公开(公告)号：US12297538B2

公开(公告)日：2025-05-13

申请号：US18221302

申请日：2023-07-12

Applicant: Xerox Corporation

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: H01L21/67 ,  B05B5/00 ,  B05D1/00 ,  B81B3/00 ,  C23C16/50 ,  H01L23/00

Abstract: Disclosed herein are techniques for transferring particles in a pattern. In one implementation, a particle-transferring system includes a first substrate comprising a first surface configured to support a plurality of particles in a non-uniform pattern, and a particle transfer unit configured to remove the plurality of particles from the first surface in response to the plurality of particles being within a first gap. The system also includes a second substrate configured to remove the plurality of particles from the particle transfer unit and secure the plurality of particles to the second surface in response to the plurality of particles being within a second gap. The particle transfer unit is configured to transfer the plurality of particles and maintain the non-uniform pattern regardless of the positions of the plurality of particles, which are not predefined to fit features of the particle transfer unit.

公开(公告)号：US20240339560A1

公开(公告)日：2024-10-10

申请号：US18745409

申请日：2024-06-17

Applicant: Xerox Corporation

Inventor： Evgeniy Bart ,  Yunda Wang ,  Matthew Shreve

IPC: H01L33/00 ,  H01L21/683 ,  H01L25/075 ,  H01L33/62

CPC classification number: H01L33/0095 ,  H01L21/6835 ,  H01L25/0753 ,  H01L33/62 ,  H01L2221/68354 ,  H01L2221/68368 ,  H01L2933/0066

Abstract: Data representations are formed of a target substrate and a plurality of donor coupons that are incompletely filled with functional chips. The data representations are abstracted into a current state description of the target substrate and the donor coupons and input into a machine learning model that has been trained on previous mass transfer sequences. An optimal output of the machine learning model defines at least a selected one or more of the donor coupons and corresponding functional chips of the selected one or more of the donor coupons used to fill the vacancies. A parallel transfer of the corresponding functional chips is performed to fill the vacancies on the target substrate using the selected one or more of the donor coupons.

公开(公告)号：US20180327905A1

公开(公告)日：2018-11-15

申请号：US15591959

申请日：2017-05-10

Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: C23C16/50

CPC classification number: H01L21/67271 ,  H01L21/67282 ,  H01L21/67294 ,  H01L24/75 ,  H01L24/81 ,  H01L24/95

Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.

公开(公告)号：US20230366093A1

公开(公告)日：2023-11-16

申请号：US18221302

申请日：2023-07-12

Applicant: Xerox Corporation

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: C23C16/50 ,  B81B3/00 ,  H01L23/00 ,  H01L21/67

CPC classification number: C23C16/50 ,  B81B3/0018 ,  H01L24/95 ,  H01L24/75 ,  H01L21/67271 ,  H01L21/67294 ,  H01L21/67282 ,  H01L2224/95115 ,  H01L2224/95145 ,  H01L2224/95144 ,  H01L2924/1434 ,  H01L2224/95001 ,  H01L2224/95101 ,  H01L2924/1461 ,  H01L2924/10253

Abstract: Disclosed herein are techniques for transferring particles in a pattern. In one implementation, a particle-transferring system includes a first substrate comprising a first surface configured to support a plurality of particles in a non-uniform pattern, and a particle transfer unit configured to remove the plurality of particles from the first surface in response to the plurality of particles being within a first gap. The system also includes a second substrate configured to remove the plurality of particles from the particle transfer unit and secure the plurality of particles to the second surface in response to the plurality of particles being within a second gap. The particle transfer unit is configured to transfer the plurality of particles and maintain the non-uniform pattern regardless of the positions of the plurality of particles, which are not predefined to fit features of the particle transfer unit.

公开(公告)号：US20200173026A1

公开(公告)日：2020-06-04

申请号：US16781813

申请日：2020-02-04

Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: C23C16/50 ,  H01L23/00 ,  H01L21/67

Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.

公开(公告)号：US10604843B2

公开(公告)日：2020-03-31

申请号：US15591959

申请日：2017-05-10

Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: C23C16/50 ,  H01L23/00 ,  H01L21/67

Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.

公开(公告)号：US11732362B2

公开(公告)日：2023-08-22

申请号：US16781813

申请日：2020-02-04

Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: H01L23/00 ,  H01L21/67 ,  B81B3/00 ,  C23C16/50

CPC classification number: C23C16/50 ,  B81B3/0018 ,  H01L21/67271 ,  H01L21/67282 ,  H01L21/67294 ,  H01L24/75 ,  H01L24/95 ,  H01L2224/95001 ,  H01L2224/95101 ,  H01L2224/95115 ,  H01L2224/95144 ,  H01L2224/95145 ,  H01L2924/10253 ,  H01L2924/1434 ,  H01L2924/1461

Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.