公开(公告)号：US20240247090A1

公开(公告)日：2024-07-25

申请号：US18558788

申请日：2022-05-16

申请人： Versum Materials US, LLC

发明人： Gregor Larbig ,  PEER KIRSCH ,  MATTHIAS STENDER ,  XIAOBO SHI

IPC分类号： C08F226/06 ,  C08F212/14 ,  C08F220/34 ,  C08F220/56 ,  C08F220/58 ,  C09G1/02 ,  H01L21/321

CPC分类号： C08F226/06 ,  C08F212/26 ,  C08F220/34 ,  C08F220/56 ,  C08F220/58 ,  C09G1/02 ,  H01L21/3212

摘要： Synthesis of imidazolium-based poly(ionic liquid)s is disclosed. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive comprising imidazolium-based poly(ionic liquid); and water. The use of the synthesized imidazolium-based poly(ionic liquid)s in the CMP slurries reduces dishing and erosion in highly selective tungsten slurries.

公开(公告)号：US20240261931A1

公开(公告)日：2024-08-08

申请号：US18564117

申请日：2022-06-03

申请人： Versum Materials US, LLC

发明人： GREGOR LARBIG ,  INBAL DAVIDI ,  MATTHIAS STENDER ,  XIAOBO SHI

IPC分类号： B24B37/04 ,  C08F30/02 ,  C08G79/06 ,  C09G1/02 ,  H01L21/321

CPC分类号： B24B37/04 ,  C08F30/02 ,  C08G79/06 ,  C09G1/02 ,  H01L21/3212

摘要： Synthesis of phosphonium based polymers is disclosed. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive comprising phosphonium based polymers; and water. The use of the synthesized phosphonium based polymers in the CMP slurries reduces dishing and erosion in highly selective tungsten slurries.