公开(公告)号：US20170362701A1

公开(公告)日：2017-12-21

申请号：US15613422

申请日：2017-06-05

Applicant: Veeco Instruments Inc.

Inventor： Raymond C. Logue ,  Don N. Sirota ,  Karthik Karkala ,  Arindam Sinharoy

IPC: C23C16/448 ,  C23C16/455 ,  C23C14/56

CPC classification number: C23C16/448 ,  C23C16/45561

Abstract: According to embodiments, systems and methods are described herein that facilitate use of a Chemical Vapor Deposition (CVD) system continuously. The systems and methods shown herein include multiple precursor gas sources, and structures for independently connecting or disconnecting those sources for replacement. Furthermore, by providing user inputs for diluting the outputs of these multiple precursor gas sources, mixtures of precursor gas in carrier gas can be generated that have sufficiently low concentrations to be routed to a remove CVD system even at relatively low temperatures. Therefore, in embodiments many precursor gas sources, located remotely from the CVD chamber, can be independently operated and replaced as needed without interrupting a supply of precursor gas to the CVD chamber.

公开(公告)号：US10099185B2

公开(公告)日：2018-10-16

申请号：US14822410

申请日：2015-08-10

Applicant: Veeco Instruments Inc.

Inventor： Ray Logue ,  Don Sirota ,  Karthik Karkala ,  Eric Armour ,  Christopher A. Morath ,  Arindam Sinharoy

IPC: G01N29/024 ,  B01F5/06 ,  G01N29/22 ,  G01N29/44 ,  G05D11/13

Abstract: Mass-transfer rate control arrangement and method in which a process precursor mixture is produced containing carrier gas and a process precursor gas. A quantity of the process precursor present in the process precursor mixture is acoustically sensed to produce a sensor output. A dilution gas is provided and the process precursor mixture and the dilution gas are separately conveyed to a dilution point, at which a diluted mixture of the dilution gas and the process precursor mixture is achieved. A relative flow rate of the carrier gas and the dilution gas is automatically controlled in response to the sensor output such that the diluted mixture at the dilution point has a prescribed mass transfer rate of the precursor gas.

公开(公告)号：US20160041126A1

公开(公告)日：2016-02-11

申请号：US14822410

申请日：2015-08-10

Applicant: Veeco Instruments, Inc.

Inventor： Ray Logue ,  Don Sirota ,  Karthik Karkala ,  Eric Armour ,  Christopher A. Morath ,  Arindam Sinharoy

IPC: G01N29/02 ,  B01F5/06 ,  B01F3/02

CPC classification number: B01F5/0602 ,  G01N29/024 ,  G01N29/222 ,  G01N29/4436 ,  G01N2291/021 ,  G01N2291/02809 ,  G01N2291/102 ,  G05D11/138

Abstract: Mass-transfer rate control arrangement and method in which a process precursor mixture is produced containing carrier gas and a process precursor gas. A quantity of the process precursor present in the process precursor mixture is acoustically sensed to produce a sensor output. A dilution gas is provided and the process precursor mixture and the dilution gas are separately conveyed to a diution point, at which a diluted mixture of the dilution gas and the process precursor mixture is achieved. A relative flow rate of the carrier gas and the dilution gas is automatically controlled in response to the sensor output such that the diluted mixture at the dilution point has a prescribed mass transfer rate of the precursor gas.

Abstract translation: 质量传递速率控制装置和其中制备含有载气和工艺前体气体的工艺前体混合物的方法。 在工艺前体混合物中存在的一定数量的工艺前体被声学地感测以产生传感器输出。 提供稀释气体，并且将过程前体混合物和稀释气体分别输送到稀释气体和过程前体混合物的稀释混合物的分注点。 响应于传感器输出自动控制载气和稀释气体的相对流速，使得稀释点处的稀释混合物具有规定的前体气体的传质速率。