公开(公告)号：US20170358464A1

公开(公告)日：2017-12-14

申请号：US15619920

申请日：2017-06-12

Applicant: Tokyo Electron Limited

Inventor： Masahiro Abe ,  Hiroichi Inada ,  Tohru Azuma ,  Tsunenaga Nakashima ,  Naofumi Kishita ,  Hideki Kajiwara

IPC: H01L21/67 ,  G03F7/16 ,  H01L21/677

CPC classification number: H01L21/6715 ,  G03F7/162

Abstract: Disclosed is a liquid processing apparatus including: a plurality of substrate placement regions; a nozzle that supplies a processing liquid to a substrate from each processing position; a nozzle placement region provided behind a row of the substrate placement regions; an arm that detachably holds the nozzle at one end side; a driving unit that horizontally pivots the arm around a pivot axis; and a controller that outputs a control signal to convey the nozzle from the nozzle placement region to a standby position corresponding to a processing position of a conveyance destination, cause the nozzle to stand by at the standby position, and then, convey the nozzle to the processing position. The standby position is outside the substrate placement regions and is located between the processing position and the nozzle placement region when viewed in a front-and-rear direction.

公开(公告)号：US12151255B2

公开(公告)日：2024-11-26

申请号：US18218457

申请日：2023-07-05

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hideki Kajiwara ,  Yuya Yonemitsu ,  Shinichiro Yamanaka ,  Shinichi Mizushino ,  Naruaki Iida ,  Kohei Kawakami ,  Tohru Azuma

IPC: B05B12/04 ,  B05B7/00

Abstract: An apparatus includes substrate holders each configured to hold a substrate, a first nozzle provided for each substrate holder and for discharging a first processing liquid to the substrate at a first position, a second nozzle provided to be shared by the substrate holders and for discharging a second processing liquid to the substrate at a second position, a third nozzle provided for each substrate holder and for discharging a third processing liquid to the substrate at a third position while the first and second processing liquids are not supplied to the substrate, first to third standby parts for respectively allowing the first to third nozzles to wait outside a substrate holding region, a turning mechanism for turning the first nozzle between the first standby part and the first position, and a linear motion mechanism for linearly moving the third nozzle between the third standby part and the third position.

公开(公告)号：US11752515B2

公开(公告)日：2023-09-12

申请号：US16897922

申请日：2020-06-10

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hideki Kajiwara ,  Yuya Yonemitsu ,  Shinichiro Yamanaka ,  Shinichi Mizushino ,  Naruaki Iida ,  Kohei Kawakami ,  Tohru Azuma

IPC: B05B12/04 ,  B05B7/00

CPC classification number: B05B12/04 ,  B05B7/00

Abstract: An apparatus includes substrate holders each configured to hold a substrate, a first nozzle provided for each substrate holder and for discharging a first processing liquid to the substrate at a first position, a second nozzle provided to be shared by the substrate holders and for discharging a second processing liquid to the substrate at a second position, a third nozzle provided for each substrate holder and for discharging a third processing liquid to the substrate at a third position while the first and second processing liquids are not supplied to the substrate, first to third standby parts for respectively allowing the first to third nozzles to wait outside a substrate holding region, a turning mechanism for turning the first nozzle between the first standby part and the first position, and a linear motion mechanism for linearly moving the third nozzle between the third standby part and the third position.