公开(公告)号：US07972582B2

公开(公告)日：2011-07-05

申请号：US10482683

申请日：2002-11-29

申请人： Toyoji Shinohara ,  Yoichi Mori ,  Yasuhiko Suzuki ,  Hiroshi Aono ,  Yuji Shirao

发明人： Toyoji Shinohara ,  Yoichi Mori ,  Yasuhiko Suzuki ,  Hiroshi Aono ,  Yuji Shirao

IPC分类号： B01D53/00 ,  B01D53/34 ,  B01D53/68 ,  B01D53/92 ,  B01D53/94

CPC分类号： F23J15/08 ,  B01D53/1456 ,  B01D53/62 ,  B01D53/68 ,  B01D53/70 ,  B01D53/864 ,  B01D53/8659 ,  F23G7/063 ,  F23J15/006 ,  F23J2215/301 ,  F23J2215/40 ,  F23J2219/10 ,  F23J2219/30 ,  F23J2219/40 ,  F23J2219/60 ,  Y02A50/2341

摘要： An apparatus for treating an exhaust gas that includes a pre-treatment section that removes a powdery component, a water-soluble component or a hydrolytic component from the exhaust gas. The exhaust gas contains a fluorine compound and CO. A heating oxidative decomposing section performs heating oxidative decomposition of at least one of the fluorine compound and CO to detoxify the exhaust gas. The apparatus also has a post-treatment section for post-treating an acid gas such as HF which has been produced by the heating oxidative decomposition.

摘要翻译： 一种废气处理装置，其特征在于，包括从废气中除去粉状成分，水溶性成分或水解成分的预处理部。 排气中含有氟化合物和CO，加热氧化分解部进行至少一种氟化合物和CO的加热氧化分解，对废气进行解毒。 该设备还具有用于后处理由加热氧化分解产生的诸如HF的酸性气体的后处理部分。

公开(公告)号：US20050175524A1

公开(公告)日：2005-08-11

申请号：US10517063

申请日：2004-03-30

申请人： Yoichi Mori ,  Toyoji Shinohara ,  Yasuhiko Suzuki

发明人： Yoichi Mori ,  Toyoji Shinohara ,  Yasuhiko Suzuki

IPC分类号： B01D53/68

CPC分类号： B01D53/68 ,  Y02C20/30

摘要： The present invention relates to a method and apparatus for treating an exhaust gas containing a fluorine compound. A method according to the present invention includes heating the exhaust gas in the presence of O2, and then adding H2O to the exhaust gas to decompose or oxidize the fluorine compound. An apparatus according to the present invention includes a heating section (30) for heating the exhaust gas, an exhaust gas supply (11) for supplying the exhaust gas to the heating section (30), an H2O adding section (40) located just downstream of the heating section (30) for adding H2O to the exhaust gas by supplying H2O or H2 to the exhaust gas; and an acid gas removal section (13) for removing an acid gas produced by a reaction between the exhaust gas and H2O.

摘要翻译： 本发明涉及一种处理含氟化合物的废气的方法和装置。 根据本发明的方法包括在O 2存在下加热废气，然后向排气中加入H 2 O 2以分解或氧化氟化合物 。 根据本发明的装置包括：用于加热废气的加热部分（30），用于将排气供应到加热部分（30）的排气供应源（11），H 2 O添加部分（40），其位于加热部分（30）的下游，用于通过提供H 2 O或H 2 O将H 2 O 2添加到排气中 到废气; 和用于除去由废气和H 2 O 2之间的反应产生的酸性气体的酸性气体去除部分（13）。

公开(公告)号：US20050271568A1

公开(公告)日：2005-12-08

申请号：US11202121

申请日：2005-08-12

申请人： Yoichi Mori ,  Takashi Kyotani ,  Toyoji Shinohara

发明人： Yoichi Mori ,  Takashi Kyotani ,  Toyoji Shinohara

IPC分类号： B01D53/34 ,  B01D53/68 ,  B01D53/70 ,  B01D53/86 ,  B01J21/04

CPC分类号： B01D53/70 ,  B01D53/685 ,  B01D53/8659 ,  B01D53/8662 ,  B01D2257/204 ,  B01D2257/2066 ,  Y02C20/30

摘要： An apparatus for treatment of a waste gas, containing fluorine-containing compounds, comprises: a solids treating device for separating solids from the waste gas; an addition device for adding H2 and/or H2O, or H2 and/or H2O and O2, as a decomposition assist gas to the waste gas leaving the solids treating device; a thermal decomposition device that is packed with γ-alumina heated at 600-900° C., and which thermally decomposes the waste gas to which the decomposition assist gas has been added; an acidic gas treating device for removing acidic gases from the thermally decomposed waste gas; and channels or lines for connecting these devices in sequence. The apparatus preferably includes an air ejector which is capable of adjusting an internal pressure of the apparatus.

摘要翻译： 一种用于处理含有氟化合物的废气的设备，包括：用于从废气中分离固体的固体处理装置; 用于加入H 2和/或H 2 O，或H 2 H 2和/或H 2 H 2的加成装置， O和O 2作为离开固体处理装置的废气的分解辅助气体; 热分解装置，其被加热至600-900℃的γ-氧化铝填充，并且将分解辅助气体的废气热分解; 用于从热分解废气中除去酸性气体的酸性气体处理装置; 以及用于连接这些设备的通道或线路。 该装置优选地包括能够调节装置的内部压力的空气喷射器。

公开(公告)号：US06949225B1

公开(公告)日：2005-09-27

申请号：US09714220

申请日：2000-11-17

申请人： Yoichi Mori ,  Takashi Kyotani ,  Toyoji Shinohara

发明人： Yoichi Mori ,  Takashi Kyotani ,  Toyoji Shinohara

IPC分类号： B01D53/34 ,  B01D53/68 ,  B01D53/70 ,  B01D53/86 ,  B01J21/04

CPC分类号： B01D53/70 ,  B01D53/685 ,  B01D53/8659 ,  B01D53/8662 ,  B01D2257/204 ,  B01D2257/2066 ,  Y02C20/30

摘要： An apparatus for treatment of a waste gas, containing fluorine-containing compounds, comprises: a solids treating device for separating solids from the waste gas; an addition device for adding H2 and/or H2O, or H2 and/or H2O and O2, as a decomposition assist gas to the waste gas leaving the solids treating device; a thermal decomposition device that is packed with γ-alumina heated at 600–900° C., and which thermally decomposes the waste gas to which the decomposition assist gas has been added; an acidic gas treating device for removing acidic gases from the thermally decomposed waste gas; and channels or lines for connecting these devices in sequence. The apparatus preferably includes an air ejector which is capable of adjusting an internal pressure of the apparatus.

摘要翻译： 一种用于处理含有氟化合物的废气的设备，包括：用于从废气中分离固体的固体处理装置; 用于加入H 2和/或H 2 O，或H 2 H 2和/或H 2 H 2的加成装置， O和O 2作为离开固体处理装置的废气的分解辅助气体; 热分解装置，其被加热到600-900℃的γ-氧化铝填充，并且使分解辅助气体被加入的废气热分解; 用于从热分解废气中除去酸性气体的酸性气体处理装置; 以及用于连接这些设备的通道或线路。 该装置优选地包括能够调节装置的内部压力的空气喷射器。

公开(公告)号：US09625168B2

公开(公告)日：2017-04-18

申请号：US13813850

申请日：2011-07-25

申请人： Toyoji Shinohara ,  Kohtaro Kawamura ,  Toshiharu Nakazawa

发明人： Toyoji Shinohara ,  Kohtaro Kawamura ,  Toshiharu Nakazawa

IPC分类号： F24F7/00 ,  F04B37/16 ,  B01D53/46 ,  F04B49/10 ,  H01L21/205 ,  F04B51/00 ,  G01M13/00 ,  B01D53/00 ,  F04B37/14 ,  F04B49/06 ,  B01D53/78

CPC分类号： F24F7/00 ,  B01D53/005 ,  B01D53/78 ,  B01D2258/0216 ,  F04B37/14 ,  F04B49/06 ,  F04B2201/1201

摘要： An exhaust system (2) is used for evacuating a chamber of a manufacturing apparatus (1) for manufacturing semiconductor devices, liquid crystal panels, LEDs, or solar cells. The exhaust system (2) includes a vacuum pump apparatus (3) for evacuating the chamber, an exhaust gas treatment apparatus (5) for treating an exhaust gas discharged from the chamber, and a controller (6) for controlling the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5). Information of operation process of the manufacturing apparatus (1), and the kind of gas and the flow rate of the gas supplied to the manufacturing apparatus (1) is inputted into the controller (6) to control the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5).

公开(公告)号：US20130171919A1

公开(公告)日：2013-07-04

申请号：US13813850

申请日：2011-07-25

申请人： Toyoji Shinohara ,  Kohtaro Kawamura ,  Toshiharu Nakazawa

发明人： Toyoji Shinohara ,  Kohtaro Kawamura ,  Toshiharu Nakazawa

IPC分类号： F24F7/00

CPC分类号： F24F7/00 ,  B01D53/005 ,  B01D53/78 ,  B01D2258/0216 ,  F04B37/14 ,  F04B49/06 ,  F04B2201/1201

摘要： An exhaust system (2) is used for evacuating a chamber of a manufacturing apparatus (1) for manufacturing semiconductor devices, liquid crystal panels, LEDs, or solar cells. The exhaust system (2) includes a vacuum pump apparatus (3) for evacuating the chamber, an exhaust gas treatment apparatus (5) for treating an exhaust gas discharged from the chamber, and a controller (6) for controlling the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5). Information of operation process of the manufacturing apparatus (1), and the kind of gas and the flow rate of the gas supplied to the manufacturing apparatus (1) is inputted into the controller (6) to control the vacuum pump apparatus (3) and/or the exhaust gas treatment apparatus (5).

摘要翻译： 排气系统（2）用于对用于制造半导体器件，液晶面板，LED或太阳能电池的制造设备（1）的室进行抽真空。 排气系统（2）包括用于抽空室的真空泵装置（3），用于处理从室排出的废气的废气处理装置（5），以及用于控制真空泵装置的控制器（6） 3）和/或废气处理装置（5）。 制造设备（1）的操作过程信息，以及供应给制造设备（1）的气体的种类和气体的流量被输入到控制器（6）中以控制真空泵设备（3）和 /或废气处理装置（5）。