公开(公告)号：US07656079B2

公开(公告)日：2010-02-02

申请号：US11362788

申请日：2006-02-28

申请人： Yoichi Mizukawa ,  Keita Kanazu ,  Masaki Yoshioka ,  Shinji Suzuki ,  Kyohei Seki

发明人： Yoichi Mizukawa ,  Keita Kanazu ,  Masaki Yoshioka ,  Shinji Suzuki ,  Kyohei Seki

IPC分类号： H01K9/00

CPC分类号： H01K7/00 ,  H01K9/08 ,  H01L21/67115 ,  H05B3/0033 ,  H05B2203/032

摘要： A heating device in which uniform heating of an article to be processed is possible even in the case a temperature change which leads to a loss of the uniformity of the temperature distribution in a narrowly delineated area, and in which a reduction in the size of the device is possible. The heating device has a plurality of heaters, each heater having a single bulb of transparent material in which there is a filament that is divided in the axial direction into several filament parts and the respective filament parts are supplied with power independently of each other.

摘要翻译： 即使在温度变化导致狭窄划定区域中的温度分布均匀性降低的情况下，也能够对待处理物品进行均匀加热的加热装置，其中， 设备是可能的。 加热装置具有多个加热器，每个加热器具有单个透明材料灯泡，其中存在沿轴向分成多个细丝部分的细丝，并且相应的灯丝部分彼此独立地供应电力。

公开(公告)号：US20060197454A1

公开(公告)日：2006-09-07

申请号：US11362788

申请日：2006-02-28

申请人： Yoichi Mizukawa ,  Keita Kanazu ,  Masaki Yoshioka ,  Shinji Suzuki ,  Kyohei Seki

发明人： Yoichi Mizukawa ,  Keita Kanazu ,  Masaki Yoshioka ,  Shinji Suzuki ,  Kyohei Seki

IPC分类号： H01J13/46

CPC分类号： H01K7/00 ,  H01K9/08 ,  H01L21/67115 ,  H05B3/0033 ,  H05B2203/032

摘要： A heating device in which uniform heating of an article to be processed is possible even in the case a temperature change which leads to a loss of the uniformity of the temperature distribution in a narrowly delineated area, and in which a reduction in the size of the device is possible. The heating device has a plurality of heaters, each heater having a single bulb of transparent material in which there is a filament that is divided in the axial direction into several filament parts and the respective filament parts are supplied with power independently of each other.

摘要翻译： 即使在温度变化导致狭窄划定区域中的温度分布均匀性降低的情况下，也能够对待处理物品进行均匀加热的加热装置，其中， 设备是可能的。 加热装置具有多个加热器，每个加热器具有单个透明材料灯泡，其中存在沿轴向分成多个细丝部分的细丝，并且相应的灯丝部分彼此独立地供应电力。

公开(公告)号：US07756403B2

公开(公告)日：2010-07-13

申请号：US11536057

申请日：2006-09-28

申请人： Kyohei Seki ,  Shinji Suzuki ,  Yoichi Mizukawa

发明人： Kyohei Seki ,  Shinji Suzuki ,  Yoichi Mizukawa

IPC分类号： A45D20/40

CPC分类号： H01L21/67115

摘要： A light irradiation heating process in which, even in the case of an asymmetrical physical property of an article to be treated, uniform heating is possible, or in which heating can be performed such that the article acquires a desired physical property after heat treatment. Based on the measured value of the local physical property of the article to be treated, the emissivity distribution is obtained and the distribution pattern of the light intensity on the article to be treated is determined. According to this light intensity pattern, the individual intensity of the light emitted from respective light emitting parts of lamp units of the heating device are determined beforehand. According to this determined result, the intensity of the light emitted from the respective light emitting parts of the lamp units are controlled individually, and thus, the article to be treated is irradiated with light.

摘要翻译： 即使在待处理物品的不对称物理性质的情况下也可以进行均匀加热，或者可以进行加热，使得制品在热处理后获得所需的物理性质的光照射加热过程。 根据待处理物品的局部物理性质的测定值，得到辐射率分布，并确定待处理物品上光强度的分布格局。 根据该光强度图案，预先确定从加热装置的灯单元的各个发光部分发射的光的单独强度。 根据该确定结果，单独控制从灯单元的各个发光部分发射的光的强度，从而照射待处理的物品。

公开(公告)号：US07639930B2

公开(公告)日：2009-12-29

申请号：US11778374

申请日：2007-07-16

申请人： Yoichi Mizukawa ,  Tetsuya Kitagawa ,  Shinji Suzuki

发明人： Yoichi Mizukawa ,  Tetsuya Kitagawa ,  Shinji Suzuki

IPC分类号： A21B2/00

CPC分类号： H01K7/00 ,  H01K1/16 ,  H01K1/24 ,  H01K9/08 ,  H05B3/0047

摘要： A filament lamp that allows independent control of the state of luminescence of multiple filaments and that reliably prevents the occurrence of unwanted discharge between adjacent portions of neighboring filaments, even when a high voltage is injected into the filaments to achieve a desired irradiation distribution, and light-irradiation-type heat treatment device that can heat the article to be treated uniformly. The filament lamp has multiple filament assemblies, each having a filament and respective leads arrangement sequentially within a light emitting bulb, in the axial direction of the light emitting bulb. With alternating current power supplied to each filament independently, the current will be supplied with the same phase and mutually adjacent terminals of neighboring filament assemblies will have the same potential, and with direct current power supplied to each filament independently, adjacent terminals of neighboring filament assemblies will be of the same polarity. The light-irradiation-type heat treatment device uses multiple filament lamps of this type.

摘要翻译： 一种白炽灯，其允许独立地控制多根灯丝的发光状态，并且即使当将高电压注入到灯丝中以实现期望的照射分布时，也可靠地防止相邻灯丝的相邻部分之间的不期望的放电的发生，以及光 能够均匀加热待处理物品的照射型热处理装置。 灯丝灯具有多个灯丝组件，每个灯丝组件在发光灯泡的轴向方向上均具有灯丝和相应的引线排列顺序地在发光灯泡内。 随着独立地向每个灯丝提供交流电力，电流将被提供相同的相位，并且相邻灯丝组件的相互相邻的端子将具有相同的电位，并且随着独立地向每个灯丝提供直流电力，相邻灯丝组件的相邻端子 将具有相同的极性。 光照式热处理装置使用这种多种白炽灯。

公开(公告)号：US5677113A

公开(公告)日：1997-10-14

申请号：US436679

申请日：1995-05-08

申请人： Shinji Suzuki ,  Kyohei Seki ,  Nobutoshi Ebashi ,  Tetsuji Arai

发明人： Shinji Suzuki ,  Kyohei Seki ,  Nobutoshi Ebashi ,  Tetsuji Arai

IPC分类号： G03F7/42 ,  H01L21/027 ,  H01L21/30 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311

CPC分类号： G03F7/42 ,  H01L21/31138

摘要： The object of the invention is to provide an ashing method and an asher in order to avoid damage to semiconductor components occurring during ashing of a photoresist resin film by active oxygen plasma and to avoid a long treatment time occurring in an ashing method using a low pressure mercury discharge lamp. According to the invention, this object is achieved by a method and an apparatus for ashing a photoresist resin film. In the method, a wafer provided with a photoresist resin film is placed in an ozone-containing atmosphere. An activated oxygen is produced through the radiation light of a discharge lamp, which emits a continuous spectrum in a wavelength range of 200 to 300 nm. The photoresist resin film is ashed by the activated oxygen.

摘要翻译： 本发明的目的是提供一种灰化方法和灰化装置，以避免对通过活性氧等离子体在光致抗蚀剂树脂膜进行灰化期间发生的半导体成分的损坏，并且避免在使用低压的灰化方法中发生长时间的处理时间 汞放电灯。 根据本发明，通过用于灰化光致抗蚀剂树脂膜的方法和设备来实现该目的。 在该方法中，将设置有光致抗蚀剂树脂膜的晶片放置在含臭氧气氛中。 通过放电灯的放射线产生活化氧，其在200〜300nm的波长范围内发射连续的光谱。 光致抗蚀剂树脂膜被活化的氧气脱落。

公开(公告)号：US07873265B2

公开(公告)日：2011-01-18

申请号：US12035509

申请日：2008-02-22

申请人： Tetsuya Kitagawa ,  Yoichi Mizukawa ,  Shinji Suzuki

发明人： Tetsuya Kitagawa ,  Yoichi Mizukawa ,  Shinji Suzuki

IPC分类号： A21B2/00 ,  F26B19/00

CPC分类号： H01K1/16 ,  H01K7/00 ,  H01K9/08 ,  H01L21/67115 ,  H05B3/0047

摘要： A filament lamp comprising a bulb which has a hermetically sealed portion on at least one end and multiple filament assemblies, each filament assembly comprising a coiled filament and connected leads to supply power to that filament, the filament assemblies being sequentially arranged in the axial direction of the bulb, the leads of each filament assembly being electrically connected to respective multiple conductive parts set in the sealed portions, and power being independently suppliable to each of the filaments. A respective one of the coiled filaments is located in a respective first quadrant formed by intersecting planes that are perpendicular to each other and that are tangent to an outer coil diameter of the respective coiled filament. The leads are positioned in quadrants other than the quadrant in which the coiled filament is located. A light irradiation type heat treatment apparatus uses a plurality of such filament lamps.

摘要翻译： 一种灯丝灯，其包括在至少一端具有气密密封部分的灯泡和多个灯丝组件，每个灯丝组件包括螺旋灯丝并被连接，导致向该灯丝供电，灯丝组件沿轴向方向依次布置 灯泡，每个灯丝组件的引线电连接到设置在密封部分中的相应的多个导电部件，并且功率独立地供应到每个灯丝。 卷绕长丝中的相应一个位于相应的第一象限中，该第一象限由彼此垂直的相交平面形成，并且与相应螺旋丝的外部线圈直径相切。 引线定位在除了卷绕长丝所在的象限之外的象限中。 光照射型热处理装置使用多个这样的白炽灯。

公开(公告)号：US07700899B2

公开(公告)日：2010-04-20

申请号：US11565112

申请日：2006-11-30

申请人： Shinji Suzuki ,  Kyohei Seki

发明人： Shinji Suzuki ,  Kyohei Seki

IPC分类号： A21B1/00

CPC分类号： H05B3/0047 ,  H01L21/67115

摘要： To devise a heating device of the light irradiation type in which costs can reduced by reducing the number of filament lamps and current source parts without adversely affecting the illuminance distribution with respect to a wafer, in a heating device of the light irradiation type that has a light source part, in which several filament lamps are located parallel to one another, in which at least one of the filament lamps has several filaments which are located along the bulb axis are supplied with power individually to produce light which is irradiated from the light source parts onto an article to be treated, the distance between at least some of the adjacent filament lamps to one another is nonuniform.

摘要翻译： 为了设计光照射类型的加热装置，其中通过减少灯丝灯和电流源部件的数量而不会不利地影响相对于晶片的照度分布来降低成本，在具有 光源部分，其中几个白炽灯彼此平行地定位，其中至少一个灯丝灯具有沿着灯泡轴定位的几根灯丝被单独供应以产生从光源照射的光 部件到待处理的物品上，至少一些相邻的白炽灯彼此之间的距离是不均匀的。

公开(公告)号：US07912359B2

公开(公告)日：2011-03-22

申请号：US11848359

申请日：2007-08-31

申请人： Shinji Suzuki ,  Tetsuya Kitagawa ,  Kyohei Seki

发明人： Shinji Suzuki ,  Tetsuya Kitagawa ,  Kyohei Seki

IPC分类号： F21V9/00 ,  F21V7/04

CPC分类号： H01L21/67115 ,  H01L21/67109 ,  H05B3/0047

摘要： A heating device of the light irradiation type having an article to be heated, a guard ring located on the periphery of that article, multiple lamps located above the article to be heated and the guard ring, and a reflecting mirror located above the lamps, in which a light diffusion part is located in the upper region corresponding to the article to be heated so that the diffused light projects onto the entire surface of the article to be heated. The light diffusion part can be formed, for example, on a reflecting mirror, an optically transparent window part located between the article to be heated and the lamps or a light diffusion area formed on the light-emitting bulbs of the lamps. The size of the region occupied by the light diffusion part is such that diffused light is not projected to the guard ring.

摘要翻译： 一种具有待加热物品的光照射型加热装置，位于该物品周边的保护环，位于被加热物上方的多个灯和防护环，以及位于灯的上方的反射镜， 光扩散部位于对应于被加热物的上部区域，使得漫射光投射到待加热物品的整个表面上。 光漫射部可以例如形成在反射镜上，位于待加热物品与灯之间的光学透明窗部或形成在灯的发光灯泡上的光扩散区域。 由光扩散部占据的区域的大小使得漫射光不会被投射到防护环。

公开(公告)号：US20080219650A1

公开(公告)日：2008-09-11

申请号：US11848359

申请日：2007-08-31

申请人： Shinji Suzuki ,  Tetsuya Kitagawa ,  Kyohei Seki

发明人： Shinji Suzuki ,  Tetsuya Kitagawa ,  Kyohei Seki

IPC分类号： F21V9/00

CPC分类号： H01L21/67115 ,  H01L21/67109 ,  H05B3/0047

摘要： A heating device of the light irradiation type having an article to be heated, a guard ring located on the periphery of that article, multiple lamps located above the article to be heated and the guard ring, and a reflecting mirror located above the lamps, in which a light diffusion part is located in the upper region corresponding to the article to be heated so that the diffused light projects onto the entire surface of the article to be heated. The light diffusion part can be formed, for example, on a reflecting mirror, an optically transparent window part located between the article to be heated and the lamps or a light diffusion area formed on the light-emitting bulbs of the lamps. The size of the region occupied by the light diffusion part is such that diffused light is not projected to the guard ring.

摘要翻译： 一种具有待加热物品的光照射型加热装置，位于该物品周边的保护环，位于被加热物上方的多个灯和防护环，以及位于灯的上方的反射镜， 光扩散部位于对应于被加热物的上部区域，使得漫射光投射到待加热物品的整个表面上。 光漫射部可以例如形成在反射镜上，位于待加热物品与灯之间的光学透明窗部或形成在灯的发光灯泡上的光扩散区域。 由光扩散部占据的区域的大小使得漫射光不会被投射到防护环。

公开(公告)号：US10421844B2

公开(公告)日：2019-09-24

申请号：US14116103

申请日：2012-05-16

申请人： Masaki Miura ,  Shinji Suzuki ,  Kinichi Morita ,  Toshikazu Kawaguchi ,  Katsuaki Shimazu

发明人： Masaki Miura ,  Shinji Suzuki ,  Kinichi Morita ,  Toshikazu Kawaguchi ,  Katsuaki Shimazu

IPC分类号： C08J7/04 ,  B32B27/16 ,  C08J7/06 ,  C08J7/12

摘要： A self-assembled monolayer is formed on the surface of a molded article without roughening the surface of the molded article to thereby perform treatment for preventing a biochemical substance from being adsorbed, for example, on a microchip substrate, and imparting functionality of immobilizing a biofunctional molecule thereto. The surface of a cyclic olefin resin molded article, for example, a microchip substrate, is irradiated with vacuum ultraviolet light having a center wavelength of 172 nm from an excimer lamp to activate a portion serving as a flow channel in the substrate. Next, the molded is immersed in a tank filled, for example, with a fluorine compound solution, and a SAM film that is a self-assembled monolayer is formed on the surface activated by ultraviolet radiation.