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    Method and Apparatus for Forming Chromonic Nanoparticles
    2.
    发明申请
    Method and Apparatus for Forming Chromonic Nanoparticles 审中-公开
    形成色纳米颗粒的方法和装置

    公开(公告)号：US20070128291A1

    公开(公告)日：2007-06-07

    申请号：US11275070

    申请日：2005-12-07

    申请人： Jeffrey Tokie ,  Hassan Sahouani ,  Jacqueline Aguilera

    发明人： Jeffrey Tokie ,  Hassan Sahouani ,  Jacqueline Aguilera

    IPC分类号： A61K38/28 ,  A61M11/00 ,  A61K9/50 ,  A61K9/16

    CPC分类号： A61K9/5115 ,  A61K9/5192 ,  A61K38/28

    摘要： A method and apparatus for forming guest molecules encapsulated with chromonic material are described. The method includes atomizing a solution to form a pre-atomized particle stream. The solution includes chromonic material, a guest molecule and a carrier fluid. Then, atomizing the pre-atomized particle stream to form an atomized particle stream; evaporating at least a portion of the carrier fluid from the atomized particle stream to form a dried atomized particle stream, and forming encapsulated guest molecules from the dried atomized particle stream.

    摘要翻译： 描述了用发色材料包封形成客体分子的方法和装置。 该方法包括雾化溶液以形成预雾化颗粒物流。 溶液包括发色材料，客体分子和载体流体。 然后，雾化预雾化的颗粒物流以形成雾化的颗粒物流; 从雾化的颗粒物流中蒸发至少一部分载体流体以形成干燥的雾化颗粒物流，并从干燥的雾化颗粒物流形成包封的客体分子。

    Flame-perforated aperture masks
    4.
    发明申请
    Flame-perforated aperture masks 审中-公开
    火焰穿孔孔罩

    公开(公告)号：US20070148337A1

    公开(公告)日：2007-06-28

    申请号：US11315111

    申请日：2005-12-22

    申请人： Jonathan Nichols ,  Jeffrey Tokie ,  Michael Bench ,  Mark Strobel ,  Joel Getschel ,  Donald McClure

    发明人： Jonathan Nichols ,  Jeffrey Tokie ,  Michael Bench ,  Mark Strobel ,  Joel Getschel ,  Donald McClure

    IPC分类号： H05K3/00 ,  B05D3/08 ,  B05D1/32 ,  C23C16/00

    CPC分类号： C23C14/562 ,  C23C14/042 ,  H05K1/0393 ,  H05K3/143 ,  H05K2203/1545

    摘要： An aperture mask is provided comprising an elongated web of flexible film having at least one deposition mask pattern formed in the film, wherein the deposition mask pattern defines deposition apertures that extend through the film that define at least a portion of one or more electronic circuit elements, and wherein deposition apertures are bounded by a rim, the rim being a portion of the mask which has a thickness greater than an average thickness for the mask. In another aspect, the present invention provides a method of making such an aperture mask comprising the steps of: providing a support surface, wherein the support surface includes a plurality of lowered portions; providing a burner, wherein the burner supports a flame, and wherein the flame includes a flame tip opposite the burner; contacting at least a portion of an elongated web of flexible film against the support surface; and heating the film with a flame from a burner to create apertures in the film in the areas covering the plurality of lowered portions.

    摘要翻译： 提供了一种光阑掩模，其包括具有形成在所述膜中的至少一个沉积掩模图案的柔性膜的细长网，其中所述沉积掩模图案限定延伸穿过所述膜的沉积孔，其限定一个或多个电子电路元件的至少一部分 ，并且其中沉积孔由边缘限定，所述边缘是所述掩模的一部分，其厚度大于所述掩模的平均厚度。 另一方面，本发明提供一种制造这种孔眼掩模的方法，包括以下步骤：提供支撑表面，其中所述支撑表面包括多个下降部分; 提供燃烧器，其中所述燃烧器支撑火焰，并且其中所述火焰包括与所述燃烧器相对的火焰尖端; 将柔性薄膜的细长腹板的至少一部分抵靠支撑表面接触; 并用来自燃烧器的火焰加热膜，以在覆盖多个下降部分的区域中在膜中产生孔。