摘要:
Disclosed is a light source optimizing method wherein: a light source shape obtained as the result of SMO is set as a target, the SMO being an optimizing calculation method for optimizing a mask pattern and illumination light source, a spatial light modulator is controlled such that a deviation from the target is within an acceptable range, and the shape of the illumination light source is set; the image of the pattern obtained as the results of the SMO is formed on a wafer, using illumination light emitted from the illumination light source having the set light source shape, an OPE is evaluated as image-forming performance using the detection results obtained by detecting the image of the pattern thus formed; and the light source shape is optimized.
摘要:
A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
摘要:
There is disclosed an evaluation method for evaluating a one-dimensional illumination distribution using polynomials, the method comprising steps of: setting up, as the polynomials, one-dimensional power polynomials which are orthogonal in a closed interval; and approximating the one-dimensional illumination distribution with the power polynomials to obtain the coefficients of respective terms of the power polynomials.
摘要:
An optical integrator has a plurality of wavefront dividing elements two-dimensionally arrayed, and is so configured that a ray group obliquely incident to an optical-axis center of an entrance face of each wavefront dividing element is emitted in parallel with the optical axis from the wavefront dividing element. In each of a required number of wavefront dividing elements out of the plurality of wavefront dividing elements, at least one curved optical face of the wavefront dividing element is formed as inclined around an axis along a predetermined direction passing an optical-axis center of an entrance face of the wavefront dividing element and being perpendicular to the optical axis AXe.
摘要:
There is disclosed an evaluation method for evaluating a one-dimensional illumination distribution using polynomials, the method comprising steps of: setting up, as the polynomials, one-dimensional power polynomials which are orthogonal in a closed interval; and approximating the one-dimensional illumination distribution with the power polynomials to obtain the coefficients of respective terms of the power polynomials.
摘要:
An optical integrator has a plurality of wavefront dividing elements two-dimensionally arrayed, and is so configured that a ray group obliquely incident to an optical-axis center of an entrance face of each wavefront dividing element is emitted in parallel with the optical axis from the wavefront dividing element. In each of a required number of wavefront dividing elements out of the plurality of wavefront dividing elements, at least one curved optical face of the wavefront dividing element is formed as inclined around an axis along a predetermined direction passing an optical-axis center of an entrance face of the wavefront dividing element and being perpendicular to the optical axis AXe.
摘要:
A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
摘要:
An optical integrator has characteristics to suppress influence of relative positioning error of a pair of optical members on an illuminance distribution and on a shape of an illumination field. The optical integrator is a wavefront splitting type optical integrator having a first optical member and a second optical member in order from the entrance side of light. The first optical member has first entrance surfaces having a refractive power in a first direction and substantially no refractive power in a second direction, and first exit surfaces having a refractive power in the first direction and substantially no refractive power in the second direction. The second optical member has second entrance surfaces having a refractive power in the second direction and substantially no refractive power in the first direction, and second exit surfaces having a refractive power in the second direction and substantially no refractive power in the first direction.
摘要:
A measuring apparatus for measuring a pupil transmittance distribution of an optical system to be examined has a diffraction grating mounted on a first surface in an optical Fourier transform relation with a pupil of the optical system, an illumination optical system which makes a beam inclined relative to the optical axis, incident to a predetermined position on the first surface so that a +first-order diffracted beam, generated through the diffraction grating, passes through a first pupil partial region in an effective region of the pupil and so that a −first-order diffracted beam, generated through the diffraction grating, passes through a second pupil partial region, and a measuring unit which measures an intensity of the +first-order diffracted beam, and an intensity of the −first-order diffracted beam, and determines a ratio of a pupil transmittance in the first and second pupil partial region regions.
摘要:
An optical integrator system comprises a first optical integrator including a plurality of first wavefront dividing elements arranged in juxtaposition along a predetermined direction, and a second optical integrator including a plurality of second wavefront dividing elements arranged in juxtaposition along the predetermined direction, which are arranged in order from the entrance side of light. The first wavefront dividing elements are so constructed that rays obliquely incident to a center on the optical axis of an entrance surface are emitted in parallel with the optical axis. The second wavefront dividing elements are so constructed that rays obliquely incident to a center on the optical axis of an entrance surface are emitted obliquely to the optical axis.