公开(公告)号：US20240328024A1

公开(公告)日：2024-10-03

申请号：US18193711

申请日：2023-03-31

申请人： Toyota Motor Engineering & Manufacturing North America, Inc. ,  The Board of Trustees of the University of Illinois

发明人： Sujan Dewanjee ,  Gaurav Singhal ,  Nenad Milijkovic ,  Paul Braun ,  Danny Lohan ,  Shailesh Joshi

IPC分类号： C25D5/00 ,  C25D3/38 ,  C25D5/18 ,  C25D7/00 ,  H05K1/18 ,  H05K3/10

CPC分类号： C25D5/623 ,  C25D3/38 ,  C25D5/18 ,  C25D7/00 ,  H05K1/181 ,  H05K3/10

摘要： In one embodiment, a method of fabricating a porous structure includes applying a first electroplating current at first current density for a first period of time, wherein the first electroplating current is a constant current, and applying a second electroplating current at a second current density for a second period of time following the first period of time, wherein the second electroplating current is a pulsed current and the first electroplating current and the second electroplating current grows the porous structure on a surface of the substrate.

公开(公告)号：US20240332124A1

公开(公告)日：2024-10-03

申请号：US18129409

申请日：2023-03-31

申请人： Toyota Motor Engineering & Manufacturing North America, Inc. ,  The Board of Trustees of the University of Illinois

发明人： Sujan Dewanjee ,  Gaurav Singhal ,  Nenad Milijkovic ,  Paul V. Braun ,  Danny Lohan ,  Shailesh Joshi

IPC分类号： H01L23/373 ,  H01L21/311 ,  H01L21/3205

CPC分类号： H01L23/3736 ,  H01L21/31138 ,  H01L21/32051

摘要： Porous structures and processes for generating porous structures are disclosed. In one embodiment, a porous structure includes a target surface, a photoresist material deposited onto the target surface, and a metal electrodeposited onto the target surface and the photoresist material. An electrodeposition of metal generates a metal porous structure and the photoresist material is removed through reactive ion etching, generating at least one microchannel through the metal porous structure.