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1.发明申请Scanning Electron Microscope and a Method for Imaging a Specimen Using the Same 有权扫描电子显微镜和使用其的成像样品的方法公开(公告)号：US20120181426A1
公开(公告)日：2012-07-19
申请号：US13432176
申请日：2012-03-28
IPC分类号： G01N23/00
CPC分类号： G01N23/20 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/1536 , H01J2237/216 , H01J2237/2817
摘要： (1) part or all of the number, coordinates and size/shape and imaging sequence of imaging points each for observation, the imaging position change method and imaging conditions can be calculated automatically from CAD data, (2) a combination of input information and output information for imaging recipe creation can be set arbitrarily, and (3) decision is made of imaging or processing at an arbitrary imaging point as to whether to be successful/unsuccessful and in case a failure is determined, a relief process can be conducted in which the imaging point or imaging sequence is changed.
摘要翻译： （1）可以从CAD数据自动计算成像点的数量，坐标，成像顺序，成像位置的各部分，成像顺序，成像位置变化方法和成像条件，（2）输入信息和 用于成像配方创建的输出信息可以任意设定，并且（3）决定是否成功/成功的任意成像点的成像或处理，并且在确定失败的情况下，可以进行解除处理 成像点或成像序列改变。
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公开(公告)号：US07559047B2
公开(公告)日：2009-07-07
申请号：US11342694
申请日：2006-01-31
CPC分类号： G03F7/70625
摘要： In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.
摘要翻译： 在使用扫描电子显微镜创建半导体图案的SEM观察的成像配方的成像配方制作装置中，为了从观察图像测量布线宽度和图案的其他各种尺寸值的成像配方，从而 通过使用通过从CAD数据转换获得的CAD图像的分析，在最小时间内自动生成图案的形状，通过将CAD数据转换为图像格式来创建CAD图像的CAD图像创建单元， 量化宽度确定部分，亮度信息提供部分和图案形状变形处理部分; 使用由CAD图像创建单元创建的CAD图像来创建成像配方。
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3.发明申请公开(公告)号：US20070120056A1
公开(公告)日：2007-05-31
申请号：US11599343
申请日：2006-11-15
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , B82Y10/00 , B82Y40/00 , G03F7/70525 , G03F7/70625 , G06T7/0006 , G06T2207/30148 , H01J37/222 , H01J37/265 , H01J37/3174 , H01J2237/216 , H01J2237/24578 , H01J2237/2487 , H01J2237/2817
摘要： The present invention provides a semiconductor pattern shape evaluating apparatus using a critical dimension SEM, which eliminates the necessity of data conversion corresponding to each process of semiconductor manufacturing conventionally required; controls possessed data integratedly; can select data effective for use in each process from the possessed data easily; if the shape of formed pattern changes with time, can create a photographing recipe which enables stable measurement by correcting the photographing recipe based on time-series data. Specifically, the semiconductor pattern shape evaluating apparatus correlates coordinate systems among diversified data to control the diversified data stored in a database integratedly, selects part or all of the diversified data arbitrarily and creates a photographing recipe for observing a semiconductor pattern with a critical dimension SEM using selected data.
摘要翻译： 本发明提供一种使用临界尺寸SEM的半导体图案形状评估装置，其消除了对应于常规所需的半导体制造的每个处理的数据转换的必要性; 控制统计数据; 可以轻松地从拥有的数据中选择有效用于每个进程的数据; 如果形成的图案的形状随着时间而变化，则可以创建通过基于时间序列数据校正摄影配方而能够进行稳定测量的拍摄配方。 具体地，半导体图案形状评估装置将多个数据中的坐标系统相互关联，以一体化地存储在数据库中控制多样化数据，任意地选择部分或全部多样化数据，并使用临界尺寸SEM创建用于观察半导体图案的拍摄配方 选择的数据。
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4.发明授权公开(公告)号：US07615746B2
公开(公告)日：2009-11-10
申请号：US11599343
申请日：2006-11-15
CPC分类号： H01J37/28 , B82Y10/00 , B82Y40/00 , G03F7/70525 , G03F7/70625 , G06T7/0006 , G06T2207/30148 , H01J37/222 , H01J37/265 , H01J37/3174 , H01J2237/216 , H01J2237/24578 , H01J2237/2487 , H01J2237/2817
摘要： The present invention provides a semiconductor pattern shape evaluating apparatus using a critical dimension SEM, which eliminates the necessity of data conversion corresponding to each process of semiconductor manufacturing conventionally required; controls possessed data integratedly; can select data effective for use in each process from the possessed data easily; if the shape of formed pattern changes with time, can create a photographing recipe which enables stable measurement by correcting the photographing recipe based on time-series data. Specifically, the semiconductor pattern shape evaluating apparatus correlates coordinate systems among diversified data to control the diversified data stored in a database integratedly, selects part or all of the diversified data arbitrarily and creates a photographing recipe for observing a semiconductor pattern with a critical dimension SEM using selected data.
摘要翻译： 本发明提供一种使用临界尺寸SEM的半导体图案形状评估装置，其消除了对应于常规所需的半导体制造的每个处理的数据转换的必要性; 控制统计数据; 可以轻松地从拥有的数据中选择有效用于每个进程的数据; 如果形成的图案的形状随着时间而变化，则可以创建通过基于时间序列数据校正摄影配方而能够进行稳定测量的拍摄配方。 具体地，半导体图案形状评估装置将多个数据中的坐标系统相互关联，以一体化地存储在数据库中控制多样化数据，任意地选择部分或全部多样化数据，并使用临界尺寸SEM创建用于观察半导体图案的拍摄配方 选择的数据。
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5.发明申请Method and apparatus for arranging recipe of scanning electron microscope and apparatus for evaluating shape of semiconductor device pattern 失效用于布置扫描电子显微镜配方的方法和装置以及用于评估半导体器件图案形状的装置公开(公告)号：US20060284081A1
公开(公告)日：2006-12-21
申请号：US11330215
申请日：2006-01-12
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/153 , H01J37/21 , H01J2237/1532 , H01J2237/216 , H01J2237/24592 , H01J2237/2487 , H01J2237/2816 , H01J2237/2817
摘要： In order to provide an imaging-recipe arranging or creating apparatus and method adapted so that selection rules for automatic arrangement of an imaging recipe can be optimized by teaching in a SEM apparatus or the like, the imaging-recipe arranging or creating apparatus in this invention that arranges an imaging recipe for SEM-observing a semiconductor pattern using a scanning electron microscope includes a database that receives and stores layout information of the above semiconductor pattern in a low-magnification field, and an imaging-recipe arranging unit which, on the basis of the database-stored semiconductor pattern layout information, arranges the imaging recipe automatically in accordance with the automatic arrangement algorithm that includes teaching-optimized selection rules for selecting an imaging point(s).
摘要翻译： 为了提供一种成像配方布置或创建装置和方法，适于使得通过在SEM装置等中的教导来优化成像配方的自动布置的选择规则，本发明的成像配方布置或创建装置 使用扫描型电子显微镜配置SEM观察半导体图案的成像配方，包括：数据库，其接收并存储在低倍率场中的上述半导体图案的布局信息;以及成像配方配置单元，其基于 数据库存储的半导体图案布局信息，根据包括用于选择成像点的教学优化选择规则的自动布置算法自动布置成像配方。
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6.发明申请Method and apparatus for measuring dimension of a pattern formed on a semiconductor wafer 有权用于测量形成在半导体晶片上的图案的尺寸的方法和装置公开(公告)号：US20060288325A1
公开(公告)日：2006-12-21
申请号：US11342694
申请日：2006-01-31
IPC分类号： G06F17/50
CPC分类号： G03F7/70625
摘要： In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.
摘要翻译： 在使用扫描电子显微镜创建半导体图案的SEM观察的成像配方的成像配方制作装置中，为了从观察图像测量布线宽度和图案的其他各种尺寸值的成像配方，从而 通过使用通过从CAD数据转换获得的CAD图像的分析，在最小时间内自动生成图案的形状，通过将CAD数据转换为图像格式来创建CAD图像的CAD图像创建单元， 量化宽度确定部分，亮度信息提供部分和图案形状变形处理部分; 使用由CAD图像创建单元创建的CAD图像来创建成像配方。
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公开(公告)号：USRE45224E1
公开(公告)日：2014-10-28
申请号：US12621307
申请日：2009-11-18
CPC分类号： G03F7/70625
摘要： In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.
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公开(公告)号：USRE45204E1
公开(公告)日：2014-10-21
申请号：US12614358
申请日：2009-11-06
IPC分类号： G06F17/50
CPC分类号： G03F7/70625
摘要： In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.
摘要翻译： 在使用扫描电子显微镜创建半导体图案的SEM观察的成像配方的成像配方制作装置中，为了从观察图像测量布线宽度和图案的其他各种尺寸值的成像配方，从而 通过使用通过从CAD数据转换获得的CAD图像的分析，在最小时间内自动生成图案的形状，通过将CAD数据转换为图像格式来创建CAD图像的CAD图像创建单元， 量化宽度确定部分，亮度信息提供部分和图案形状变形处理部分; 使用由CAD图像创建单元创建的CAD图像来创建成像配方。
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9.发明申请SCANNING ELECTRON MICROSCOPE AND A METHOD FOR IMAGING A SPECIMEN USING THE SAME 有权扫描电子显微镜和使用其形成样品的方法公开(公告)号：US20070210252A1
公开(公告)日：2007-09-13
申请号：US11673219
申请日：2007-02-09
IPC分类号： G21K7/00
CPC分类号： G01N23/20 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/1536 , H01J2237/216 , H01J2237/2817
摘要： (1) part or all of the number, coordinates and size/shape and imaging sequence of imaging points each for observation, the imaging position change method and imaging conditions can be calculated automatically from CAD data, (2) a combination of input information and output information for imaging recipe creation can be set arbitrarily, and (3) decision is made of imaging or processing at an arbitrary imaging point as to whether to be successful/unsuccessful and in case a failure is determined, a relief process can be conducted in which the imaging point or imaging sequence is changed.
摘要翻译： （1）可以从CAD数据自动计算成像点的数量，坐标，成像顺序，成像位置的各部分，成像顺序，成像位置变化方法和成像条件，（2）输入信息和 用于成像配方创建的输出信息可以任意设定，并且（3）决定是否成功/成功的任意成像点的成像或处理，并且在确定失败的情况下，可以进行解除处理 成像点或成像序列改变。
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10.发明授权Scanning electron microscope and a method for imaging a specimen using the same 有权扫描电子显微镜和使用其的成像成像方法公开(公告)号：US08642957B2
公开(公告)日：2014-02-04
申请号：US13432176
申请日：2012-03-28
IPC分类号： G01N23/00
CPC分类号： G01N23/20 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/1536 , H01J2237/216 , H01J2237/2817
摘要： (1) part or all of the number, coordinates and size/shape and imaging sequence of imaging points each for observation, the imaging position change method and imaging conditions can be calculated automatically from CAD data, (2) a combination of input information and output information for imaging recipe creation can be set arbitrarily, and (3) decision is made of imaging or processing at an arbitrary imaging point as to whether to be successful/unsuccessful and in case a failure is determined, a relief process can be conducted in which the imaging point or imaging sequence is changed.
摘要翻译： （1）可以从CAD数据自动计算成像点的数量，坐标，成像顺序，成像位置的各部分，成像顺序，成像位置变化方法和成像条件，（2）输入信息和 用于成像配方创建的输出信息可以任意设定，并且（3）决定是否成功/成功的任意成像点的成像或处理，并且在确定失败的情况下，可以进行解除处理 成像点或成像序列改变。
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