公开(公告)号：US20180143540A1

公开(公告)日：2018-05-24

申请号：US15815925

申请日：2017-11-17

Applicant: Tokyo Electron Limited

Inventor： Seiji NAGAHARA ,  Masaru TOMONO ,  Nobutaka FUKUNAGA ,  Gousuke SHIRAISHI ,  Yukie MINEKAWA

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/677

CPC classification number: G03F7/70725 ,  G03F7/2022 ,  G03F7/70558 ,  G03F7/70775 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67718

Abstract: An exposure apparatus includes: a stage on which a substrate is placed; a plurality of light irradiation units configured to emit light independently of each other to different positions in a right and left direction on a surface of the substrate, so as to form a strip-like irradiation area extending from one end of the surface of the substrate to the other end of the substrate; a rotation mechanism configured to rotate the substrate placed on the stage relative to the irradiation area; a stage moving mechanism configured to move the stage relative to the irradiation area in a back and forth direction; and a control unit configured to output control signals that make said exposure apparatus perform a first step that rotates the substrate relative to the irradiation area having a first illuminance distribution such that the whole surface of the substrate is exposed, and a second step that moves the substrate in the back and forth direction relative to the irradiation area having a second illuminance distribution while rotation of the substrate is being stopped, such that the whole surface of the substrate is exposed.

公开(公告)号：US20140174475A1

公开(公告)日：2014-06-26

申请号：US14101669

申请日：2013-12-10

Applicant: TOKYO ELECTRON LIMITED

Inventor： Koji TAKAYANAGI ,  Yukie MINEKAWA ,  Yuichi YOSHIDA ,  Kousuke YOSHIHARA ,  Yuichi TERASHITA ,  Toshinobu FURUSHO ,  Takashi SASA

IPC: H01L21/67

Abstract: A filtration efficiency, which is similar to the filtration efficiency obtained when a plurality of filters are provided, can be obtained by one filter, and decrease in throughput can be prevented. Based on a control signal from a control unit 101, a resist liquid L is sucked into a pump 70 through a filter. A part of the resist liquid sucked in the pump is discharged from a discharge nozzle 7. The remaining resist liquid is returned to a supply conduit 51b on a primary side of the filter. A process is synthesized by adding a replenishment amount equal to the discharge amount to the return amount. The discharge of the synthesized process liquid and the filtration thereof by the filter are performed the number of times corresponding to a rate between the discharge amount and the return amount.

Abstract translation: 通过一个过滤器可以获得与提供多个过滤器时获得的过滤效率相似的过滤效率，并且可以防止生产量的降低。 基于来自控制单元101的控制信号，抗蚀剂液体L通过过滤器被吸入泵70。 吸入泵中的抗蚀剂液体的一部分从排出喷嘴7排出。剩余的抗蚀剂液体返回到过滤器的一次侧的供给管51b。 通过将等于排出量的补充量加到返回量来合成过程。 进行合成处理液的排出以及过滤器的过滤，进行与排出量与返回量之间的比例对应的次数。