公开(公告)号：US20220310902A1

公开(公告)日：2022-09-29

申请号：US17242322

申请日：2021-04-28

申请人： UNITED MICROELECTRONICS CORP.

发明人： Hui-Lin Wang ,  Ching-Hua Hsu ,  Si-Han Tsai ,  Shun-Yu Huang ,  Chen-Yi Weng ,  Ju-Chun Fan ,  Che-Wei Chang ,  Yi-Yu Lin ,  Po-Kai Hsu ,  Jing-Yin Jhang ,  Ya-Jyuan Hung

IPC分类号： H01L43/02 ,  H01L27/22 ,  H01L43/08 ,  H01L43/12

摘要： A magnetoresistive random access memory (MRAM) structure, including a substrate and multiple MRAM cells on the substrate, wherein the MRAM cells are arranged in a memory region adjacent to a logic region. An ultra low-k (ULK) layer covers the MRAM cells, wherein the surface portion of ultra low-k layer is doped with fluorine, and dents are formed on the surface of ultra low-k layer at the boundaries between the memory region and the logic region.

公开(公告)号：US20240016063A1

公开(公告)日：2024-01-11

申请号：US17884528

申请日：2022-08-09

申请人： UNITED MICROELECTRONICS CORP.

发明人： Chih-Wei Kuo ,  Chung-Yi Chiu ,  Shun-Yu Huang ,  Yi-Wei Tseng

IPC分类号： H01L43/08 ,  H01L27/22 ,  H01L43/02 ,  H01L43/12

CPC分类号： H01L43/08 ,  H01L27/222 ,  H01L43/02 ,  H01L43/12

摘要： An MRAM structure includes an MTJ, a first SOT element, a conductive layer and a second SOT element disposed from bottom to top. A protective layer is disposed on the second SOT element. The protective layer covers and contacts a top surface of the second SOT element. The protective layer is an insulator. A conductive via penetrates the protective layer and contacts the second SOT element.

公开(公告)号：US20240016062A1

公开(公告)日：2024-01-11

申请号：US17874327

申请日：2022-07-27

申请人： United Microelectronics Corp.

发明人： Shun-Yu Huang ,  Yi-Wei Tseng ,  Chih-Wei Kuo ,  Yi-Xiang Chen ,  Hsuan-Hsu Chen ,  Chun-Lung Chen

IPC分类号： H01L43/12 ,  H01L27/22 ,  H01L43/02

CPC分类号： H01L43/12 ,  H01L27/222 ,  H01L43/02

摘要： A method of fabricating an MTJ device is provided including the following process. A first via is formed in the first dielectric layer. A first electrode layer is formed on the first dielectric layer and the first via. An MTJ stack layer is formed on the first electrode layer. A patterned second electrode layer is formed on the MTJ stack layer and used as a mask. A first ion beam etching process is performed to etch the patterned second electrode layer and pattern the MTJ stack layer and the first electrode layer to form a second electrode, an MTJ stack structure, and a first electrode. A first protective layer is formed to cover the second electrode and the MTJ stack structure. A second ion beam etching process is performed to remove a portion of the MTJ stack structure and a portion of the first electrode.

公开(公告)号：US11917923B2

公开(公告)日：2024-02-27

申请号：US17242322

申请日：2021-04-28

申请人： UNITED MICROELECTRONICS CORP.

发明人： Hui-Lin Wang ,  Ching-Hua Hsu ,  Si-Han Tsai ,  Shun-Yu Huang ,  Chen-Yi Weng ,  Ju-Chun Fan ,  Che-Wei Chang ,  Yi-Yu Lin ,  Po-Kai Hsu ,  Jing-Yin Jhang ,  Ya-Jyuan Hung

IPC分类号： H10N50/80 ,  H10B61/00 ,  H10N50/01 ,  H10N50/10 ,  H01L27/22 ,  H01L43/12

CPC分类号： H10N50/80 ,  H10B61/00 ,  H10N50/01 ,  H10N50/10

摘要： A magnetoresistive random access memory (MRAM) structure, including a substrate and multiple MRAM cells on the substrate, wherein the MRAM cells are arranged in a memory region adjacent to a logic region. An ultra low-k (ULK) layer covers the MRAM cells, wherein the surface portion of ultra low-k layer is doped with fluorine, and dents are formed on the surface of ultra low-k layer at the boundaries between the memory region and the logic region.