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    Heating process of the light irradiation type
    1.
    发明授权
    Heating process of the light irradiation type 有权
    光照射类型的加热过程

    公开(公告)号：US07756403B2

    公开(公告)日：2010-07-13

    申请号：US11536057

    申请日：2006-09-28

    申请人： Kyohei Seki ,  Shinji Suzuki ,  Yoichi Mizukawa

    发明人： Kyohei Seki ,  Shinji Suzuki ,  Yoichi Mizukawa

    IPC分类号： A45D20/40

    CPC分类号： H01L21/67115

    摘要： A light irradiation heating process in which, even in the case of an asymmetrical physical property of an article to be treated, uniform heating is possible, or in which heating can be performed such that the article acquires a desired physical property after heat treatment. Based on the measured value of the local physical property of the article to be treated, the emissivity distribution is obtained and the distribution pattern of the light intensity on the article to be treated is determined. According to this light intensity pattern, the individual intensity of the light emitted from respective light emitting parts of lamp units of the heating device are determined beforehand. According to this determined result, the intensity of the light emitted from the respective light emitting parts of the lamp units are controlled individually, and thus, the article to be treated is irradiated with light.

    摘要翻译： 即使在待处理物品的不对称物理性质的情况下也可以进行均匀加热，或者可以进行加热，使得制品在热处理后获得所需的物理性质的光照射加热过程。 根据待处理物品的局部物理性质的测定值，得到辐射率分布，并确定待处理物品上光强度的分布格局。 根据该光强度图案，预先确定从加热装置的灯单元的各个发光部分发射的光的单独强度。 根据该确定结果，单独控制从灯单元的各个发光部分发射的光的强度，从而照射待处理的物品。

    Heater and heating device with heaters
    3.
    发明申请
    Heater and heating device with heaters 有权
    加热器和加热器加热器

    公开(公告)号：US20060197454A1

    公开(公告)日：2006-09-07

    申请号：US11362788

    申请日：2006-02-28

    申请人： Yoichi Mizukawa ,  Keita Kanazu ,  Masaki Yoshioka ,  Shinji Suzuki ,  Kyohei Seki

    发明人： Yoichi Mizukawa ,  Keita Kanazu ,  Masaki Yoshioka ,  Shinji Suzuki ,  Kyohei Seki

    IPC分类号： H01J13/46

    CPC分类号： H01K7/00 ,  H01K9/08 ,  H01L21/67115 ,  H05B3/0033 ,  H05B2203/032

    摘要： A heating device in which uniform heating of an article to be processed is possible even in the case a temperature change which leads to a loss of the uniformity of the temperature distribution in a narrowly delineated area, and in which a reduction in the size of the device is possible. The heating device has a plurality of heaters, each heater having a single bulb of transparent material in which there is a filament that is divided in the axial direction into several filament parts and the respective filament parts are supplied with power independently of each other.

    摘要翻译： 即使在温度变化导致狭窄划定区域中的温度分布均匀性降低的情况下，也能够对待处理物品进行均匀加热的加热装置，其中， 设备是可能的。 加热装置具有多个加热器，每个加热器具有单个透明材料灯泡，其中存在沿轴向分成多个细丝部分的细丝，并且相应的灯丝部分彼此独立地供应电力。

    Method for ashing a photoresist resin film on a semiconductor wafer and an asher
    4.
    发明授权
    Method for ashing a photoresist resin film on a semiconductor wafer and an asher 失效
    在半导体晶片和灰浆上灰化光致抗蚀剂树脂膜的方法

    公开(公告)号：US5677113A

    公开(公告)日：1997-10-14

    申请号：US436679

    申请日：1995-05-08

    申请人： Shinji Suzuki ,  Kyohei Seki ,  Nobutoshi Ebashi ,  Tetsuji Arai

    发明人： Shinji Suzuki ,  Kyohei Seki ,  Nobutoshi Ebashi ,  Tetsuji Arai

    IPC分类号： G03F7/42 ,  H01L21/027 ,  H01L21/30 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311

    CPC分类号： G03F7/42 ,  H01L21/31138

    摘要： The object of the invention is to provide an ashing method and an asher in order to avoid damage to semiconductor components occurring during ashing of a photoresist resin film by active oxygen plasma and to avoid a long treatment time occurring in an ashing method using a low pressure mercury discharge lamp. According to the invention, this object is achieved by a method and an apparatus for ashing a photoresist resin film. In the method, a wafer provided with a photoresist resin film is placed in an ozone-containing atmosphere. An activated oxygen is produced through the radiation light of a discharge lamp, which emits a continuous spectrum in a wavelength range of 200 to 300 nm. The photoresist resin film is ashed by the activated oxygen.

    摘要翻译： 本发明的目的是提供一种灰化方法和灰化装置，以避免对通过活性氧等离子体在光致抗蚀剂树脂膜进行灰化期间发生的半导体成分的损坏，并且避免在使用低压的灰化方法中发生长时间的处理时间 汞放电灯。 根据本发明，通过用于灰化光致抗蚀剂树脂膜的方法和设备来实现该目的。 在该方法中，将设置有光致抗蚀剂树脂膜的晶片放置在含臭氧气氛中。 通过放电灯的放射线产生活化氧，其在200〜300nm的波长范围内发射连续的光谱。 光致抗蚀剂树脂膜被活化的氧气脱落。

    Heating device of the light irradiation type
    5.
    发明授权
    Heating device of the light irradiation type 有权
    光照射型加热装置

    公开(公告)号：US07700899B2

    公开(公告)日：2010-04-20

    申请号：US11565112

    申请日：2006-11-30

    申请人： Shinji Suzuki ,  Kyohei Seki

    发明人： Shinji Suzuki ,  Kyohei Seki

    IPC分类号： A21B1/00

    CPC分类号： H05B3/0047 ,  H01L21/67115

    摘要： To devise a heating device of the light irradiation type in which costs can reduced by reducing the number of filament lamps and current source parts without adversely affecting the illuminance distribution with respect to a wafer, in a heating device of the light irradiation type that has a light source part, in which several filament lamps are located parallel to one another, in which at least one of the filament lamps has several filaments which are located along the bulb axis are supplied with power individually to produce light which is irradiated from the light source parts onto an article to be treated, the distance between at least some of the adjacent filament lamps to one another is nonuniform.

    摘要翻译： 为了设计光照射类型的加热装置，其中通过减少灯丝灯和电流源部件的数量而不会不利地影响相对于晶片的照度分布来降低成本，在具有 光源部分，其中几个白炽灯彼此平行地定位，其中至少一个灯丝灯具有沿着灯泡轴定位的几根灯丝被单独供应以产生从光源照射的光 部件到待处理的物品上，至少一些相邻的白炽灯彼此之间的距离是不均匀的。

    Heating device of the light irradiation type
    6.
    发明授权
    Heating device of the light irradiation type 失效
    光照射型加热装置

    公开(公告)号：US07912359B2

    公开(公告)日：2011-03-22

    申请号：US11848359

    申请日：2007-08-31

    申请人： Shinji Suzuki ,  Tetsuya Kitagawa ,  Kyohei Seki

    发明人： Shinji Suzuki ,  Tetsuya Kitagawa ,  Kyohei Seki

    IPC分类号： F21V9/00 ,  F21V7/04

    CPC分类号： H01L21/67115 ,  H01L21/67109 ,  H05B3/0047

    摘要： A heating device of the light irradiation type having an article to be heated, a guard ring located on the periphery of that article, multiple lamps located above the article to be heated and the guard ring, and a reflecting mirror located above the lamps, in which a light diffusion part is located in the upper region corresponding to the article to be heated so that the diffused light projects onto the entire surface of the article to be heated. The light diffusion part can be formed, for example, on a reflecting mirror, an optically transparent window part located between the article to be heated and the lamps or a light diffusion area formed on the light-emitting bulbs of the lamps. The size of the region occupied by the light diffusion part is such that diffused light is not projected to the guard ring.

    摘要翻译： 一种具有待加热物品的光照射型加热装置，位于该物品周边的保护环，位于被加热物上方的多个灯和防护环，以及位于灯的上方的反射镜， 光扩散部位于对应于被加热物的上部区域，使得漫射光投射到待加热物品的整个表面上。 光漫射部可以例如形成在反射镜上，位于待加热物品与灯之间的光学透明窗部或形成在灯的发光灯泡上的光扩散区域。 由光扩散部占据的区域的大小使得漫射光不会被投射到防护环。

    HEATING DEVICE OF THE LIGHT IRRADIATION TYPE
    7.
    发明申请
    HEATING DEVICE OF THE LIGHT IRRADIATION TYPE 失效
    加热装置的光照射类型

    公开(公告)号：US20080219650A1

    公开(公告)日：2008-09-11

    申请号：US11848359

    申请日：2007-08-31

    申请人： Shinji Suzuki ,  Tetsuya Kitagawa ,  Kyohei Seki

    发明人： Shinji Suzuki ,  Tetsuya Kitagawa ,  Kyohei Seki

    IPC分类号： F21V9/00

    CPC分类号： H01L21/67115 ,  H01L21/67109 ,  H05B3/0047

    摘要： A heating device of the light irradiation type having an article to be heated, a guard ring located on the periphery of that article, multiple lamps located above the article to be heated and the guard ring, and a reflecting mirror located above the lamps, in which a light diffusion part is located in the upper region corresponding to the article to be heated so that the diffused light projects onto the entire surface of the article to be heated. The light diffusion part can be formed, for example, on a reflecting mirror, an optically transparent window part located between the article to be heated and the lamps or a light diffusion area formed on the light-emitting bulbs of the lamps. The size of the region occupied by the light diffusion part is such that diffused light is not projected to the guard ring.

    摘要翻译： 一种具有待加热物品的光照射型加热装置，位于该物品周边的保护环，位于被加热物上方的多个灯和防护环，以及位于灯的上方的反射镜， 光扩散部位于对应于被加热物的上部区域，使得漫射光投射到待加热物品的整个表面上。 光漫射部可以例如形成在反射镜上，位于待加热物品与灯之间的光学透明窗部或形成在灯的发光灯泡上的光扩散区域。 由光扩散部占据的区域的大小使得漫射光不会被投射到防护环。