公开(公告)号：US20220098717A1

公开(公告)日：2022-03-31

申请号：US17428597

申请日：2019-09-20

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kenichi IMAKITA ,  Kazunaga ONO ,  Toru KITADA ,  Keisuke SATO ,  Atsushi GOMI ,  Hiroyuki YOKOHARA ,  Hiroshi SONE

IPC: C23C14/00 ,  C23C14/50 ,  C23C14/08 ,  C23C14/56 ,  C23C14/34

Abstract: A film forming apparatus according to the present invention comprises: a processing chamber; a substrate holder for holding a substrate within the processing chamber; a target electrode, disposed above the substrate holder, for holding a metal target and supplying electrical power from a power source to the target; an oxidizing gas introduction mechanism for supplying an oxidizing gas to the substrate; and a gas supply unit for supplying an inert gas to the space where the target is disposed. Constituent metal is discharged from the target in the form of sputter particles, whereby a metal film is deposited on the substrate, and the metal film is oxidized by the oxidizing gas introduced by the oxidizing gas introduction mechanism, thereby forming a metal oxide film. When the oxidizing gas is introduced, the gas supply unit supplies the inert gas to the space where the target is disposed so that the pressure therein is positive with respect to the pressure in a processing space.

公开(公告)号：US20200381226A1

公开(公告)日：2020-12-03

申请号：US16883543

申请日：2020-05-26

Applicant: Tokyo Electron Limited

Inventor： Kenichi IMAKITA ,  Yasuhiko KOJIMA ,  Atsushi GOMI ,  Hiroyuki YOKOHARA ,  Hiroshi SONE

IPC: H01J37/34 ,  C23C14/34 ,  H01J37/32

Abstract: A film forming apparatus includes: a processing container; a substrate holder that holds the substrate in the processing container; and a target assembly disposed in an upper side of the substrate holder. The target assembly includes: a target made of metal, including a main body and a flange provided around the main body, and emitting sputter particles from the main body; a target holder including a target electrode configured to supply power to the target, and holding the target; a target clamp that clamps the flange of the target to the target holder; and an anti-deposition shield provided around the main body of the target to cover the flange, the target clamp, and the target holder, and having a labyrinth structure in which an inner tip end thereof is disposed to enter a recess between the main body of the target and the target clamp.

公开(公告)号：US20220336194A1

公开(公告)日：2022-10-20

申请号：US17642992

申请日：2020-09-04

Applicant: Tokyo Electron Limited

Inventor： Hiroyuki YOKOHARA ,  Koji MAEDA ,  Yasunobu SUZUKI ,  Atsushi SHIMADA ,  Takuya UMISE

IPC: H01J37/32

Abstract: A plasma processing apparatus for performing plasma processing on a substrate includes: a plasma generator configured to generate plasma in a processing container; a support structure configured to mount the substrate on a tilted mounting surface in the processing container and rotatably support the substrate; a first slit plate made of quartz and provided between the plasma generator and the support structure, the first slit plate having first slits formed in the first slit plate; and a second slit plate made of quartz and provided between the plasma generator and the support structure and below the first slit plate, the second slit plate having second slits formed in the second slit plate, wherein the first slits are staggered from adjacent ones of the second slits in a reverse direction of a tilting direction of the mounting surface.

公开(公告)号：US20220341028A1

公开(公告)日：2022-10-27

申请号：US17659018

申请日：2022-04-13

Applicant: Tokyo Electron Limited

Inventor： Kanto NAKAMURA ,  Hiroyuki YOKOHARA ,  Yuki MOTOMURA

IPC: C23C14/34 ,  H01J37/32 ,  C23C16/44 ,  H01J37/34

Abstract: A vacuum processing apparatus includes: a stage on which a substrate is placed; and a shutter configured to be able to move between a shielding position at which the stage is covered and a retracted position that is retracted from the shielding position, wherein the shutter arranged at the shielding position forms a processing space between the shutter and the stage, and includes: a gas supplier configured to supply a gas into the processing space; and a gas exhauster provided closer to a center side of the processing space than the gas supplier and configured to exhaust the gas from the processing space.

公开(公告)号：US20150370204A1

公开(公告)日：2015-12-24

申请号：US14740805

申请日：2015-06-16

Applicant: Tokyo Electron Limited

Inventor： Hiroyuki YOKOHARA ,  Shinji ORIMOTO ,  Hiroshi SONE ,  Naoyuki SUZUKI

IPC: H01L27/146

CPC classification number: G03G15/2064 ,  C23C14/3407 ,  H01J37/3435

Abstract: A fixing unit fixes a plate-shaped member to a fixing base member. The fixing unit includes: a pressing unit configured to press the plate-shaped member toward the fixing base member; and a plurality of positioning units, installed at the fixing base member to be in contact with side surfaces of the plate-shaped member, and configured to place the plate-shaped member with respect to the fixing base member. Each of the positioning units includes: a shaft to be installed at the fixing base member; and a slide part movable along the shaft, and the slide part includes a contact part to be in contact with one of the side surfaces of the plate-shaped member and a clearance part formed on the contact part to have a smaller width than that of the contact part.

Abstract translation: 固定单元将板状构件固定到固定基座构件。 定影单元包括：按压单元，构造成将板状构件朝向固定基底构件按压; 以及多个定位单元，安装在所述固定基座构件上以与所述板状构件的侧面接触，并且被构造成将所述板状构件相对于所述固定基座构件放置。 每个定位单元包括：安装在固定基座构件上的轴; 以及滑动部，其能够沿着所述轴移动，并且所述滑动部包括与所述板状构件的一个侧面接触的接触部和形成在所述接触部上的间隙部，其宽度小于 接触部分。