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公开(公告)号：US20140367377A1
公开(公告)日：2014-12-18
申请号：US14293794
申请日：2014-06-02
Applicant: TOKYO ELECTRON LIMITED
Inventor： Taichi MONDEN , Kouji SHIMOMURA , Seokhyoung HONG , Yoshihiro MIYAGAWA , Jun YAMASHITA , Taro IKEDA , Yuki MOTOMURA
CPC classification number: H05B6/74 , H01L21/67115 , H01L21/68742 , H01L21/68792 , H05B6/705 , H05B6/806 , H05B2206/044
Abstract: A microwave heating apparatus includes a phase control unit configured to change a phase of a standing wave of microwave introduced into the process chamber by the microwave introduction unit. The phase control unit includes a recessed portion with respect to an inner surface of the bottom wall. The phase control unit is formed of a bottom portion and a fixing plate installed at a lower surface of the bottom portion from the outer side of the process chamber. The phase of the standing wave in the process chamber is changed by the incidence and reflection of the microwave in the recessed portion of the phase control unit surrounded by metallic wall.
Abstract translation: 微波加热装置包括：相位控制单元，被配置为通过微波引入单元改变引入到处理室的微波驻波的相位。 相位控制单元包括相对于底壁的内表面的凹部。 相位控制单元由从处理室的外侧安装在底部的下表面的底部和固定板形成。 处理室中的驻波的相位由金属壁包围的相位控制单元的凹部中的微波的入射和反射而改变。
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公开(公告)号：US20220341028A1
公开(公告)日：2022-10-27
申请号：US17659018
申请日：2022-04-13
Applicant: Tokyo Electron Limited
Inventor： Kanto NAKAMURA , Hiroyuki YOKOHARA , Yuki MOTOMURA
Abstract: A vacuum processing apparatus includes: a stage on which a substrate is placed; and a shutter configured to be able to move between a shielding position at which the stage is covered and a retracted position that is retracted from the shielding position, wherein the shutter arranged at the shielding position forms a processing space between the shutter and the stage, and includes: a gas supplier configured to supply a gas into the processing space; and a gas exhauster provided closer to a center side of the processing space than the gas supplier and configured to exhaust the gas from the processing space.
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