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公开(公告)号：US20130033822A1
公开(公告)日：2013-02-07
申请号：US13563538
申请日：2012-07-31
CPC分类号： F25B21/02 , G02B21/28 , G02B21/365
摘要： An image acquisition apparatus includes an imaging optical system configured to form an image of a subject, an imaging unit including an image sensor configured to capture the image of the subject formed by the imaging optical system, a cooler thermally connected to the image sensor, and a heat-transfer reduction unit with an opaque portion located between the imaging optical system and the imaging unit, wherein the opaque portion includes an aperture through which incident light to the image sensor passes.
摘要翻译： 一种图像获取装置包括被配置为形成被摄体的图像的成像光学系统，包括图像传感器的成像单元，该图像传感器被配置为捕获由成像光学系统形成的被摄体的图像，与图像传感器热连接的冷却器，以及 具有位于成像光学系统和成像单元之间的不透明部分的热传递减少单元，其中所述不透明部分包括通过所述孔的入射光通过所述孔。
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公开(公告)号：US07630056B2
公开(公告)日：2009-12-08
申请号：US12188168
申请日：2008-08-07
申请人： Tomofumi Nishikawara
发明人： Tomofumi Nishikawara
CPC分类号： G03F7/70341 , G03F7/707
摘要： An exposure apparatus that exposes a substrate via liquid includes a substrate stage configured to hold the substrate and to move. The substrate stage includes a top plate, a substrate holder disposed on the top plate and configured to hold the substrate, and a support-plate holder disposed on the top plate as a separate body from the substrate holder and configured to hold a support plate while surrounding the substrate held by the substrate holder. The substrate holder includes an extension having a surface facing a back surface of the support plate held by the support-plate holder. The support-plate holder is provided with a collecting port therein through which liquid that has entered a gap between the back surface of the support plate and the surface of the extension is collected.
摘要翻译： 通过液体曝光基板的曝光装置包括：基板台，其构造成保持基板并移动。 衬底平台包括顶板，设置在顶板上并被构造成保持衬底的衬底保持架，以及支撑板保持件，其作为与衬底保持器分开的主体设置在顶板上，并被构造成保持支撑板，同时 围绕由衬底保持器保持的衬底。 衬底保持器包括具有面向由支撑板保持器保持的支撑板的后表面的表面的延伸部。 支撑板保持器在其中设置有收集口，通过该收集口收集已经进入支撑板的后表面和延伸部的表面之间的间隙的液体。
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公开(公告)号：US07394522B2
公开(公告)日：2008-07-01
申请号：US11755380
申请日：2007-05-30
CPC分类号： G03B27/58 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate. The exposure apparatus includes a movable substrate stage, a projection optical system configured to project light from an original and including a final optical element, and a nozzle member provided around the final optical element and including an opposing surface opposing the substrate. The substrate is exposed via liquid filled between a final surface of the projection optical system and the substrate, the projection optical system, and the original. The opposing surface includes a supply port, a first recovery port provided farther from an optical axis of the final optical element than the supply port, and a first portion and a second portion provided between the supply port and the first recovery port. The distance between the first portion and the substrate is longer than the distance between the supply port and the substrate.
摘要翻译： 至少一个示例性实施例涉及用于曝光衬底的曝光装置。 曝光装置包括可移动基板台，投影光学系统，被配置为投射来自原稿的光并包括最终光学元件，以及设置在最终光学元件周围的喷嘴构件，并且包括与基板相对的相对表面。 基板通过投影光学系统的最终表面和基板，投影光学系统和原稿之间的液体曝光。 所述相对表面包括供给口，比所述供给口更远离所述最终光学元件的光轴提供的第一回收口以及设置在所述供给口与所述第一回收口之间的第一部分和第二部。 第一部分和基底之间的距离比供给口和基底之间的距离长。
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公开(公告)号：US20090237638A1
公开(公告)日：2009-09-24
申请号：US12409401
申请日：2009-03-23
IPC分类号： G03B27/58
CPC分类号： G03B27/58 , G03F7/70341
摘要： An exposure apparatus for exposing a substrate through liquid includes a stage for holding and moving the substrate. The stage includes a holding section for holding the substrate and a supporting section disposed around the holding section. The supporting section includes a recovery port including a gap between the substrate held by the holding section and the supporting section, the recovery port for recovering the liquid, a space for storing the liquid recovered through the recovery port, a liquid recovery mechanism for draining the liquid that has collected in a lower part of the space, and a sloshing reduction member disposed in the space, the sloshing reduction member for reducing sloshing of the liquid.
摘要翻译： 用于通过液体曝光衬底的曝光装置包括用于保持和移动衬底的台。 该平台包括用于保持基板的保持部和设置在保持部周围的支撑部。 支撑部包括回收口，该回收口包括由保持部保持的基板与支撑部之间的间隙，用于回收液体的回收口，用于储存通过回收口回收的液体的空间;液体回收机构， 已经收集在该空间的下部的液体，以及设置在该空间中的晃动减少构件，该减震构件用于减少液体的晃动。
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公开(公告)号：US20090040481A1
公开(公告)日：2009-02-12
申请号：US12188168
申请日：2008-08-07
申请人： Tomofumi Nishikawara
发明人： Tomofumi Nishikawara
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707
摘要： An exposure apparatus that exposes a substrate via liquid includes a substrate stage configured to hold the substrate and to move. The substrate stage includes a top plate, a substrate holder disposed on the top plate and configured to hold the substrate, and a support-plate holder disposed on the top plate as a separate body from the substrate holder and configured to hold a support plate while surrounding the substrate held by the substrate holder. The substrate holder includes an extension having a surface facing a back surface of the support plate held by the support-plate holder. The support-plate holder is provided with a collecting port therein through which liquid that has entered a gap between the back surface of the support plate and the surface of the extension is collected.
摘要翻译： 通过液体曝光基板的曝光装置包括：基板台，其构造成保持基板并移动。 衬底平台包括顶板，设置在顶板上并被构造成保持衬底的衬底保持架，以及支撑板保持件，其作为与衬底保持器分开的主体设置在顶板上，并被构造成保持支撑板，同时 围绕由衬底保持器保持的衬底。 衬底保持器包括具有面向由支撑板保持器保持的支撑板的后表面的表面的延伸部。 支撑板保持器在其中设置有收集口，通过该收集口收集已经进入支撑板的后表面和延伸部的表面之间的间隙的液体。
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公开(公告)号：US20080002169A1
公开(公告)日：2008-01-03
申请号：US11755380
申请日：2007-05-30
IPC分类号： G03B27/42
CPC分类号： G03B27/58 , G03F7/70341
摘要： At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate. The exposure apparatus includes a movable substrate stage, a projection optical system configured to project light from an original and including a final optical element, and a nozzle member provided around the final optical element and including an opposing surface opposing the substrate. The substrate is exposed via liquid filled between a final surface of the projection optical system and the substrate, the projection optical system, and the original. The opposing surface includes a supply port, a first recovery port provided farther from an optical axis of the final optical element than the supply port, and a first portion and a second portion provided between the supply port and the first recovery port. The distance between the first portion and the substrate is longer than the distance between the supply port and the substrate.
摘要翻译： 至少一个示例性实施例涉及用于曝光衬底的曝光装置。 曝光装置包括可移动基板台，投影光学系统，被配置为投射来自原稿的光并包括最终光学元件，以及设置在最终光学元件周围的喷嘴构件，并且包括与基板相对的相对表面。 基板通过投影光学系统的最终表面和基板，投影光学系统和原稿之间的液体曝光。 所述相对表面包括供给口，比所述供给口更远离所述最终光学元件的光轴提供的第一回收口以及设置在所述供给口与所述第一回收口之间的第一部分和第二部。 第一部分和基底之间的距离比供给口和基底之间的距离长。
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