2019-08-23

Applicant: Tokyo Electron Limited

Inventor： Yusuke HAYASAKA ,  Takehiro TANIKAWA ,  Shuhei YAMABE ,  Yuki MACHIDA ,  Jun Young CHUNG

IPC: H01J37/32

Abstract: A plasma processing apparatus according to an exemplary embodiment includes a chamber, a member, and a heater. Plasma is generated in an internal space of the chamber. The member is partially located in the internal space of the chamber. The heater is configured to heat the member. The member extends outward from the internal space of the chamber and is exposed to a space outside the chamber.

公开(公告)号：US20230326724A1

公开(公告)日：2023-10-12

申请号：US18209030

申请日：2023-06-13

Applicant: Tokyo Electron Limited

Inventor： Yusuke HAYASAKA ,  Shuhei YAMABE ,  Naoki TAMARU ,  Keisuke YOSHIMURA ,  Kyo TSUBOI

IPC: H01J37/32 ,  H01L21/67

CPC classification number: H01J37/32522 ,  H01J37/32715 ,  H01J37/32743 ,  H01L21/67069 ,  H01J37/32834 ,  H01J37/32495 ,  H01J2237/334 ,  H01J2237/002

Abstract: A plasma processing apparatus is for performing plasma processing in a depressurizable inner space. The apparatus includes a chamber having therein an inner space, a supporting table provided in the inner space and configured to support a substrate to be mounted thereon, one or more first members included in the chamber or separate from the chamber and partially exposed to a depressurized environment including the inner space, and one or more second members included in the chamber or separate from the chamber, each being in contact with a corresponding one of said one or more first members, and partially disposed in an atmospheric pressure environment. The apparatus further includes one or more feeders each of which is configured to supply a coolant to a cavity formed in a corresponding one of said one or more second members.