Method for dispersing plant sterol for beverage and a plant sterol-dispersed beverage, of which particle size is nanometer-scale in dispersed beverage
    1.
    发明授权
    Method for dispersing plant sterol for beverage and a plant sterol-dispersed beverage, of which particle size is nanometer-scale in dispersed beverage 失效
    分散饮料用植物甾醇和分散饮料中粒径为纳米级的植物甾醇分散饮料的方法

    公开(公告)号:US07994157B2

    公开(公告)日:2011-08-09

    申请号:US10398001

    申请日:2001-09-28

    摘要: Disclosed are a method for dispersing plant sterol for beverage and a plant sterol-dispersed beverage, of which particle size is nanometer-scale in dispersed beverage. The dispersion of plant sterols starts with the admixing of plant sterol to at least one emulsifier selected from the group consisting of sucrose fatty acid ester, sorbitan fatty acid ester and polyglycerine fatty acid ester, followed by melting the admixture by heating at 60 to 200° C. Afterwards, the molten substance is mixed with an aqueous beverage alone or an emulsifier-containing aqueous beverage in state of its own molten type or power type. This resulting mixture is stirred at a high speed to give a dispersion of plant sterols in an aqueous beverage. The beverage is superior in bioavailability, having good mouth feel, transparent aspect and no influence on the characteristic taste, flavor and color of the beverages.

    摘要翻译: 公开了分散饮料用植物性甾醇和分散饮料中粒径为纳米级的植物甾醇分散饮料的方法。 植物甾醇的分散体从植物甾醇与至少一种选自蔗糖脂肪酸酯,脱水山梨糖醇脂肪酸酯和聚甘油脂肪酸酯的乳化剂混合开始,然后通过在60〜200℃加热熔融混合物 C.然后,将熔融物与单独的含水饮料或含乳化剂的含水饮料以其自身的熔融型或动力型混合。 将所得混合物高速搅拌,得到植物甾醇在含水饮料中的分散体。 该饮料具有优越的生物利用度,具有良好的口感,透明的方面,并且不影响饮料的特征味道,风味和颜色。

    TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING (2)
    5.
    发明申请
    TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING (2) 审中-公开
    用于晶体硅晶体的纹理蚀刻组合物和纹理蚀刻方法(2)

    公开(公告)号:US20130137278A1

    公开(公告)日:2013-05-30

    申请号:US13816294

    申请日:2011-08-12

    IPC分类号: H01L21/02

    摘要: Disclosed herein is an etching composition for texturing a crystalline silicon wafer, comprising, based on a total amount of the composition: (A) 0.1 to 20 wt % of an alkaline compound; (B) 0.1 to 50 wt % of a cyclic compound having a boiling point of 100° C. or more; (C) 0.000001 to 10 wt % of a fluorine-based surfactant; and (D) residual water. The etching composition can maximize the absorbance of light of the surface of a crystalline silicon wafer.

    摘要翻译: 本文公开了一种用于纹理化晶体硅晶片的蚀刻组合物,其包含基于组合物的总量:(A)0.1至20重量%的碱性化合物; (B)0.1〜50重量%的沸点为100℃以上的环状化合物; (C)0.000001〜10重量%的氟系表面活性剂; 和(D)残留水。 蚀刻组合物可使晶体硅晶片的表面的光吸收最大化。