Method for producing a magnetic disk
    1.
    发明授权
    Method for producing a magnetic disk 失效
    磁盘制造方法

    公开(公告)号:US5738906A

    公开(公告)日:1998-04-14

    申请号:US624801

    申请日:1996-03-27

    IPC分类号: G11B5/64 G11B5/84 B05D5/12

    CPC分类号: G11B5/64 G11B5/8404

    摘要: A method for producing a magnetic disk having a surface roughness in the entire portion of its main surface in which the peak height of the surface roughness in a data zone of the magnetic disk is lower than the peak height of the surface roughness in a CSS zone of the magnetic disk, wherein forming a magnetic disk substrate having the main surface in which a surface roughness having a substantially uniform peak height is formed in the substantially entire portion of the main surface; conducting varnishing only to the data zone in the main surface of the substrate having the surface roughness to lower the peak height of the surface roughness of the data zone; and forming a ferromagnetic layer, a protective layer and a lubricant layer sequentially on a region of the main surface of the substrate, which includes the data zone and the CSS zone.

    摘要翻译: 一种在其主表面的整个部分中具有表面粗糙度的磁盘的制造方法,其中磁盘的数据区域中的表面粗糙度的峰值高度低于CSS区域中的表面粗糙度的峰值高度 其特征在于,在所述主面的大致整个部分形成具有主表面的磁盘基板,所述主表面具有基本上均匀的峰高的表面粗糙度; 仅对具有表面粗糙度的基板的主表面中的数据区进行上光,以降低数据区的表面粗糙度的峰高; 以及在包括数据区和CSS区的基板的主表面的区域上依次形成铁磁层,保护层和润滑层。

    Glass substrate for information recording medium and method for manufacturing the same, and magnetic recording medium
    3.
    发明授权
    Glass substrate for information recording medium and method for manufacturing the same, and magnetic recording medium 失效
    用于信息记录介质的玻璃基板及其制造方法和磁记录介质

    公开(公告)号:US08328602B2

    公开(公告)日:2012-12-11

    申请号:US12833410

    申请日:2010-07-09

    IPC分类号: C03B27/00 B24C3/08 G11B9/04

    摘要: The present invention relates to a method for manufacturing a glass substrate for information recording medium, the method including: a lapping step of lapping a circular glass plate made of an alkali aluminosilicate glass; and a subsequent cerium oxide polishing step of polishing the circular glass plate with a slurry containing a cerium oxide abrasive, in which a difference (SiO2−Al2O3) obtained by subtracting an Al2O3 content from an SiO2 content in the alkali aluminosilicate glass is 62% by mole or less; and in which the method further includes: subsequently to the cerium oxide polishing step, a cleaning step of cleaning the circular glass plate with a cleaning liquid having a sulfuric acid concentration of 20% by mass or more and 80% by mass or less and a hydrogen peroxide concentration of 1% by mass or more and 10% by mass or less at a liquid temperature of 50° C. or higher and 100° C. or lower, and after the cleaning step, a finish polishing step of polishing a main surface of the circular glass plate with a slurry containing a colloidal silica abrasive.

    摘要翻译: 本发明涉及一种用于信息记录介质的玻璃基板的制造方法,该方法包括:研磨由铝硅酸铝玻璃制成的圆形玻璃板的研磨步骤; 以及后续的氧化铈抛光步骤,用含有氧化铈磨料的浆料研磨圆形玻璃板,其中通过从碱性铝硅酸盐玻璃中的SiO 2含量减去Al 2 O 3含量而得到的差异(SiO 2 -Al 2 O 3)为62% 摩尔或更少; 该方法还包括:随后的氧化铈抛光步骤,用硫酸浓度为20质量%以上且80质量%以下的清洗液清洗圆形玻璃板的清洗工序, 过氧化氢浓度在50℃以上且100℃以下的液温下为1质量%以上且10质量%以下,在清洗工序后,对主体进行研磨的精抛光工序 具有含有胶体二氧化硅研磨剂的浆料的圆形玻璃板的表面。

    METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM
    4.
    发明申请
    METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM 审中-公开
    用于制造用于磁记录介质的玻璃基板的方法

    公开(公告)号:US20110212669A1

    公开(公告)日:2011-09-01

    申请号:US13033940

    申请日:2011-02-24

    IPC分类号: B24B1/00

    CPC分类号: B24B37/08

    摘要: The present invention relates to a method for manufacturing a disk-shaped glass substrate for a magnetic recording medium, having a circular hole at the center thereof, the method including: a shape-forming step of performing shape forming to a glass substrate having a sheet shape; a polishing step of polishing a main surface of the glass substrate; and a cleaning step of cleaning the glass substrate, in which the polishing step includes a finish polishing step of simultaneously polishing both main surfaces of the glass substrate using a polishing slurry containing abrasives having an average particle diameter of 100 nm or less; and the glass substrate polished in the finish polishing step has a thickness deviation among glass substrates polished in the same lot of 1.5 μm or less.

    摘要翻译: 本发明涉及一种制造用于磁记录介质的圆盘状玻璃基板的方法,该圆盘形玻璃基板在其中心处具有圆形孔,该方法包括:形成步骤,对具有片材的玻璃基板进行成形 形状; 研磨玻璃基板的主面的研磨工序; 以及清洗玻璃基板的清洗工序,其中,研磨工序包括使用含有平均粒径为100nm以下的研磨剂的研磨浆料同时研磨玻璃基板的两个主面的精抛光工序; 并且在精抛光步骤中抛光的玻璃基板在相同批次中抛光的玻璃基板之间的厚度偏差为1.5μm以下。

    GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM AND METHOD FOR MANUFACTURING THE SAME, AND MAGNETIC RECORDING MEDIUM
    5.
    发明申请
    GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM AND METHOD FOR MANUFACTURING THE SAME, AND MAGNETIC RECORDING MEDIUM 失效
    用于信息记录介质的玻璃基板及其制造方法和磁记录介质

    公开(公告)号:US20110008649A1

    公开(公告)日:2011-01-13

    申请号:US12833410

    申请日:2010-07-09

    摘要: The present invention relates to a method for manufacturing a glass substrate for information recording medium, the method including: a lapping step of lapping a circular glass plate made of an alkali aluminosilicate glass; and a subsequent cerium oxide polishing step of polishing the circular glass plate with a slurry containing a cerium oxide abrasive, in which a difference (SiO2−Al2O3) obtained by subtracting an Al2O3 content from an SiO2 content in the alkali aluminosilicate glass is 62% by mole or less; and in which the method further includes: subsequently to the cerium oxide polishing step, a cleaning step of cleaning the circular glass plate with a cleaning liquid having a sulfuric acid concentration of 20% by mass or more and 80% by mass or less and a hydrogen peroxide concentration of 1% by mass or more and 10% by mass or less at a liquid temperature of 50° C. or higher and 100° C. or lower, and after the cleaning step, a finish polishing step of polishing a main surface of the circular glass plate with a slurry containing a colloidal silica abrasive.

    摘要翻译: 本发明涉及一种用于信息记录介质的玻璃基板的制造方法,该方法包括:研磨由铝硅酸铝玻璃制成的圆形玻璃板的研磨步骤; 以及后续的氧化铈抛光步骤,用含有氧化铈磨料的浆料研磨圆形玻璃板,其中通过从碱性铝硅酸盐玻璃中的SiO 2含量减去Al 2 O 3含量而得到的差异(SiO 2 -Al 2 O 3)为62% 摩尔或更少; 该方法还包括:随后的氧化铈抛光步骤,用硫酸浓度为20质量%以上且80质量%以下的清洗液清洗圆形玻璃板的清洗工序, 过氧化氢浓度在50℃以上且100℃以下的液温下为1质量%以上且10质量%以下,在清洗工序后,对主体进行研磨的精抛光工序 具有含有胶体二氧化硅研磨剂的浆料的圆形玻璃板的表面。