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    Method of making phase mask for machining optical fiber and optical fiber having bragg diffraction grating produced using the phase mask for machining optical fiber
    1.
    发明授权
    Method of making phase mask for machining optical fiber and optical fiber having bragg diffraction grating produced using the phase mask for machining optical fiber 失效
    制造用于加工光纤的相位掩模和具有使用用于加工光纤的相位掩模制造的布拉格衍射光栅的光纤的方法

    公开(公告)号：US06795614B2

    公开(公告)日：2004-09-21

    申请号：US10019847

    申请日：2001-10-25

    申请人： Toshikazu Segawa ,  Masaaki Kurihara ,  Tetsuro Komukai ,  Masataka Nakazawa

    发明人： Toshikazu Segawa ,  Masaaki Kurihara ,  Tetsuro Komukai ,  Masataka Nakazawa

    IPC分类号： G02B634

    CPC分类号： G02B6/02138 ,  G02B6/02085 ,  G02B6/124 ,  G02B2006/12107 ,  G03F1/34 ,  G03F7/001 ,  G03F7/70325 ,  G03F7/7035 ,  G03F7/70383 ,  G03F7/70475

    摘要： The present invention relates to a method of producing an optical fiber-processing phase mask having minimized connection errors that may degrade the spectral line shape and group delay characteristics of an optical fiber diffraction grating fabricated by using the phase mask. The present invention provides a method of producing an optical fiber-processing phase mask having a repeating pattern of grating-shaped grooves and strips provided on one surface of a transparent substrate, so that diffracted light produced by the repeating pattern is applied to an optical fiber to fabricate a diffraction grating in the optical fiber by interference fringes of diffracted light of different orders. In making a mask having a plurality of juxtaposed patterns (P1 to P5) having a linearly or nonlinearly increasing or decreasing pitch and a uniform groove-strip width ratio, multiple exposure is carried out to minimize difference between the pitch at the joint between patterns having different pitch data and the pitch in each individual pattern.

    摘要翻译： 本发明涉及一种制造光纤处理相位掩模的方法，其具有最小化的连接误差，其可能降低通过使用相位掩模制造的光纤衍射光栅的谱线形状和群延迟特性。 本发明提供一种制造光纤加工相位掩模的方法，该光纤加工相位掩模具有设置在透明基板的一个表面上的光栅形状的槽和条带的重复图案，从而将由重复图案产生的衍射光施加到光纤 通过不同阶数的衍射光的干涉条纹在光纤中制造衍射光栅。 在具有多个具有线性或非线性增加或减小间距的均匀图案（P1至P5）的掩模和均匀的槽带宽度比时，进行多次曝光以最小化在具有 不同的音调数据和每个单独模式的音调。

    Phase mask for manufacturing diffraction grating, and method of manufacture
    3.
    发明授权
    Phase mask for manufacturing diffraction grating, and method of manufacture 有权
    制造衍射光栅的相位掩模及其制造方法

    公开(公告)号：US06200711B1

    公开(公告)日：2001-03-13

    申请号：US09380196

    申请日：1999-08-27

    申请人： Masaaki Kurihara ,  Toshikazu Segawa

    发明人： Masaaki Kurihara ,  Toshikazu Segawa

    IPC分类号： G03F900

    CPC分类号： G03F1/34 ,  G02B5/1857 ,  G02B6/02138

    摘要： The invention relates to a diffraction grating-forming phase mask which can make the diffraction grating to be formed substantially free of any defect, even when foreign matters or resins, etc. sublimed from an optical fiber are deposited on the surface of the phase mask. The phase mask 21 comprises a substrate and a grating form of repetitive groove (26)-and-strip (27) pattern for forming a diffraction grating by interference fringes of diffracted light through the repetitive pattern. An optically transparent protective layer 30 is applied over the surface of the substrate with the repetitive groove (26)-and-strip (27) pattern formed thereon.

    摘要翻译： 本发明涉及一种衍射光栅形成相位掩模，即使当从光纤升华的异物或树脂等沉积在相位掩模的表面上时，其可以使衍射光栅形成为基本上没有任何缺陷。 相位掩模21包括基板和重复凹槽（26）和带（27）图案的光栅形式，用于通过穿过重复图案的衍射光的干涉条来形成衍射光栅。 将光学透明的保护层30施加在基板的表面上，其上形成有重复的凹槽（26）和带（27）图案。

    Phase mask for processing optical fibers and method of manufacturing the same
    4.
    发明授权
    Phase mask for processing optical fibers and method of manufacturing the same 有权
    用于处理光纤的相位掩模及其制造方法

    公开(公告)号：US06214495B1

    公开(公告)日：2001-04-10

    申请号：US09254086

    申请日：1999-04-13

    申请人： Toshikazu Segawa ,  Masaaki Kurihara

    发明人： Toshikazu Segawa ,  Masaaki Kurihara

    IPC分类号： G03F900

    CPC分类号： G03F1/34 ,  G02B6/02138 ,  G03F7/001

    摘要： The invention relates to an optical fiber-processing phase mask which enables a phase mask with a groove pitch varying in a position-dependent manner to be easily obtained by electron beam writing, and its fabrication method. In the optical fiber-processing phase mask comprising on one surface of a transparent substrate a repetitive pattern of grooves (26) and strips (27) located in a grating form, so that an optical fiber is irradiated with diffracted light according to the repetitive pattern to make a diffraction grating in said optical fiber by an interference fringe of diffracted light of different orders, a plurality of patterns (A1 to A3) having a linearly or nonlinearly increasing or decreasing pitch are juxtaposed, with a constant width ratio between the grooves (26) and the strips (27). The phase mask is fabricated by carrying out writing while the groove-and-strip patterns with a different pitch are juxtaposed.

    摘要翻译： 本发明涉及一种能够通过电子束写入容易地获得具有以位置相关方式变化的槽间距的相位掩模及其制造方法的光纤加工相位掩模。 在光纤加工相位掩模中，在透明基板的一个表面上形成重复图案的凹槽（26）和位于光栅形状的条带（27），使得根据重复图案向衍射光照射光纤 为了通过不同阶数的衍射光的干涉条纹在所述光纤中形成衍射光栅，将具有线性或非线性增加或减小间距的多个图案（A1至A3）并置，并且凹槽之间具有恒定的宽度比（ 26）和条带（27）。 通过执行写入来制造相位掩模，而具有不同间距的凹槽和带状图案并置。

    Reflection type diffuse hologram, hologram for reflection hologram color filters, etc., and reflection type display device using such holograms
    5.
    发明授权
    Reflection type diffuse hologram, hologram for reflection hologram color filters, etc., and reflection type display device using such holograms 失效
    反射型漫射全息图，反射全息彩色滤光片全息图等，以及使用这样的全息图的反射型显示装置

    公开(公告)号：US07215451B1

    公开(公告)日：2007-05-08

    申请号：US09116589

    申请日：1998-07-16

    申请人： Shingo Nishikawa ,  Kenji Ueda ,  Toshikazu Segawa ,  Tsuyoshi Hotta ,  Yuko Kuwabara ,  Masachika Watanabe

    发明人： Shingo Nishikawa ,  Kenji Ueda ,  Toshikazu Segawa ,  Tsuyoshi Hotta ,  Yuko Kuwabara ,  Masachika Watanabe

    IPC分类号： G03H1/20 ,  G03H1/22 ,  G02B5/32

    CPC分类号： G02B5/0252 ,  G02B5/203 ,  G02B5/32 ,  G02F1/133553 ,  G02F2203/03 ,  G03H1/0248 ,  G03H1/18 ,  G03H1/182 ,  G03H1/202 ,  G03H1/24 ,  G03H1/28 ,  G03H1/30 ,  G03H2001/0415 ,  G03H2001/0417 ,  G03H2001/186 ,  G03H2001/187 ,  G03H2001/2263 ,  G03H2001/263 ,  G03H2210/20 ,  G03H2222/13 ,  G03H2223/12 ,  G03H2223/14 ,  G03H2250/44 ,  G03H2260/12 ,  G03H2270/24

    摘要： A method of fabricating a hologram having a pattern made up of pixels in which a photosensitive material for forming a hologram is stacked on either a reflection-type hologram or a transmission type hologram. According to one aspect of the invention, the photosensitive material is stacked on a reflection-type relief hologram and reconstructing illumination light of a given wavelength is struck on the reflection-type relief hologram through the photosensitive material, so that interference fringes produced by interference of the light diffracted from the reflection type relief hologram and the incident light are recorded in the photosensitive material. According to another aspect of the invention, the photosensitive material is stacked on a transmission-type hologram, and reconstructing illumination light of a given wavelength is struck on a side of the transmission type hologram that is not opposite to the volume hologram photosensitive material, so that interference fringes produced by interference of light diffracted from the transmission type hologram and reference light incident on the photosensitive material are recorded in the photosensitive material. According to a third aspect of the invention, the photosensitive material is stacked on a transmission type hologram, and reconstructing illumination light of a given wavelength is struck on a side of the transmission type hologram that is not opposite to the photosensitive material, so that interference fringes produced by interference of light diffracted from the transmission type hologram and zero-order transmitted light are recorded in the photosensitive material, and a reflecting layer is provided on a back side of the photosensitive material.

    摘要翻译： 一种制造具有由其中用于形成全息图的感光材料的像素组成的图案的全息图的方法堆叠在反射型全息图或透射型全息图上。 根据本发明的一个方面，感光材料层叠在反射型浮雕全息图上，并且通过感光材料重建给定波长的照明光被撞击在反射型浮雕全息图上，使得由干涉产生的干涉条纹 从反射型浮雕全息图和入射光衍射的光被记录在感光材料中。 根据本发明的另一方面，将感光材料堆叠在透射型全息图上，并且重建具有给定波长的照明光被撞击在与体积全息图感光材料不相反的透射型全息图的一侧上，因此 感光材料中记录了由透射型全息图衍射的光的干涉条纹和入射到感光材料上的参考光产生的干涉条纹。 根据本发明的第三方面，感光材料层叠在透射型全息图上，并且将重复的给定波长的照明光击中在与感光材料不相反的透射型全息图的一侧上，使得干涉 将由透射型全息图衍射的光的干涉产生的条纹和零级透射光记录在感光材料中，反射层设置在感光材料的背面。

    REFLECTION TYPE DIFFUSE HOLOGRAM, HOLOGRAM FOR REFLECTION HOLOGRAM COLOR FILTERS, ETC, AND REFLECTION TYPE DISPLAY DEVICE USING SUCH HOLOGRAMS
    8.
    发明申请
    REFLECTION TYPE DIFFUSE HOLOGRAM, HOLOGRAM FOR REFLECTION HOLOGRAM COLOR FILTERS, ETC, AND REFLECTION TYPE DISPLAY DEVICE USING SUCH HOLOGRAMS 审中-公开
    反射型DIFFUSE HOLOGRAM，用于反射HOLOGRAM彩色滤光片的HOLOGRAM，ETC以及使用这种HOLOGRAMS的反射型显示器件

    公开(公告)号：US20070195391A1

    公开(公告)日：2007-08-23

    申请号：US11694159

    申请日：2007-03-30

    申请人： Shingo Nishikawa ,  Kenji Ueda ,  Toshikazu Segawa ,  Tsuyoshi Hotta ,  Yuko Kuwabara ,  Masachika Watanabe

    发明人： Shingo Nishikawa ,  Kenji Ueda ,  Toshikazu Segawa ,  Tsuyoshi Hotta ,  Yuko Kuwabara ,  Masachika Watanabe

    IPC分类号： G02B5/32

    CPC分类号： G02B5/0252 ,  G02B5/203 ,  G02B5/32 ,  G02F1/133553 ,  G02F2203/03 ,  G03H1/0248 ,  G03H1/18 ,  G03H1/182 ,  G03H1/202 ,  G03H1/2202 ,  G03H1/24 ,  G03H1/28 ,  G03H1/30 ,  G03H2001/0415 ,  G03H2001/0417 ,  G03H2001/186 ,  G03H2001/187 ,  G03H2001/2263 ,  G03H2001/263 ,  G03H2210/20 ,  G03H2222/13 ,  G03H2223/12 ,  G03H2223/14 ,  G03H2250/44 ,  G03H2260/12 ,  G03H2270/24

    摘要： A method of fabricating a hologram having a pattern made up of pixels in which a photosensitive material for forming a hologram is stacked on either a reflection-type hologram or a transmission type hologram. According to one aspect of the invention, the photosensitive material is stacked on a reflection-type relief hologram and reconstructing illumination light of a given wavelength is struck on the reflection-type relief hologram through the photosensitive material, so that interference fringes produced by interference of the light diffracted from the reflection type relief hologram and the incident light are recorded in the photosensitive material. According to another aspect of the invention, the photosensitive material is stacked on a transmission-type hologram, and reconstructing illumination light of a given wavelength is struck on a side of the transmission type hologram that is not opposite to the volume hologram photosensitive material, so that interference fringes produced by interference of light diffracted from the transmission type hologram and reference light incident on the photosensitive material are recorded in the photosensitive material. According to a third aspect of the invention, the photosensitive material is stacked on a transmission type hologram, and reconstructing illumination light of a given wavelength is struck on a side of the transmission type hologram that is not opposite to the photosensitive material, so that interference fringes produced by interference of light diffracted from the transmission type hologram and zero-order transmitted light are recorded in the photosensitive material, and a reflecting layer is provided on a back side of the photosensitive material.

    摘要翻译： 一种制造具有由其中用于形成全息图的感光材料的像素组成的图案的全息图的方法堆叠在反射型全息图或透射型全息图上。 根据本发明的一个方面，感光材料层叠在反射型浮雕全息图上，并且通过感光材料重建给定波长的照明光被撞击在反射型浮雕全息图上，使得由干涉产生的干涉条纹 从反射型浮雕全息图和入射光衍射的光被记录在感光材料中。 根据本发明的另一方面，将感光材料堆叠在透射型全息图上，并且重建具有给定波长的照明光被撞击在与体积全息图感光材料不相反的透射型全息图的一侧上，因此 感光材料中记录了由透射型全息图衍射的光的干涉条纹和入射到感光材料上的参考光产生的干涉条纹。 根据本发明的第三方面，感光材料层叠在透射型全息图上，并且将重复的给定波长的照明光击中在与感光材料不相反的透射型全息图的一侧上，使得干涉 将由透射型全息图衍射的光的干涉产生的条纹和零级透射光记录在感光材料中，反射层设置在感光材料的背面。