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公开(公告)号:US09771651B2
公开(公告)日:2017-09-26
申请号:US15032227
申请日:2014-10-17
申请人: Wacker Chemie AG
发明人: Hanns Wochner
IPC分类号: C23C16/24 , C01B33/03 , C23C16/442 , C01B33/027 , C01B33/035 , F24F3/16
CPC分类号: C23C16/442 , C01B33/027 , C01B33/03 , C01B33/035 , F24F3/161
摘要: Polycrystalline silicon with low contamination by impurities, especially boron and phosphorus, is manufactured by the Siemens process or by the fluidized bed process, in which deposition of polycrystalline silicon takes place in a reactor maintained within a clean room of the 1 to 100,000 class, and air entering the facility enclosing the reactors is filtered by a multiple stage filtration system wherein coarse and fine filter elements contain less than 0.1% by weight of boron and phosphorus and less than 0.01% by weight of arsenic and aluminum. Following production of the polycrystalline silicon, the polycrystalline silicon may be further treated by steps such as comminution, classifying, wet-chemical treatment, and packing, all these further steps also preferably taking place within a clean room of the 1 to 100,000 class.
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公开(公告)号:US09725212B2
公开(公告)日:2017-08-08
申请号:US14072277
申请日:2013-11-05
申请人: Wacker Chemie AG
发明人: Hanns Wochner
IPC分类号: B65B3/04 , B65B3/28 , B65D33/00 , B29C65/38 , B29C65/00 , B65D75/38 , B65D75/52 , B65D81/00 , B29C65/22 , B29C65/74
CPC分类号: B65D33/00 , B29C65/222 , B29C65/38 , B29C65/7433 , B29C66/1122 , B29C66/43121 , B29C66/71 , B29C66/723 , B29C66/8122 , B29C66/9241 , B29C66/929 , B65B3/04 , B65D75/38 , B65D75/52 , B65D81/00 , B29K2827/18 , B29K2023/0633 , B29K2023/0625 , B29K2023/065 , B29K2023/06
摘要: A bag contains polysilicon, has been welded and includes at least one weld seam and a polyethylene film having: a thickness of 150-900 μm; a stiffness at a flexural modulus Fmax of 300-2000 mN and Ft of 100-1300 mN; a fracture force F determined by dynamic penetration testing of 200-1500 N; a fracture energy Ws of 2-30 J; a penetration energy Wtot of 2.2-30 J; a film tensile stress at 15% longitudinal and transverse elongation of 9-50 MPa; an Elmendorf longitudinal film tear resistance of 10-60 cN; an Elmendorf transverse film tear resistance of 18-60 cN; a longitudinal film elongation at break of 300-2000%; a transverse film elongation at break of 450-3000%; and a weld seam strength of 25-150 N/15 mm. A method includes filling a bag with polysilicon, and welding by pulse sealing with contact pressure greater than 0.01 N/mm2 to obtain a 25-150 N/15 mm weld seam strength.
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公开(公告)号:US09421584B2
公开(公告)日:2016-08-23
申请号:US14535975
申请日:2014-11-07
申请人: Wacker Chemie AG
IPC分类号: C01B33/037 , B08B3/08 , C01B33/00 , H01L21/67
CPC分类号: B08B3/08 , C01B33/00 , C01B33/037 , H01L21/67057
摘要: Polysilicon fragments are purified to remove metal contaminates by contacting the fragments with a purifying liquid at a flow rate >100 mm/sec. Effective removal without abrasion is accomplished.
摘要翻译: 通过使碎片与纯化液体以> 100mm /秒的流速接触来纯化多晶硅碎片以除去金属污染物。 实现无磨损的有效去除。
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公开(公告)号:US09266741B2
公开(公告)日:2016-02-23
申请号:US13952050
申请日:2013-07-26
申请人: Wacker Chemie AG
发明人: Hanns Wochner , Laszlo Fabry
IPC分类号: C01B33/00 , C01B33/037 , C22C29/08 , B02C19/00 , B02C4/30 , C30B29/06 , C01B33/02 , C22C38/00 , C30B35/00
CPC分类号: C01B33/037 , B02C4/305 , B02C19/0056 , C01B33/02 , C22C29/08 , C22C38/00 , C30B29/06 , C30B35/007 , Y10T428/2982
摘要: The present invention relates to polycrystalline silicon chunks which are cubic and have a metal content of less than 200 pptw and a dopant content of less than 50 ppta. Methods for producing polycrystalline silicon chunks, include the steps of providing a polycrystalline silicon rod, comminuting the polycrystalline silicon rod into cubic chunks, and cleaning the polycrystalline silicon chunks, wherein comminution takes place using a spiked-roll crusher having at least one spiked roll, the spiked roll including W2C phases or WC phases with 0.1-10% of a metal carbide selected from the group consisting of titanium carbide, chromium carbide, molybdenum carbide, vanadium carbide, and nickel carbide or consisting of steel with 1-25% W.
摘要翻译: 本发明涉及立方体并且金属含量小于200pptw并且掺杂剂含量小于50ppta的多晶硅块。 制造多晶硅块的方法包括以下步骤:提供多晶硅棒,将多晶硅棒粉碎成立方体块,以及清洗多晶硅块,其中使用具有至少一个加标辊的加标辊式破碎机进行粉碎, 所述加标辊包括W2C相或WC相,其中0.1-10%的选自碳化钛,碳化铬,碳化钼,碳化钒和碳化镍的金属碳化物或由1-25%W的钢组成。
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公开(公告)号:US09073756B2
公开(公告)日:2015-07-07
申请号:US13710859
申请日:2012-12-11
申请人: Wacker Chemie AG
发明人: Hanns Wochner , Andreas Killinger , Reiner Pech
IPC分类号: C01B33/02 , C01B33/021 , C01B33/035 , C01B33/037
CPC分类号: C01B33/02 , C01B33/021 , C01B33/035 , C01B33/037
摘要: The invention provides a polycrystalline silicon chunk having a concentration of 1-50 ppta of boron and 1-50 ppta of phosphorus at the surface.
摘要翻译: 本发明提供一种在表面具有1-50ppta硼和1-50ppta磷的多晶硅块。
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