公开(公告)号：US10720313B2

公开(公告)日：2020-07-21

申请号：US16108726

申请日：2018-08-22

Applicant: Tokyo Electron Limited

Inventor： Masanori Sato ,  Ryusei Kashimura ,  Tetsu Tsunamoto ,  Yoshinori Osaki ,  Toshiyuki Arakane

IPC: G01R31/00 ,  H01J37/32 ,  H01L21/683 ,  H01L21/67

Abstract: A measuring device includes a switch that switches a connection of an electrode to which a direct current voltage is applied, wherein the electrode is within an electrostatic chuck disposed in a plasma processing device; a component provided with electrostatic capacitance, wherein the component is connected to the switch; and a measuring unit that measures a value corresponding to an electric charge amount accumulated in the component provided with the electrostatic capacitance.

公开(公告)号：US11456199B2

公开(公告)日：2022-09-27

申请号：US16728161

申请日：2019-12-27

Applicant: TOKYO ELECTRON LIMITED

Inventor： Ryusei Kashimura ,  Masanori Sato ,  Tetsu Tsunamoto

IPC: H01L21/683 ,  B23Q17/00 ,  H01L21/67

Abstract: In a measurement method, a terminal is brought into contact with an electrode in an electrostatic chuck in contact with a substrate that is grounded. Further, the terminal, the electrostatic chuck and the substrate are fixed, and a current value and a voltage value are measured using an ammeter and a voltmeter, respectively, that are connected to the terminal. In addition, whether or not the terminal and the electrode are electrically connected is determined from a slope of the current value and/or a peak current value based on the measured current value and the voltage value.

公开(公告)号：US11462431B2

公开(公告)日：2022-10-04

申请号：US16854067

申请日：2020-04-21

Applicant: Tokyo Electron Limited

Inventor： Toshiyuki Arakane ,  Tetsu Tsunamoto ,  Yoshinori Osaki ,  Masanori Sato

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/3065 ,  H01L21/687 ,  H01J37/32 ,  C23C16/458

Abstract: A discharging method of removing electric charge from a substrate is provided. In the discharging method, gas is supplied into a processing chamber while the substrate is placed on an electrostatic chuck provided in the processing chamber, and direct-current (DC) voltage is applied to an attracting electrode of the electrostatic chuck, until discharge occurs in the processing chamber. After the discharge occurs, the DC voltage is adjusted to a magnitude in which an amount of charge on the substrate becomes zero or becomes in a neighborhood of zero, and the substrate is removed from the electrostatic chuck.

公开(公告)号：US11658012B2

公开(公告)日：2023-05-23

申请号：US17118987

申请日：2020-12-11

Applicant: Tokyo Electron Limited

Inventor： Toshiyuki Arakane ,  Tetsu Tsunamoto ,  Masanori Sato ,  Yoshinori Osaki

IPC: H01J37/32

CPC classification number: H01J37/32449 ,  H01J37/32082 ,  H01J37/32577 ,  H01J2237/24571 ,  H01J2237/334

Abstract: A control method includes: (a) connecting a power supply to an electrode of an electrostatic chuck inside a chamber and applying a voltage from the power supply to the electrode; (b) after (a), switching a connection between the electrode and the power supply to a non-connection state; (c) after (b), supplying a gas into the chamber to generate plasma; and (d) measuring a potential of the electrode during (c).