公开(公告)号：US09007571B2

公开(公告)日：2015-04-14

申请号：US13971776

申请日：2013-08-20

Applicant: United Microelectronics Corp.

Inventor： Wei-Jhe Tzai ,  Kuei-Chun Hung ,  Chun-Chi Yu ,  Chien-Hao Chen ,  Chia-Ching Lin

IPC: G01N21/00 ,  G03F9/00

CPC classification number: G03F7/70633

Abstract: A measurement method of an overlay mark is provided. An overlay mark on a wafer is measured with a plurality of different wavelength regions of an optical measurement tool, so as to obtain a plurality of overlay values corresponding to the wavelength regions. The overlay mark on the wafer is measured with an electrical measurement tool to obtain a reference overlay value. The wavelength region that corresponds to the overlay value closest to the reference overlay value is determined as a correct wavelength region for the overlay mark.

Abstract translation: 提供重叠标记的测量方法。 用光学测量工具的多个不同波长区域测量晶片上的覆盖标记，以便获得对应于波长区域的多个覆盖值。 用电测量工具测量晶片上的覆盖标记以获得参考覆盖值。 对应于最接近参考叠加值的覆盖值的波长区域被确定为覆盖标记的正确波长区域。

公开(公告)号：US20150055125A1

公开(公告)日：2015-02-26

申请号：US13971776

申请日：2013-08-20

Applicant: United Microelectronics Corp.

Inventor： Wei-Jhe Tzai ,  Kuei-Chun Hung ,  Chun-Chi Yu ,  Chien-Hao Chen ,  Chia-Ching Lin

IPC: G03F9/00

CPC classification number: G03F7/70633

Abstract: A measurement method of an overlay mark is provided. An overlay mark on a wafer is measured with a plurality of different wavelength regions of an optical measurement tool, so as to obtain a plurality of overlay values corresponding to the wavelength regions. The overlay mark on the wafer is measured with an electrical measurement tool to obtain a reference overlay value. The wavelength region that corresponds to the overlay value closest to the reference overlay value is determined as a correct wavelength region for the overlay mark.

Abstract translation: 提供重叠标记的测量方法。 用光学测量工具的多个不同波长区域测量晶片上的覆盖标记，以便获得对应于波长区域的多个覆盖值。 用电测量工具测量晶片上的覆盖标记以获得参考覆盖值。 对应于最接近参考叠加值的覆盖值的波长区域被确定为覆盖标记的正确波长区域。