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公开(公告)号：US20060134531A1
公开(公告)日：2006-06-22
申请号：US11274474
申请日：2005-11-16
申请人： I-Hun Song , Won-Il Ryu , Suk-Pil Kim , Hoon Kim , Seung-Hyuk Chang , Won-Joo Kim , Young-Soo Park
发明人： I-Hun Song , Won-Il Ryu , Suk-Pil Kim , Hoon Kim , Seung-Hyuk Chang , Won-Joo Kim , Young-Soo Park
摘要： A mask for lithography and a method of manufacturing the same. The mask may include a substrate, a reflection layer formed of a material capable of reflecting electromagnetic rays on the substrate and an absorption pattern formed in a desired pattern such that absorbing regions with respect to electromagnetic rays and windows through which electromagnetic rays pass are formed, wherein the absorption pattern includes at least one side surface that is adjacent to the window and is inclined with respect to the reflection layer. The method may include forming a reflection layer which is formed of a material capable of reflecting electromagnetic rays on a substrate, forming an absorption layer which is formed of a material capable of absorbing electromagnetic rays on the refection layer, and patterning the absorption layer to form an absorption pattern with at least one side surface adjacent to a window that has an inclined side surface with respect to the reflection layer.
摘要翻译： 光刻用掩模及其制造方法。 掩模可以包括基板，由能够在基板上反射电磁射线的材料形成的反射层和形成为期望图案的吸收图案，使得形成相对于电磁射线通过的电磁射线和窗口的吸收区域， 其中所述吸收图案包括与所述窗口相邻并且相对于所述反射层倾斜的至少一个侧表面。 该方法可以包括形成由能够在基板上反射电磁射线的材料形成的反射层，形成由能够在反射层上吸收电磁射线的材料形成的吸收层，以及图案化吸收层以形成 具有与窗口相邻的至少一个侧表面的吸收图案，该窗口具有相对于反射层的倾斜侧表面。
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公开(公告)号：US20060257753A1
公开(公告)日：2006-11-16
申请号：US11356258
申请日：2006-02-17
申请人： Won-joo Kim , I-hun Song , Suk-pil Kim , Seung-hyuk Chang , Won-Il Ryu , Hoon Kim
发明人： Won-joo Kim , I-hun Song , Suk-pil Kim , Seung-hyuk Chang , Won-Il Ryu , Hoon Kim
CPC分类号： G21K1/062 , B82Y10/00 , B82Y40/00 , G03F1/24 , G21K2201/067
摘要： A photomask and method thereof. In an example method, a photomask may be manufactured by forming an oxide layer on a surface, patterning the oxide layer to form an oxide pattern, the oxide pattern including a plurality of oxide pattern bodies and a plurality of oxide windows, filling the plurality of oxide windows with an absorbent to form an absorbent pattern and reducing the plurality of oxide pattern bodies. An example photomask may include an oxide pattern-based absorbent pattern including a plurality of absorbent pattern bodies and a plurality of absorbent pattern windows.
摘要翻译： 光掩模及其方法。 在一个示例性方法中，可以通过在表面上形成氧化物层来形成光掩模，图案化氧化物层以形成氧化物图案，氧化物图案包括多个氧化物图案体和多个氧化物窗口， 具有吸收剂的氧化物窗口以形成吸收图案并且还原多个氧化物图案体。 示例性光掩模可以包括基于氧化物图案的吸收图案，其包括多个吸收图案体和多个吸收图案窗。
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