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1.发明申请APPARATUS FOR MEASURING FEATURE WIDTHS ON MASKS FOR THE SEMICONDUCTOR INDUSTRY 有权用于测量半导体工业屏蔽特征宽度的装置公开(公告)号：US20050084770A1
公开(公告)日：2005-04-21
申请号：US10711424
申请日：2004-09-17
CPC分类号： G01B11/14 , G01B11/028 , G02B21/33
摘要： An apparatus for measuring feature widths on masks 1 for the semiconductor industry is disclosed. The apparatus encompasses a carrier plate 16 that is retained in vibrationally decoupled fashion in a base frame 14; a scanning stage 18, arranged on the carrier plate 16, that carries a mask 1 to be measured, the mask 1 defining a surface 4; and an objective 2 arranged opposite the mask 1. A liquid 25 is provided between the objective 2 and the surface 4 of the mask 1.
摘要翻译： 公开了一种用于测量半导体工业的掩模1上的特征宽度的装置。 该装置包括在基架14中以振动解耦方式保持的承载板16; 布置在承载板16上的扫描台18，其承载待测量的掩模1，掩模1限定表面4; 以及与掩模1相对布置的物镜2。 液体25设置在物镜2和掩模1的表面4之间。
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2.发明授权Apparatus for measuring feature widths on masks for the semiconductor industry 有权用于半导体工业的掩模测量特征宽度的装置公开(公告)号：US07375792B2
公开(公告)日：2008-05-20
申请号：US10711424
申请日：2004-09-17
IPC分类号： G03B27/42
CPC分类号： G01B11/14 , G01B11/028 , G02B21/33
摘要： An apparatus for measuring feature widths on masks 1 for the semiconductor industry is disclosed. The apparatus encompasses a carrier plate 16 that is retained in vibrationally decoupled fashion in a base frame 14; a scanning stage 18, arranged on the carrier plate 16, that carries a mask 1 to be measured, the mask 1 defining a surface 4; and an objective 2 arranged opposite the mask 1. A liquid 25 is provided between the objective 2 and the surface 4 of the mask 1.
摘要翻译： 公开了一种用于测量半导体工业的掩模1上的特征宽度的装置。 该装置包括在基架14中以振动解耦方式保持的承载板16; 布置在承载板16上的扫描台18，其承载待测量的掩模1，掩模1限定表面4; 以及与掩模1相对布置的物镜2。 液体25设置在物镜2和掩模1的表面4之间。
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公开(公告)号：US20080259327A1
公开(公告)日：2008-10-23
申请号：US11569172
申请日：2005-07-05
IPC分类号： G01N21/956 , G02B21/26
CPC分类号： G03F7/70341 , G02B21/33
摘要： A device 1 is disclosed for inspecting, measuring defined structures, simulating structures and structural defects, repair of and to structures, and post-inspecting defined object sites on a microscopic component 2 with an immersion objective 8a. The device 1 comprises a stage that is movable in the x-coordinate direction and in the y-coordinate direction and a holder 42 for the microscopic component 2, whereby the holder 42 is placed on the stage 4 with the microscopic component 2 in it. The holder 42 has a reservoir 51a with immersion or cleaning fluid, respectively. The stage 4 is movable such that the immersion objective 8a is located directly above the reservoir 51a and may dip into the fluid with its front-most lens.
摘要翻译： 公开了一种用于通过浸没物镜8a检查，测量限定结构，模拟结构和结构缺陷，修复和结构以及在微观组件2上对定义的物体位置进行后检查的装置1。 装置1包括在x坐标方向和y坐标方向上可移动的台架和用于微型部件2的保持器42，由此保持器42放置在台架4上，其中具有微观部件2。 保持器42具有分别具有浸没或清洁流体的储存器51a。 舞台4是可移动的，使得浸没物体8a位于储存器51a的正上方，并且可以用其最前面的透镜浸入流体中。
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4.发明申请DEVICE FOR INSPECTING A MICROSCOPIC COMPONENT BY MEANS OF AN IMMERSION OBJECTIVE 审中-公开用于通过注入目标检查微观组件的装置公开(公告)号：US20070206279A1
公开(公告)日：2007-09-06
申请号：US11569180
申请日：2005-07-05
IPC分类号： G02B21/26
CPC分类号： G02B21/0016
摘要： A device (1) is disclosed for inspecting, measuring defined structures, simulating structures and structural defects, repair of and to structures, and post-inspecting defined object sites on a microscopic component (2) with an immersion objective (8a). The device (1) comprises a stage that is movable in the x-coordinate direction and in the y-coordinate direction and a holder (42) for the microscopic component (2), whereby the holder (42) is placed on the stage (4) with the microscopic component (2) in it. The holder (42) has a reservoir (51a) with immersion or cleaning fluid, respectively. The stage (4) is movable such that the immersion objective (8a) is located directly above the reservoir (51a) and may dip into the fluid with its front-most lens.
摘要翻译： 公开了一种用于检测，测量定义的结构，模拟结构和结构缺陷，对结构进行修复和对具有浸没物镜（8a））的微观部件（2）上的定义的物体位置进行后检查的设备（1）。 装置（1）包括能够在x坐标方向和y坐标方向上移动的台架和用于微型部件（2）的支架（42），由此将支架（42）放置在台架 4）与其中的微观组分（2）。 保持器（42）具有分别具有浸没或清洁流体的储存器（51a）。 工作台（4）是可移动的，使得浸没物镜（8a）位于储存器（51a）的正上方，并且可以用其最前面的透镜浸入流体中。
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