Protective film for plasma display panel and method for manufacturing this protective film, and plasma display panel and method for manufacturing thereof
    1.
    发明授权
    Protective film for plasma display panel and method for manufacturing this protective film, and plasma display panel and method for manufacturing thereof 有权
    等离子体显示面板用保护膜及其制造方法以及等离子体显示面板及其制造方法

    公开(公告)号:US07626337B2

    公开(公告)日:2009-12-01

    申请号:US11594987

    申请日:2006-11-09

    IPC分类号: H01J17/49

    摘要: A plasma display panel 1 of the present invention has a protective film 14 over a sustaining electrode 15 and a scanning electrode 16, with the main components of the protective film being CaO and SrO, and the concentration of the CaO in the protective film 14 is 20 mol % or more and 90 mol % or less. This protective film 14 has a smaller work function than a conventional MgO film so light can be emitted at a lower discharge voltage than in the past. If the discharge voltage is lower, the protective film 14 will be sputtered more slowly so that the service life of the plasma display panel 1 will be longer. Also, since the plasma-gas contains xenon gas, the plasma display panel of the present invention has higher brightness.

    摘要翻译: 本发明的等离子体显示面板1在保持电极15和扫描电极16上具有保护膜14,保护膜的主要成分为CaO和SrO,保护膜14中的CaO浓度为 20摩尔%以上且90摩尔%以下。 该保护膜14比常规的MgO膜具有更小的功函数,因此可以以比过去更低的放电电压发射光。 如果放电电压较低,则保护膜14将被更慢地溅射,使得等离子体显示面板1的使用寿命更长。 此外,由于等离子体气体含有氙气,本发明的等离子体显示面板具有较高的亮度。

    Protective film for plasma display panel and method for manufacturing this protective film, and plasma display panel and method for manufacturing thereof
    2.
    发明申请
    Protective film for plasma display panel and method for manufacturing this protective film, and plasma display panel and method for manufacturing thereof 有权
    等离子体显示面板用保护膜及其制造方法以及等离子体显示面板及其制造方法

    公开(公告)号:US20070108905A1

    公开(公告)日:2007-05-17

    申请号:US11594987

    申请日:2006-11-09

    IPC分类号: H01J17/49

    摘要: A plasma display panel 1 of the present invention has a protective film 14 over a sustaining electrode 15 and a scanning electrode 16, with the main components of the protective film being CaO and SrO, and the concentration of the CaO in the protective film 14 is 20 mol % or more and 90 mol % or less. This protective film 14 has a smaller work function than a conventional MgO film so light can be emitted at a lower discharge voltage than in the past. If the discharge voltage is lower, the protective film 14 will be sputtered more slowly so that the service life of the plasma display panel 1 will be longer. Also, since the plasma-gas contains xenon gas, the plasma display panel of the present invention has higher brightness.

    摘要翻译: 本发明的等离子体显示面板1在保持电极15和扫描电极16上具有保护膜14,保护膜的主要成分为CaO和SrO,保护膜14中的CaO浓度为 20摩尔%以上且90摩尔%以下。 该保护膜14比常规的MgO膜具有更小的功函数,因此可以以比过去更低的放电电压发射光。 如果放电电压较低,则保护膜14将被更慢地溅射,使得等离子体显示面板1的使用寿命更长。 此外,由于等离子体气体含有氙气,本发明的等离子体显示面板具有较高的亮度。

    Protective film for plasma display panel and method for manufacturing this protective film, and plasma display panel and method for manufacturing thereof
    3.
    发明申请
    Protective film for plasma display panel and method for manufacturing this protective film, and plasma display panel and method for manufacturing thereof 审中-公开
    等离子体显示面板用保护膜及其制造方法以及等离子体显示面板及其制造方法

    公开(公告)号:US20080182034A1

    公开(公告)日:2008-07-31

    申请号:US12076901

    申请日:2008-03-25

    IPC分类号: B05D3/06 H05H1/00

    摘要: A plasma display panel 1 of the present invention has a protective film 14 over a sustaining electrode 15 and a scanning electrode 16, with the main components of the protective film being CaO and SrO, and the concentration of the CaO in the protective film 14 is 20 mol % or more and 90 mol % or less. This protective film 14 has a smaller work function than a conventional MgO film so light can be emitted at a lower discharge voltage than in the past. If the discharge voltage is lower, the protective film 14 will be sputtered more slowly so that the service life of the plasma display panel 1 will be longer. Also, since the plasma gas contains xenon gas, the plasma display panel of the present invention has higher brightness.

    摘要翻译: 本发明的等离子体显示面板1在保持电极15和扫描电极16上具有保护膜14,保护膜的主要成分为CaO和SrO,保护膜14中的CaO浓度为 20摩尔%以上且90摩尔%以下。 该保护膜14比常规的MgO膜具有更小的功函数,因此可以以比过去更低的放电电压发射光。 如果放电电压较低,则保护膜14将被更慢地溅射,使得等离子体显示面板1的使用寿命更长。 此外,由于等离子体气体含有氙气,本发明的等离子体显示面板具有较高的亮度。

    Method and apparatus for manufacturing plasma display panel
    5.
    发明授权
    Method and apparatus for manufacturing plasma display panel 有权
    制造等离子体显示面板的方法和装置

    公开(公告)号:US08460048B2

    公开(公告)日:2013-06-11

    申请号:US12601068

    申请日:2008-05-30

    IPC分类号: H01J9/24 H01J9/26

    摘要: A method for manufacturing a plasma display panel in which an electrical discharge gas is introduced into a space between a first substrate and a second substrate which are sealed together, the method including: a first deaeration step of releasing impurity gases from a protective film by heating the first substrate, on which the protective film is formed for withstanding plasma electrical discharge, to 280° C. or more in a vacuum or in a controlled atmosphere; and a sealing step of sealing the front substrate, in which the impurity gases have been released from the protective film, and a rear substrate which are placed in contact with each other.

    摘要翻译: 一种用于制造等离子体显示面板的方法,其中放电气体被引入密封在一起的第一基板和第二基板之间的空间中,该方法包括:第一脱气步骤,通过加热从保护膜释放杂质气体 其上形成有保护膜的第一衬底在耐压等离子体放电中在真空或受控气氛中为280℃以上; 以及密封其中杂质气体已经从保护膜释放的前基板和彼此接触放置的后基板的密封步骤。

    METHOD AND APPARATUS FOR MANUFACTURING PLASMA DISPLAY PANEL
    6.
    发明申请
    METHOD AND APPARATUS FOR MANUFACTURING PLASMA DISPLAY PANEL 有权
    制造等离子显示面板的方法和装置

    公开(公告)号:US20100167618A1

    公开(公告)日:2010-07-01

    申请号:US12601068

    申请日:2008-05-30

    IPC分类号: H01J9/26

    摘要: A method for manufacturing a plasma display panel in which an electrical discharge gas is introduced into a space between a first substrate and a second substrate which are sealed together, the method including: a first deaeration step of releasing impurity gases from a protective film by heating the first substrate, on which the protective film is formed for withstanding plasma electrical discharge, to 280° C. or more in a vacuum or in a controlled atmosphere; and a sealing step of sealing the front substrate, in which the impurity gases have been released from the protective film, and a rear substrate which are placed in contact with each other.

    摘要翻译: 一种用于制造等离子体显示面板的方法,其中放电气体被引入密封在一起的第一基板和第二基板之间的空间中,该方法包括:第一脱气步骤,通过加热从保护膜释放杂质气体 其上形成有保护膜的第一衬底在耐压等离子体放电中在真空或受控气氛中为280℃以上; 以及密封其中杂质气体已经从保护膜释放的前基板和彼此接触放置的后基板的密封步骤。

    PROCESS FOR PRODUCING THIN FILM LITHIUM SECONDARY BATTERY
    8.
    发明申请
    PROCESS FOR PRODUCING THIN FILM LITHIUM SECONDARY BATTERY 审中-公开
    生产薄膜锂二次电池的方法

    公开(公告)号:US20120196175A1

    公开(公告)日:2012-08-02

    申请号:US13367576

    申请日:2012-02-07

    IPC分类号: H01M4/48 H01M4/04

    摘要: A process for producing a chargeable-and-dischargeable thin film lithium secondary battery, which includes a substrate, a positive electrode film arranged on the substrate and formed in a structure of which lithium is insertable and releasable, an electrolyte film which is arranged on the positive electrode film and being in contact with the positive electrode film and contains lithium ions and in which lithium ions are movable, and a negative electrode film made of metallic lithium and arranged on the electrolyte film and being in contact with the electrolyte film, wherein after the negative electrode film is formed, a lithium carbonate film is formed on a surface of the negative electrode film by bringing a surface of the negative electrode film into contact with a surface-treating gas containing a rare gas and carbon dioxide. The process does not change the properties of a metallic lithium film as a negative electrode.

    摘要翻译: 一种可充放电薄膜锂二次电池的制造方法,其特征在于,具备:基板,配置在所述基板上的正极膜,其形成为可插拔锂的结构的电解质膜, 正极膜与正极膜接触并含有锂离子并且其中锂离子可移动;以及负极膜,由金属锂制成并且布置在电解质膜上并与电解质膜接触,其中, 形成负极膜,通过使负极膜的表面与含有稀有气体和二氧化碳的表面处理气体接触,在负极膜的表面上形成碳酸锂膜。 该方法不会改变作为负极的金属锂膜的性能。

    Vacuum device and method of manufacturing plasma display device
    9.
    发明授权
    Vacuum device and method of manufacturing plasma display device 有权
    真空装置及等离子体显示装置的制造方法

    公开(公告)号:US06533630B1

    公开(公告)日:2003-03-18

    申请号:US09579274

    申请日:2000-05-26

    IPC分类号: H01J926

    CPC分类号: H01J9/46

    摘要: A vacuum display device for enabling the manufacture of high quality plasma display device with high throughput. A front panel 6 constituting a plasma display device is carried into a film deposition chamber 22; and a MgO thin film is deposited in a vacuum atmosphere. The front panel 6 is then carried into an alignment chamber 11 without being exposed to the atmosphere and aligned with a rear panel 7 that has been subjected to degassing in a vacuum atmosphere. There is no absorption of gas, such as moisture; and the quality of the thin film is not degraded. After alignment, aging processing is carried out without exposure to the atmosphere, followed by gas encapsulation and hermetic sealing, which further increases throughput.

    摘要翻译: 一种真空显示装置,用于制造具有高产量的高质量等离子体显示装置。 构成等离子体显示装置的前面板6被携带到成膜室22中; 并在真空气氛中沉积MgO薄膜。 然后将前面板6携带到对准室11中,而不暴露于大气中并与在真空气氛中进行脱气的后面板7对准。 没有吸收气体,如水分; 并且薄膜的质量不降低。 对准后,不暴露于大气进行老化处理,随后进行气体封装和气密密封,这进一步提高了生产量。

    VACUUM DEPOSITION SYSTEM AND VACUUM DEPOSITION METHOD
    10.
    发明申请
    VACUUM DEPOSITION SYSTEM AND VACUUM DEPOSITION METHOD 审中-公开
    真空沉积系统和真空沉积方法

    公开(公告)号:US20120082778A1

    公开(公告)日:2012-04-05

    申请号:US13275696

    申请日:2011-10-18

    IPC分类号: C23C16/44 C23C16/455

    摘要: The present invention aims to provide a technology, which uses an apparatus having a simple configuration to efficiently form a film with uniform film thickness and film quality when continuously forming a film by vacuum deposition of highly reactive lithium. A vacuum deposition system of the present invention has a vacuum deposition chamber wherein an evaporation material is deposited on a substrate by deposition, a substrate supplying/replacing system, connected to the vacuum deposition chamber, for performing supplying and replacing the substrate to and from the vacuum deposition chamber, and a material supplying/replacing system, connected to the vacuum deposition chamber, for performing the supplying and the replacing of the evaporation material to and from the vacuum deposition chamber.

    摘要翻译: 本发明旨在提供一种技术,其使用具有简单构造的装置,以通过真空沉积高反应性锂连续形成膜来有效地形成具有均匀膜厚度和膜质量的膜。 本发明的真空沉积系统具有真空沉积室,其中蒸发材料通过沉积沉积在基板上,基板供应/替换系统连接到真空沉积室,用于向基板提供和更换基板 真空沉积室和连接到真空沉积室的材料供应/替换系统,用于执行向真空沉积室供应和替换蒸发材料。