CENTRAL SOURCE DELIVERY FOR CHEMICAL VAPOR DEPOSITION SYSTEMS

    公开(公告)号:US20170362701A1

    公开(公告)日:2017-12-21

    申请号:US15613422

    申请日:2017-06-05

    CPC classification number: C23C16/448 C23C16/45561

    Abstract: According to embodiments, systems and methods are described herein that facilitate use of a Chemical Vapor Deposition (CVD) system continuously. The systems and methods shown herein include multiple precursor gas sources, and structures for independently connecting or disconnecting those sources for replacement. Furthermore, by providing user inputs for diluting the outputs of these multiple precursor gas sources, mixtures of precursor gas in carrier gas can be generated that have sufficiently low concentrations to be routed to a remove CVD system even at relatively low temperatures. Therefore, in embodiments many precursor gas sources, located remotely from the CVD chamber, can be independently operated and replaced as needed without interrupting a supply of precursor gas to the CVD chamber.

    APPARATUS AND METHOD FOR IMPROVED ACOUSTICAL TRANSFORMATION
    3.
    发明申请
    APPARATUS AND METHOD FOR IMPROVED ACOUSTICAL TRANSFORMATION 有权
    改进的声学转换的装置和方法

    公开(公告)号:US20140060153A1

    公开(公告)日:2014-03-06

    申请号:US13705650

    申请日:2012-12-05

    Abstract: An acoustical transformer having a last matching section that includes a protective barrier of low permeability. The protective barrier is in contact with a test medium. In one embodiment, the protective barrier comprises one or more low permeability layers, such as a metallic foil or metallic coating(s) disposed on a low impedance layer such as polyimide, so that the low impedance layer and the protective barrier constitute the last matching section of the acoustical transformer. In other embodiments, the protective barrier comprises a fluoropolymer. A method for determining the thicknesses of the various layers of the acoustical transformer for enhanced performance is also disclosed.

    Abstract translation: 一种具有最后匹配部分的声变压器,其包括低渗透性的保护屏障。 保护屏障与测试介质接触。 在一个实施例中,保护屏障包括一个或多个低渗透性层,例如设置在诸如聚酰亚胺的低阻抗层上的金属箔或金属涂层,使得低阻抗层和保护屏障构成最后匹配 声变压器部分。 在其它实施方案中,保护屏障包含含氟聚合物。 还公开了一种用于确定用于增强性能的声变换器的各个层的厚度的方法。

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