公开(公告)号：US20110318686A1

公开(公告)日：2011-12-29

申请号：US13088820

申请日：2011-04-18

申请人： Yen-Cheng Li ,  Nai-Tien Chou ,  Jung-Hsin Wei

发明人： Yen-Cheng Li ,  Nai-Tien Chou ,  Jung-Hsin Wei

IPC分类号： G03F7/004

CPC分类号： G03F7/0233 ,  G03F7/0236

摘要： The present invention provides a positive photosensitive resin composition, including an alkali soluble phenolic resin; an alkali soluble acrylic resin; and a photosensitive compound having quinone diazide. The positive photosensitive resin composition is applicable to a semi-additive process for forming tiny and fine wirings.

摘要翻译： 本发明提供一种正型感光性树脂组合物，其包含碱溶性酚醛树脂; 碱溶性丙烯酸树脂; 和具有醌二叠氮化物的光敏化合物。 正型感光性树脂组合物适用于形成微小细微布线的半添加方法。

公开(公告)号：US20110183261A1

公开(公告)日：2011-07-28

申请号：US12721108

申请日：2010-03-10

申请人： Yen-Cheng Li ,  Nai-Tien Chou

发明人： Yen-Cheng Li ,  Nai-Tien Chou

IPC分类号： G03F7/004

CPC分类号： G03F7/322 ,  C23F11/10

摘要： A developer composition with low metal corrosiveness is provided. The developer composition includes 1 to 10 weight parts of tetraalkylammonium hydroxide; 0.01 to 3 weight parts of a metal corrosion inhibiting agent; 0.1 to 5 weight parts of a pH control agent; 0.1 to 5 weight parts of a surfactant; and water in balance. The developer composition of the present invention has a metal corrosion prevents corrosiveness to metals such as aluminum and copper during a resist development.

摘要翻译： 提供了具有低金属腐蚀性的显影剂组合物。 显影剂组合物包含1至10重量份的四烷基氢氧化铵; 0.01〜3重量份的金属腐蚀抑制剂; 0.1〜5重量份的pH控制剂; 0.1〜5重量份表面活性剂; 和水平衡。 本发明的显影剂组合物具有金属腐蚀防止在抗蚀剂显影期间对诸如铝和铜的金属的腐蚀性。

公开(公告)号：US07879786B1

公开(公告)日：2011-02-01

申请号：US12805900

申请日：2010-08-24

申请人： Yung-Hsiang Bai ,  Yu-Fen Liao ,  Yi-Jin Chen ,  Yen-Cheng Li

发明人： Yung-Hsiang Bai ,  Yu-Fen Liao ,  Yi-Jin Chen ,  Yen-Cheng Li

IPC分类号： C11D1/16 ,  C11D1/70 ,  C11D1/83 ,  C11D3/04

CPC分类号： C11D3/044 ,  C11D1/143 ,  C11D1/24 ,  C11D1/72 ,  C11D1/83 ,  C11D3/33 ,  C11D3/3418

摘要： A detergent composition is disclosed, which comprises: (A) an alkali metal hydroxyl compound in an amount of 0.1 to 20 parts by weight; (B) a nonionic surfactant represented by the following formula (I) in an amount of 0.1 to 30 parts by weight: wherein R1 is hydrogen or methyl; R2 is hydrogen or methyl; n is an integer from 0 to 10; and m is an integer from 4 to 20; (C) an anionic surfactant in an amount of 0.1 to 10 parts by weight; (D) a chelating agent in an amount of 0.1 to 20 parts by weight; (E) an additive in an amount of 0.1 to 20 parts by weight; and (F) water of remaining parts based on 100 parts by weight of the detergent composition.

摘要翻译： 公开了一种洗涤剂组合物，其包含：（A）0.1至20重量份的碱金属羟基化合物; （B）由下式（I）表示的非离子表面活性剂，其含量为0.1-30重量份：其中R1是氢或甲基; R2是氢或甲基; n是0至10的整数; m为4〜20的整数。 （C）0.1至10重量份的阴离子表面活性剂; （D）螯合剂，其量为0.1〜20重量份; （E）0.1至20重量份的添加剂; 和（F）基于100重量份洗涤剂组合物的剩余部分的水。

公开(公告)号：US20090275717A1

公开(公告)日：2009-11-05

申请号：US12149307

申请日：2008-04-30

申请人： Chiu-Ming Hung ,  Wei-Ju Chen ,  Cheng-Han Chung ,  Chih-Kang Chang ,  Hsiang-Lin Jiang ,  You-Chun Mau ,  Yen-Cheng Li ,  Chi-Hsiang Yao

发明人： Chiu-Ming Hung ,  Wei-Ju Chen ,  Cheng-Han Chung ,  Chih-Kang Chang ,  Hsiang-Lin Jiang ,  You-Chun Mau ,  Yen-Cheng Li ,  Chi-Hsiang Yao

IPC分类号： C08F26/06 ,  G02C7/04

CPC分类号： C08F220/26 ,  C08F220/36 ,  C08F222/1006

摘要： The present invention relates to a polymerizable water-soluble or alcohol-soluble ultraviolet absorber, which is represented by the following formula (I): wherein R1 is H or C1˜5 alkyl; R2 is H, Cl, Br or I; R3 is H or methyl; and m each is an integer in the range from 3 to 12. The above-mentioned compounds are suitable for copolymerizing with one or more monomers to form copolymers so that the UV-light resistance of the copolymer can be efficiently promoted. For example, the polymer made by copolymerizing the above-mentioned compound with acrylate monomers can be applied to the production of optical medical materials, especially contact lenses or intraocular lenses.

摘要翻译： 本发明涉及由下式（I）表示的可聚合的水溶性或醇溶性紫外线吸收剂：其中R 1是H或C 1-5烷基; R2是H，Cl，Br或I; R3是H或甲基; m为3〜12的整数。上述化合物适于与一种或多种单体共聚以形成共聚物，从而能够有效地促进共聚物的耐紫外线性。 例如，通过将上述化合物与丙烯酸酯单体共聚而制成的聚合物可以用于制造光学医疗材料，特别是隐形眼镜或人工晶状体。

公开(公告)号：US07915322B2

公开(公告)日：2011-03-29

申请号：US12149307

申请日：2008-04-30

申请人： Chiu-Ming Hung ,  Wei-Ju Chen ,  Cheng-Han Chung ,  Chih-Kang Chang ,  Hsiang-Lin Jiang ,  You-Chin Mou ,  Yen-Cheng Li ,  Chi-Hsiang Yao

发明人： Chiu-Ming Hung ,  Wei-Ju Chen ,  Cheng-Han Chung ,  Chih-Kang Chang ,  Hsiang-Lin Jiang ,  You-Chin Mou ,  Yen-Cheng Li ,  Chi-Hsiang Yao

IPC分类号： G02B1/04

CPC分类号： C08F220/26 ,  C08F220/36 ,  C08F222/1006

摘要： The present invention relates to a polymerizable water-soluble or alcohol-soluble ultraviolet absorber, which is represented by the following formula (I): wherein R1 is H or C1˜5 alkyl; R2 is H, Cl, Br or I; R3 is H or methyl; and m each is an integer in the range from 3 to 12. The above-mentioned compounds are suitable for copolymerizing with one or more monomers to form copolymers so that the UV-light resistance of the copolymer can be efficiently promoted. For example, the polymer made by copolymerizing the above-mentioned compound with acrylate monomers can be applied to the production of optical medical materials, especially contact lenses or intraocular lenses.

摘要翻译： 本发明涉及由下式（I）表示的可聚合的水溶性或醇溶性紫外线吸收剂：其中R1是H或C1-5烷基; R2是H，Cl，Br或I; R3是H或甲基; m为3〜12的整数。上述化合物适于与一种或多种单体共聚以形成共聚物，从而能够有效地促进共聚物的耐紫外线性。 例如，通过将上述化合物与丙烯酸酯单体共聚而制成的聚合物可以用于制造光学医疗材料，特别是隐形眼镜或人工晶状体。

公开(公告)号：US20060177764A1

公开(公告)日：2006-08-10

申请号：US11188530

申请日：2005-07-26

申请人： Hsin-Ming Liao ,  Yu-Ming Chen ,  Yen-Cheng Li

发明人： Hsin-Ming Liao ,  Yu-Ming Chen ,  Yen-Cheng Li

IPC分类号： G03C1/76

CPC分类号： G03F7/0233

摘要： The present invention provides a positive-tone photosensitivity resin composition comprising (A) an alkali-soluble acrylic resin, the alkali-soluble acrylic resin containing at least one structure unit selected from the group consisting of the following structure unit (1), structure unit (2), and structure unit (3), wherein R1, R2, R3, R4, R5, R, U, V, X, Y and Z are defined the same as the specification; (B) a naphthoquinone-diazide group containing compound; and (C) an solvent, the solvent is selected from the group consisting of ethers, ketones, esters, aromatic hydrocarbons and acetoacetates.

摘要翻译： 本发明提供一种正色光敏树脂组合物，其包含（A）碱溶性丙烯酸树脂，所述碱溶性丙烯酸树脂含有至少一种结构单元，所述结构单元选自下列结构单元（1），结构单元 （2）和结构单元（3），其中R 1，R 2，R 3，R 4， ，R 5，R，U，V，X，Y和Z的定义与说明书相同; （B）含萘醌二叠氮基的化合物; 和（C）溶剂，溶剂选自醚，酮，酯，芳烃和乙酰乙酸酯。

公开(公告)号：US06316159B1

公开(公告)日：2001-11-13

申请号：US09608604

申请日：2000-06-30

申请人： Shang-Wern Chang ,  Yen-Cheng Li ,  Shang-Ho Lin

发明人： Shang-Wern Chang ,  Yen-Cheng Li ,  Shang-Ho Lin

IPC分类号： G03F7004

CPC分类号： G03F7/0397 ,  Y10S430/114 ,  Y10S430/115

摘要： A chemical amplified photoresist composition comprising a photosensitive polymer containing the following structure unit of formula (II): Wherein R is hydrogen or C1-C4 alkyl group; R′ is C1-C4 alkyl group; n is an integer of 2, 3, 4, 5 or 6. This chemical amplified photoresist composition can be applied to general lithography processes, especially in 193 nm lithography and the patterns formed from the photoresist exhibit excellent resolution and photosensitivity.

摘要翻译： 一种化学放大光致抗蚀剂组合物，其包含含有下列式（II）结构单元的光敏聚合物：其中R为氢或C 1 -C 4烷基; R'是C 1 -C 4烷基; n是2,3,4,5或6的整数。该化学放大光致抗蚀剂组合物可以应用于一般光刻工艺，特别是在193nm光刻中，并且由光致抗蚀剂形成的图案表现出优异的分辨率和光敏性。

公开(公告)号：US06265131B1

公开(公告)日：2001-07-24

申请号：US09541498

申请日：2000-04-03

申请人： Shang-Wern Chang ,  Yen-Cheng Li ,  Shang-Ho Lin ,  Wen-Chieh Wang

发明人： Shang-Wern Chang ,  Yen-Cheng Li ,  Shang-Ho Lin ,  Wen-Chieh Wang

IPC分类号： G03F7004

CPC分类号： C07C69/757 ,  C07C2603/86 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/109

摘要： A positive photoresist composition comprising a polymer, a photoactived agent and an dissolution inhibitor represented by the following formula (1): wherein R1 and R2 each independently is a hydroxyl group, a C1-8 hydroxyalkyl group, or a C3-8 hydroxycycloalkyl group; R3, R4 and R5 each independently is a hydrogen, a C1-8 hydroxyalkyl group, a C1-6 carboxylic acid or a C3-8 carboxylic acid ester; k is an integer of 0, 1, 2, 3, 4, 5 or 6. The photoresist composition has high transparency to deep UV light and is capable of forming good fine patterns, roughness and high sensitivity, thus being useful as a chemically amplified type resist when exposed to deep UV light from an KrF and ArF excimer laser.

摘要翻译： 一种正型光致抗蚀剂组合物，其包含聚合物，光活化剂和由下式（1）表示的溶解抑制剂：其中R1和R2各自独立地为羟基，C1-8羟基烷基或C3-8羟基环烷基; R 3，R 4和R 5各自独立地为氢，C 1-8羟基烷基，C 1-6羧酸或C 3-8羧酸酯; k为0,1,2,3,4,5或6的整数。光致抗蚀剂组合物对深紫外光具有高透明度，并且能够形成良好的精细图案，粗糙度和高灵敏度，因此可用作化学放大 当暴露于来自KrF和ArF准分子激光器的深紫外光下时，抗蚀剂。

公开(公告)号：US20110054076A1

公开(公告)日：2011-03-03

申请号：US12591860

申请日：2009-12-03

申请人： Tsung-Yi Chao ,  Wen-Jeng Lee ,  Der-Gun Chou ,  Yen-Cheng Li ,  Meng-Huang Yan

发明人： Tsung-Yi Chao ,  Wen-Jeng Lee ,  Der-Gun Chou ,  Yen-Cheng Li ,  Meng-Huang Yan

IPC分类号： C08L63/00

CPC分类号： C08L63/00 ,  C08G59/4215 ,  C08G77/14 ,  C08K5/3475 ,  C08K5/3492 ,  H01L2924/0002 ,  H01L2924/00

摘要： The present invention relates to a silicone containing encapsulant composition. One embodiment of the encapsulant composition comprises (a) 30˜60 weight % of an epoxy resin; (b) 30˜60 weight % of an acid anhydride curing agent; (c) 0.1˜30 weight % of a Carbinol function silicone resin which can form a homogeneous mixture with (a) and (b) described above; and (d) 0.1˜5 weight % of a reactive UV absorber or HALS; and reactive anti-oxidant and/or phosphor containing flame retardant. The encapsulant composition can be used for a solid state light emitting device to achieve low internal stress and better-anti-yellowing performance.

摘要翻译： 本发明涉及含硅氧烷的密封剂组合物。 密封剂组合物的一个实施方案包括（a）30〜60重量％的环氧树脂; （b）30〜60重量％的酸酐固化剂; （c）0.1〜30重量％的可与上述（a）和（b）形成均匀混合物的甲醇官能硅氧烷树脂; 和（d）0.1〜5重量％的反应性紫外线吸收剂或HALS; 和反应性抗氧化剂和/或含阻燃剂的磷光体。 密封剂组合物可用于固态发光器件以实现低内应力和更好的抗黄变性能。

公开(公告)号：US06441115B1

公开(公告)日：2002-08-27

申请号：US09608602

申请日：2000-06-30

申请人： Shang-Wern Chang ,  Yen-Cheng Li ,  Shang-Ho Lin

发明人： Shang-Wern Chang ,  Yen-Cheng Li ,  Shang-Ho Lin

IPC分类号： C08F22010

CPC分类号： C08F222/06 ,  C08F220/18 ,  C08F232/08 ,  G03F7/0397

摘要： The present invention provides a photosensitive polymer containing the following structure unit of formula (II): Wherein R is hydrogen or C1-C4 alkyl group; R′ is C1-C4 alkyl group; n is an integer of 2, 3, 4, 5 or 6. This photosensitive polymer also relates to chemical amplified photoresist composition. This chemical amplified photoresist composition can be applied to general lithography processes, especially in 193 nm lithography and the patterns formed from the photoresist composition exhibit excellent resolution and photosensitivity.

摘要翻译： 本发明提供含有下列式（II）结构单元的光敏聚合物：其中R是氢或C 1 -C 4烷基; R'是C 1 -C 4烷基; n为2,3,4,5或6的整数。该光敏聚合物还涉及化学放大光致抗蚀剂组合物。 该化学放大光致抗蚀剂组合物可以应用于一般光刻工艺，特别是在193nm光刻中，并且由光致抗蚀剂组合物形成的图案显示出优异的分辨率和光敏性。