Doped graphene
    1.
    发明授权

    公开(公告)号:US10053772B2

    公开(公告)日:2018-08-21

    申请号:US15026437

    申请日:2014-09-26

    摘要: Methods of producing a uniformly or substantially uniformly doped relatively large area multi-layered graphene element are described comprising the steps of placing the graphene element and a dopant under low pressure conditions, and holding the graphene element and dopant at an elevated temperature for a period of time while under the low pressure conditions. In one arrangement, openings are formed in a multi-layered graphene element of relatively large area prior to doping. In another arrangement, a relatively large area multi-layered graphene element formed by an epitaxial growth technique is used. The invention also relates to an element produced using the aforementioned techniques.

    DOPED GRAPHENE
    3.
    发明申请
    DOPED GRAPHENE 审中-公开

    公开(公告)号:US20160230273A1

    公开(公告)日:2016-08-11

    申请号:US15026437

    申请日:2014-09-26

    IPC分类号: C23C16/26 H01B1/04

    摘要: Methods of producing a uniformly or substantially uniformly doped relatively large area multi-layered graphene element are described comprising the steps of placing the graphene element and a dopant under low pressure conditions, and holding the graphene element and dopant at an elevated temperature for a period of time whilst under the low pressure conditions. In one arrangement, openings are formed in a multi-layered graphene element of relatively large area prior to doping. In another arrangement, a relatively large area multi-layered graphene element formed by an epitaxial growth technique is used. The invention also relates to an element produced using the aforementioned techniques.

    摘要翻译: 描述了生产均匀或基本均匀掺杂的相对较大面积的多层石墨烯元件的方法,包括以下步骤:在低压条件下放置石墨烯元件和掺杂剂,并将石墨烯元素和掺杂剂保持在高温下一段时间 时间在低压条件下。 在一种布置中,在掺杂之前,在相对较大面积的多层石墨烯元件中形成开口。 在另一种布置中,使用通过外延生长技术形成的相对大面积的多层石墨烯元件。 本发明还涉及使用上述技术制造的元件。