公开(公告)号：US20130137865A1

公开(公告)日：2013-05-30

申请号：US13814869

申请日：2011-08-11

申请人： Toshio Nakamura ,  Kazunari Sakagami ,  Kazuhide Konishi ,  Kanako Yamamoto ,  Seiji Masuda ,  Yohei Matsuda ,  Kumiko Okada ,  Tsuyoshi Shibata ,  Hiroshi Ohta ,  Akito Yasuhara ,  Hiroshi Kawamoto ,  Hideaki Amada ,  Hiroki Urabe ,  Rie Nishikawa ,  Shuhei Kashiwa ASHIWA

发明人： Toshio Nakamura ,  Kazunari Sakagami ,  Kazuhide Konishi ,  Kanako Yamamoto ,  Seiji Masuda ,  Yohei Matsuda ,  Kumiko Okada ,  Tsuyoshi Shibata ,  Hiroshi Ohta ,  Akito Yasuhara ,  Hiroshi Kawamoto ,  Hideaki Amada ,  Hiroki Urabe ,  Rie Nishikawa ,  Shuhei Kashiwa ASHIWA

IPC分类号： C07D413/14 ,  C07D413/04 ,  C07D403/04 ,  C07D231/38

CPC分类号： C07D413/14 ,  C07D231/38 ,  C07D403/04 ,  C07D403/14 ,  C07D413/04

摘要： A compound represented by formula [I] and a pharmaceutically accepted salt of said compound are a novel compound and a pharmaceutically accepted salt thereof which exert antagonistic activity against group II metabotropic glutamate (mGlu) receptors, and are effective as a novel preventive or therapeutic agent for disorders such as mood disorders (depressive disorder, bipolar disorder, etc.), anxiety disorders (generalized anxiety disorder, panic disorder, obsessive-compulsive disorder, social anxiety disorder, posttraumatic stress disorder, a specific phobic disorder, acute stress disorder, etc.), schizophrenia, Alzheimer's disease, cognitive impairment, dementia, drug dependence, convulsions, shivering, pain, sleep disorders, and the like.

摘要翻译： 由式[I]表示的化合物和所述化合物的药学上可接受的盐是对II族代谢型谷氨酸（mGlu）受体具有拮抗作用的新化合物及其药学上可接受的盐，并且作为新的预防或治疗剂是有效的 用于诸如情绪障碍（抑郁障碍，双相情感障碍等），焦虑障碍（广泛性焦虑症，恐慌症，强迫症，社会焦虑症，创伤后应激障碍，特异性恐怖症，急性应激障碍等） ，精神分裂症，阿尔茨海默病，认知障碍，痴呆，药物依赖，抽搐，发抖，疼痛，睡眠障碍等。

公开(公告)号：US20130123500A1

公开(公告)日：2013-05-16

申请号：US13812437

申请日：2011-07-29

申请人： Toshio Nakamura ,  Kazunari Sakagami ,  Kazuhide Konishi ,  Kanako Yamamoto ,  Seiji Masuda ,  Yohei Matsuda ,  Kumiko Okada ,  Tsuyoshi Shibata ,  Hiroshi Ohta ,  Akito Yasuhara ,  Hiroshi Kawamoto

发明人： Toshio Nakamura ,  Kazunari Sakagami ,  Kazuhide Konishi ,  Kanako Yamamoto ,  Seiji Masuda ,  Yohei Matsuda ,  Kumiko Okada ,  Tsuyoshi Shibata ,  Hiroshi Ohta ,  Akito Yasuhara ,  Hiroshi Kawamoto

IPC分类号： C07D231/12 ,  C07D231/20 ,  C07D231/38 ,  C07D403/06 ,  C07D401/06

CPC分类号： C07D231/12 ,  C07D231/14 ,  C07D231/20 ,  C07D231/38 ,  C07D401/04 ,  C07D401/06 ,  C07D401/10 ,  C07D401/12 ,  C07D403/04 ,  C07D403/06 ,  C07D413/04

摘要： Provided is a novel compound represented by formula [I] or a pharmaceutically acceptable salt thereof having antagonistic activity against group II metabolism-type glutamic acid (m-Glu) receptors. The compound or pharmaceutically acceptable salt thereof is useful as a prophylactic or therapeutic agent for diseases such as new mood disorders (depressive and bipolar disorders), anxiety disorders (generalized anxiety disorder, panic disorder, obsessive-compulsive disorder, social anxiety disorder, post-traumatic stress disorder, specific phobias, and acute stress disorder), schizophrenia, Alzheimer's disease, cognitive dysfunction, dementia, drug dependence, convulsions, tremors, pain, sleep disorders, and the like.

摘要翻译： 本发明提供由式[I]表示的新化合物或其对II类代谢型谷氨酸（m-Glu）受体具有拮抗作用的药学上可接受的盐。 化合物或其药学上可接受的盐可用作疾病的预防或治疗剂，例如新的情绪障碍（抑郁和双相性精神障碍），焦虑症（广泛性焦虑症，惊恐障碍，强迫症，社会焦虑症， 创伤性应激障碍，特异性恐惧症和急性应激障碍），精神分裂症，阿尔茨海默病，认知功能障碍，痴呆，药物依赖，惊厥，震颤，疼痛，睡眠障碍等。

公开(公告)号：US08642626B2

公开(公告)日：2014-02-04

申请号：US13812437

申请日：2011-07-29

申请人： Toshio Nakamura ,  Kazunari Sakagami ,  Kazuhide Konishi ,  Kanako Yamamoto ,  Seiji Masuda ,  Yohei Matsuda ,  Kumiko Okada ,  Tsuyoshi Shibata ,  Hiroshi Ohta ,  Akito Yasuhara ,  Hiroshi Kawamoto

发明人： Toshio Nakamura ,  Kazunari Sakagami ,  Kazuhide Konishi ,  Kanako Yamamoto ,  Seiji Masuda ,  Yohei Matsuda ,  Kumiko Okada ,  Tsuyoshi Shibata ,  Hiroshi Ohta ,  Akito Yasuhara ,  Hiroshi Kawamoto

IPC分类号： A61K31/4439 ,  A61K31/415 ,  C07D231/12 ,  C07D231/20 ,  C07D231/38 ,  C07D403/06 ,  C07D401/06

CPC分类号： C07D231/12 ,  C07D231/14 ,  C07D231/20 ,  C07D231/38 ,  C07D401/04 ,  C07D401/06 ,  C07D401/10 ,  C07D401/12 ,  C07D403/04 ,  C07D403/06 ,  C07D413/04

摘要： Provided is a novel compound represented by formula [I] or a pharmaceutically acceptable salt thereof having antagonistic activity against group II metabolism-type glutamic acid (m-Glu) receptors. The compound or pharmaceutically acceptable salt thereof is useful as a prophylactic or therapeutic agent for diseases such as new mood disorders (depressive and bipolar disorders), anxiety disorders (generalized anxiety disorder, panic disorder, obsessive-compulsive disorder, social anxiety disorder, post-traumatic stress disorder, specific phobias, and acute stress disorder), schizophrenia, Alzheimer's disease, cognitive dysfunction, dementia, drug dependence, convulsions, tremors, pain, sleep disorders, and the like.

摘要翻译： 本发明提供由式[I]表示的新化合物或其对II类代谢型谷氨酸（m-Glu）受体具有拮抗作用的药学上可接受的盐。 化合物或其药学上可接受的盐可用作疾病的预防或治疗剂，例如新的情绪障碍（抑郁和双相性精神障碍），焦虑症（广泛性焦虑症，惊恐障碍，强迫症，社会焦虑症， 创伤性应激障碍，特异性恐惧症和急性应激障碍），精神分裂症，阿尔茨海默病，认知功能障碍，痴呆，药物依赖，惊厥，震颤，疼痛，睡眠障碍等。

公开(公告)号：US20110275647A1

公开(公告)日：2011-11-10

申请号：US13144316

申请日：2010-02-22

申请人： Keisuke Arakawa ,  Yoshiki Ito ,  Hiroshi Kawamoto ,  Junichi Sakaki ,  Tadashi Shimamura

发明人： Keisuke Arakawa ,  Yoshiki Ito ,  Hiroshi Kawamoto ,  Junichi Sakaki ,  Tadashi Shimamura

IPC分类号： A61K31/501 ,  A61K31/519 ,  A61P3/06 ,  A61P3/10 ,  A61P3/04 ,  A61K31/497 ,  C07D471/04

CPC分类号： C07D471/04

摘要： The present invention relates to a compound represented by a formula (I): or a pharmaceutically acceptable salt thereof, wherein R1 represents lower alkyl or the like; R2 represents phenyl or the like; R represents a halogen atom or the like; X represents an oxygen atom or the like; Y1, Y2, Y3 and Y4 represent CH or the like; l represents an integer of from 0 to 3; m and n each represent an integer of 1 or 2; p represents an integer of from 0 to 2; and q represents an integer of from 1 to 3.

摘要翻译： 本发明涉及由式（I）表示的化合物或其药学上可接受的盐，其中R 1表示低级烷基等; R2表示苯基等; R表示卤素原子等; X表示氧原子等; Y1，Y2，Y3和Y4表示CH等; l表示0〜3的整数， m和n各自表示1或2的整数; p表示0〜2的整数， q表示1〜3的整数。

公开(公告)号：US07816313B2

公开(公告)日：2010-10-19

申请号：US12082173

申请日：2008-04-08

申请人： Hiroshi Kawamoto ,  Mikie Miyasato ,  Takuo Oowada ,  Norio Ishikawa

发明人： Hiroshi Kawamoto ,  Mikie Miyasato ,  Takuo Oowada ,  Norio Ishikawa

IPC分类号： H01L21/02

CPC分类号： G03F7/423 ,  H01L21/02063 ,  H01L21/02071

摘要： A photoresist residue remover composition is provided that removes a photoresist residue formed by a resist ashing treatment after dry etching in a step of forming, on a substrate surface, wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the composition including one or two or more types of inorganic acid and one or two or more types of inorganic fluorine compound. There is also provided a process for producing a semiconductor circuit element wherein, in a step of forming wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the photoresist residue remover composition is used for removing a photoresist residue formed by a resist ashing treatment after dry etching.

摘要翻译： 提供了一种光致抗蚀剂残渣去除剂组合物，其在干法蚀刻之后除去由抗蚀剂灰化处理形成的光致抗蚀剂残渣，在基板表面上形成任何这些铝，铜，钨和任何这些的合金的任何金属的布线 金属作为主要成分，该组合物包含一种或两种以上的无机酸和一种或两种以上的无机氟化合物。 还提供了一种用于制造半导体电路元件的方法，其中在以任何这些金属为主要成分的铝，铜，钨和任何金属的任何金属的布线形成步骤中，使用光刻胶残渣去除剂组合物 用于去除在干蚀刻之后由抗蚀剂灰化处理形成的光致抗蚀剂残渣。

公开(公告)号：US07729653B2

公开(公告)日：2010-06-01

申请号：US11588228

申请日：2006-10-27

申请人： Hiroshi Kawamoto ,  Jitsuo Masuda ,  Masayasu Narimatsu ,  Naoki Fukudo

发明人： Hiroshi Kawamoto ,  Jitsuo Masuda ,  Masayasu Narimatsu ,  Naoki Fukudo

IPC分类号： G03G21/00

CPC分类号： G03G21/0005 ,  G03G2221/0026 ,  G03G2221/0089

摘要： An image forming apparatus and a method for cleaning a photoreceptor are realized that allow cleaning a surface of the photoreceptor to eliminate foreign substances adhering thereto, without using a special abrasive sheet. A recording sheet is fed and brought into contact with photoreceptors of all photoreceptor drums. The recording sheet is stopped by causing the vicinity of a rear end of the recording sheet to be sandwiched between a pair of registration rollers. Then, the photoreceptor drums are rotated. By this way, the cleaning is carried out to the photoreceptor.

摘要翻译： 实现了一种用于清洁感光体的图像形成装置和方法，其可以清洁感光体的表面以消除附着在其上的异物，而不使用特殊的研磨片。 记录纸被馈送并与所有感光鼓的感光体接触。 通过使记录纸的后端附近夹在一对配准辊之间来停止记录纸。 然后，感光鼓被旋转。 通过这种方式，对感光体进行清洁。

公开(公告)号：US20090027599A1

公开(公告)日：2009-01-29

申请号：US10588125

申请日：2005-02-25

申请人： Ikuko Ohgaru ,  Nobutaka Fukagawa ,  Terukazu Yanagi ,  Hiroshi Kawamoto

发明人： Ikuko Ohgaru ,  Nobutaka Fukagawa ,  Terukazu Yanagi ,  Hiroshi Kawamoto

IPC分类号： G02F1/1335 ,  G02B5/30 ,  B32B23/04

CPC分类号： C08K5/34922 ,  C08J5/18 ,  C08J2301/12 ,  C08J2301/14 ,  C08K3/36 ,  C08K5/0016 ,  C08K5/10 ,  G02B1/04 ,  G02B5/3083 ,  G02F1/1335 ,  G02F1/133528 ,  G02F1/13363 ,  Y10T428/1041 ,  Y10T428/105 ,  Y10T428/1077 ,  Y10T428/26 ,  Y10T428/31971 ,  C08L1/10 ,  C08L1/12 ,  C08L1/14

摘要： An optical film, which contains a cellulose acylate, at least one compound of formula (I) in an amount of 0.01 to 20 mass parts, and at least one cyclic compound having at least three substituents in an amount of 0.01 to 20 mass parts, to 100 mass parts of the cellulose acylate: wherein R1 to R7, R9 and R10 each independently is a hydrogen atom or a substituent; at least one of R1 to R5 is an electron-donating group; R8 is a hydrogen atom, an alkyl group, an alkenyl group, an alkinyl group, an aryl group, an alkoxy group, an aryloxy group, an alkoxycarbonyl group, an acylamino group, an alkylcarbonyloxy group, a cyano group, or a halogen atom; and an optical compensation sheet, a polarizing plate, and a liquid crystal display device, each of which uses the optical film.

摘要翻译： 含有纤维素酰化物的光学膜，至少一种0.01至20质量份的式（I）化合物和至少一种具有至少三个取代基的环状化合物，其量为0.01至20质量份， 至100质量份的纤维素酰化物：其中R 1至R 7，R 9和R 10各自独立地为氢原子或取代基; R 1至R 5中的至少一个是给电子基团; R8是氢原子，烷基，烯基，炔基，芳基，烷氧基，芳氧基，烷氧基羰基，酰氨基，烷基羰基氧基，氰基或卤素原子 ; 以及各自使用光学膜的光学补偿片，偏振片和液晶显示装置。

公开(公告)号：US20080318424A1

公开(公告)日：2008-12-25

申请号：US12082173

申请日：2008-04-08

申请人： Hiroshi Kawamoto ,  Mikie Miyasato ,  Takuo Oowada ,  Norio Ishikawa

发明人： Hiroshi Kawamoto ,  Mikie Miyasato ,  Takuo Oowada ,  Norio Ishikawa

IPC分类号： H01L21/44

CPC分类号： G03F7/423 ,  H01L21/02063 ,  H01L21/02071

摘要： A photoresist residue remover composition is provided that removes a photoresist residue formed by a resist ashing treatment after dry etching in a step of forming, on a substrate surface, wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the composition including one or two or more types of inorganic acid and one or two or more types of inorganic fluorine compound. There is also provided a process for producing a semiconductor circuit element wherein, in a step of forming wiring of any metal of aluminum, copper, tungsten, and an alloy having any of these metals as a main component, the photoresist residue remover composition is used for removing a photoresist residue formed by a resist ashing treatment after dry etching.

摘要翻译： 提供了一种光致抗蚀剂残渣去除剂组合物，其在干法蚀刻之后除去由抗蚀剂灰化处理形成的光致抗蚀剂残渣，在基板表面上形成任何这些铝，铜，钨和任何这些的合金的任何金属的布线 金属作为主要成分，该组合物包含一种或两种以上的无机酸和一种或两种以上的无机氟化合物。 还提供了一种用于制造半导体电路元件的方法，其中在以任何这些金属为主要成分的铝，铜，钨和任何金属的任何金属的布线形成步骤中，使用光刻胶残渣去除剂组合物 用于去除在干蚀刻之后由抗蚀剂灰化处理形成的光致抗蚀剂残渣。

公开(公告)号：US20080274920A1

公开(公告)日：2008-11-06

申请号：US12057730

申请日：2008-03-28

申请人： Masayuki Negoro ,  Hiroshi Kawamoto ,  Ryo Nishio ,  Toshiki Taguchi

发明人： Masayuki Negoro ,  Hiroshi Kawamoto ,  Ryo Nishio ,  Toshiki Taguchi

IPC分类号： C10M105/70

CPC分类号： C09K19/3475 ,  C07D251/52 ,  C07D251/70 ,  C09K19/32 ,  C09K2019/0429 ,  C10M105/70 ,  C10M111/04 ,  C10M133/42 ,  C10M2207/285 ,  C10M2207/2855 ,  C10M2209/104 ,  C10M2209/1085 ,  C10M2209/109 ,  C10M2209/1095 ,  C10M2215/06 ,  C10M2215/061 ,  C10M2215/222 ,  C10M2215/2225 ,  C10M2215/223 ,  C10M2215/224 ,  C10M2215/225 ,  C10M2215/227 ,  C10M2215/305 ,  C10M2219/101 ,  C10M2219/102 ,  C10M2219/104 ,  C10M2219/108 ,  C10N2220/06 ,  C10N2230/02 ,  C10N2230/06 ,  C10N2230/08 ,  C10M2209/105 ,  C10M2209/108

摘要： A lubricant composition comprising following ingredients (a) and (b) is disclosed. (a) at least one compound represented by formula (1) (b) at least one compound represented by formula (2) (R—X-)m-D   (1) (b) at least one compound represented by formula (2)

摘要翻译： 公开了包含以下成分（a）和（b）的润滑剂组合物。 （a）至少一种由式（1）（b）表示的化合物至少一种由式（2）表示的化合物<？in-line-formula description =“In-Line Formulas”end =“lead”→> （b）由式（2）表示的至少一种化合物，其中R 1，R 2，

公开(公告)号：US20070054814A1

公开(公告)日：2007-03-08

申请号：US11512084

申请日：2006-08-30

申请人： Masayuki Negoro ,  Ken Kawata ,  Hiroshi Kawamoto

发明人： Masayuki Negoro ,  Ken Kawata ,  Hiroshi Kawamoto

IPC分类号： C07D251/54

CPC分类号： C07D251/54

摘要： The novel lubricant composition is disclosed. The composition comprises at least one compound, exhibiting a minimum friction coefficient under a pressure equal to or greater than 10 MPa with the increase of a pressure and a viscosity-pressure coefficient equal to or less than 20 GPa−1 at 40° C., represented by a formula (1). In the formula, Y and Z respectively represent a single bond or a bivalent linking group selected from the group consisting of NRa where Ra is a hydrogen atom or a C1-30 alkyl group, oxygen, sulfur, carbonyl, sulfonyl and any combinations thereof; A and B respectively represent a substituted or non-substituted, alkyl group, alkenyl group, alkynyl group, aryl group or heterocyclic group; T is —S—R1, —O—R2 or —NR3R4; and R1, R2, R3 and R4 respectively represent a substituted or non-substituted, alkyl group, alkenyl group, alkynyl group, aryl group or heterocyclic group.

摘要翻译： 公开了新的润滑剂组合物。 该组合物包含至少一种化合物，在压力等于或大于10MPa的压力和粘度压力系数等于或小于20GPa -1的情况下表现出最小的摩擦系数。 > 40℃，由式（1）表示。 在该式中，Y和Z分别表示单键或选自NR a的二价连接基团，其中R a是氢原子或C 1 -C 30烷基，氧，硫， 羰基，磺酰基及其任何组合; A和B分别表示取代或未取代的烷基，烯基，炔基，芳基或杂环基; T是-S-R 1，-O-R 2或-NR 3 R 4; R 1，R 2，R 3和R 4分别表示取代或未取代的烷基 烯基，炔基，芳基或杂环基。